Patents by Inventor Robert SPIVEY

Robert SPIVEY has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11749518
    Abstract: A package-level, integrated high-vacuum ion-chip enclosure having improved thermal characteristics is disclosed. Enclosures in accordance with the present invention include first and second chambers that are located on opposite sides of a chip carrier, where the chambers are fluidically coupled via a conduit through the chip carrier. The ion trap is located in the first chamber and disposed on the chip carrier. A source for generating an atomic flux is located in the second chamber. The separation of the source and ion trap in different chambers affords thermal isolation between them, while the conduit between the chambers enables the ion trap to receive the atomic flux.
    Type: Grant
    Filed: June 26, 2020
    Date of Patent: September 5, 2023
    Assignee: Duke University
    Inventors: Jungsang Kim, Kai Hudek, Geert Vrijsen, Robert Spivey, Peter Maunz
  • Publication number: 20230037882
    Abstract: Technologies for an optomechanical system include an intermediate plate having a top surface with multiple tapped holes arranged in a grid. A pair of dowel pin holes surround each tapped hole in a linear pattern. Multiple optical blocks are coupled to the intermediate plate using dowel pins positioned in the dowel pin holes and corresponding dowel pin holes defined in the bottom surface of the optical block. Each optical block includes multiple optical elements coupled to the top surface of the optical block with dowel pins. A cryostat may be coupled to the intermediate plate. A cryo-package assembly is mounted inside a cryo chamber of the cryostat. The cryo-package assembly includes a cryo device such as an ion trap covered by a machined copper lid. The lid includes a meandering passageway to allow for differential pumping in order to achieve ultra-high vacuum within the cryo-package assembly.
    Type: Application
    Filed: August 8, 2022
    Publication date: February 9, 2023
    Inventors: Robert Spivey, Kai Hedek, Ismail Inlek, Jungsang Kim, Zhubing Jia
  • Patent number: 11538674
    Abstract: Systems and methods for loading microfabricated ion traps are disclosed. Photo-ablation via an ablation pulse is used to generate a flow of atoms from a source material, where the flow is predominantly populated with neutral atoms. As the neutral atoms flow toward the ion trap, two-photon photo-ionization is used to selectively ionize a specific isotope contained in the atom flow. The velocity of the liberated atoms, atom-generation rate, and/or heat load of the source material is controlled by controlling the fluence of the ablation pulse to provide high ion-trapping probability while simultaneously mitigating generation of heat in the ion-trapping system that can preclude cryogenic operation. In some embodiments, the source material is held within an ablation oven comprising an electrically conductive housing that is configured to restrict the flow of agglomerated neutral atoms generated during photo-ablation toward the ion trap.
    Type: Grant
    Filed: November 17, 2020
    Date of Patent: December 27, 2022
    Assignee: Duke University
    Inventors: Geert Vrijsen, Jungsang Kim, Robert Spivey, Ismail Inlek, Yuhi Aikyo
  • Publication number: 20210217598
    Abstract: Systems and methods for loading microfabricated ion traps are disclosed. Photo-ablation via an ablation pulse is used to generate a flow of atoms from a source material, where the flow is predominantly populated with neutral atoms. As the neutral atoms flow toward the ion trap, two-photon photo-ionization is used to selectively ionize a specific isotope contained in the atom flow. The velocity of the liberated atoms, atom-generation rate, and/or heat load of the source material is controlled by controlling the fluence of the ablation pulse to provide high ion-trapping probability while simultaneously mitigating generation of heat in the ion-trapping system that can preclude cryogenic operation. In some embodiments, the source material is held within an ablation oven comprising an electrically conductive housing that is configured to restrict the flow of agglomerated neutral atoms generated during photo-ablation toward the ion trap.
    Type: Application
    Filed: November 17, 2020
    Publication date: July 15, 2021
    Inventors: Geert VRIJSEN, Jungsang KIM, Robert SPIVEY, Ismail INLEK, Yuhi AIKYO
  • Patent number: 10923335
    Abstract: Systems and methods for loading microfabricated ion traps are disclosed. Photo-ablation via an ablation pulse is used to generate a flow of atoms from a source material, where the flow is predominantly populated with neutral atoms. As the neutral atoms flow toward the ion trap, two-photon photo-ionization is used to selectively ionize a specific isotope contained in the atom flow. The velocity of the liberated atoms, atom-generation rate, and/or heat load of the source material is controlled by controlling the fluence of the ablation pulse to provide high ion-trapping probability while simultaneously mitigating generation of heat in the ion-trapping system that can preclude cryogenic operation. In some embodiments, the source material is held within an ablation oven comprising an electrically conductive housing that is configured to restrict the flow of agglomerated neutral atoms generated during photo-ablation toward the ion trap.
