Patents by Inventor Robert Stubbers
Robert Stubbers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240074465Abstract: A food irradiation system including a plurality of compact linac systems is described herein. Each compact linac system, of the plurality of compact linac systems, includes: a high energy particle beam source providing a particle beam at up to 10 MeV; an emission target assembly configured to generate bremsstrahlung x-rays when impacted by particles of the particle beam; and a drift tube through which the particle beam passes on a path from the high energy particle beam source to the emission target assembly. The emission target assembly is positioned at a distal end of the drift tube for direct impingement of the particle beam to generate the bremsstrahlung x-rays in a directed radiation beam. Ones of the plurality of compact linac systems are individually positioned such that, as a group, the plurality of compact linac systems provide directed radiation beam coverage at prescribed radiation dose levels for an overall cumulative volume.Type: ApplicationFiled: September 5, 2023Publication date: March 7, 2024Inventors: Robert A. Stubbers, Brian E. Jurczyk, Thomas J. Houlahan, JR., Matthew D. Coventry, Darren A. Alman
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Publication number: 20230360898Abstract: A system and associated method are described. The system includes a controlled power supply for generating electrical pulses for a plasma discharge source. The controlled power supply includes an output pulse rail, a direct current power source, and energy storage capacitors, coupled to the direct current power source. The energy storage capacitors are configured to supply: a main negative rail voltage, a positive kick rail voltage, and at least one intermediate rail voltage. A controlled pulse power transistor group includes: a plurality of transistors interposed between the energy storage capacitors and the output pulse rail, and a transmission control configured to control power transmission. The transmission control is configured to specify a positive kick pulse waveform defined by