    Type: Grant
    Filed: March 19, 2019
    Date of Patent: February 16, 2021
    Assignee: Duke University
    Inventors: Geert Vrijsen, Jungsang Kim, Robert Spivey, Ismail Inlek, Yuhi Aikyo
  • Publication number: 20200335320
    Abstract: A package-level, integrated high-vacuum ion-chip enclosure having improved thermal characteristics is disclosed. Enclosures in accordance with the present invention include first and second chambers that are located on opposite sides of a chip carrier, where the chambers are fluidically coupled via a conduit through the chip carrier. The ion trap is located in the first chamber and disposed on the chip carrier. A source for generating an atomic flux is located in the second chamber. The separation of the source and ion trap in different chambers affords thermal isolation between them, while the conduit between the chambers enables the ion trap to receive the atomic flux.
    Type: Application
    Filed: June 26, 2020
    Publication date: October 22, 2020
    Inventors: Jungsang KIM, Kai HUDEK, Geert VRIJSEN, Robert SPIVEY, Peter MAUNZ
  • Patent number: 10755913
    Abstract: A package-level, integrated high-vacuum ion-chip enclosure having improved thermal characteristics is disclosed. Enclosures in accordance with the present invention include first and second chambers that are located on opposite sides of a chip carrier, where the chambers are fluidically coupled via a conduit through the chip carrier. The ion trap is located in the first chamber and disposed on the chip carrier. A source for generating an atomic flux is located in the second chamber. The separation of the source and ion trap in different chambers affords thermal isolation between them, while the conduit between the chambers enables the ion trap to receive the atomic flux.
    Type: Grant
    Filed: March 26, 2018
    Date of Patent: August 25, 2020
    Assignee: Duke University
    Inventors: Jungsang Kim, Kai Hudek, Geert Vrijsen, Robert Spivey, Peter Maunz
  • Patent number: 10496932
    Abstract: Aspects of the present disclosure describe a compact RF driver circuit for Paul traps in trapped ion quantum computers and methods, and structures including same.
    Type: Grant
    Filed: July 18, 2018
    Date of Patent: December 3, 2019
    Assignee: Duke University
    Inventors: Jungsang Kim, Geert Vrijsen, Robert Spivey
  • Publication number: 20190287782
    Abstract: Systems and methods for loading microfabricated ion traps are disclosed. Photo-ablation via an ablation pulse is used to generate a flow of atoms from a source material, where the flow is predominantly populated with neutral atoms. As the neutral atoms flow toward the ion trap, two-photon photo-ionization is used to selectively ionize a specific isotope contained in the atom flow. The velocity of the liberated atoms, atom-generation rate, and/or heat load of the source material is controlled by controlling the fluence of the ablation pulse to provide high ion-trapping probability while simultaneously mitigating generation of heat in the ion-trapping system that can preclude cryogenic operation. In some embodiments, the source material is held within an ablation oven comprising an electrically conductive housing that is configured to restrict the flow of agglomerated neutral atoms generated during photo-ablation toward the ion trap.
    Type: Application
    Filed: March 19, 2019
    Publication date: September 19, 2019
    Inventors: Geert VRIJSEN, Jungsang KIM, Robert SPIVEY, Ismail INLEK, Yuhi AIKYO
  • Publication number: 20190057318
    Abstract: Aspects of the present disclosure describe a compact RF driver circuit for Paul traps in trapped ion quantum computers and methods, and structures including same.
    Type: Application
    Filed: July 18, 2018
    Publication date: February 21, 2019
    Inventors: Jungsang KIM, Geert VRIJSEN, Robert SPIVEY
  • Publication number: 20190027355
    Abstract: A package-level, integrated high-vacuum ion-chip enclosure having improved thermal characteristics is disclosed. Enclosures in accordance with the present invention include first and second chambers that are located on opposite sides of a chip carrier, where the chambers are fluidically coupled via a conduit through the chip carrier. The ion trap is located in the first chamber and disposed on the chip carrier. A source for generating an atomic flux is located in the second chamber. The separation of the source and ion trap in different chambers affords thermal isolation between them, while the conduit between the chambers enables the ion trap to receive the atomic flux.
    Type: Application
    Filed: March 26, 2018
    Publication date: January 24, 2019
    Inventors: Jungsang KIM, Kai HUDEK, Geert VRIJSEN, Robert SPIVEY, Peter MAUNZ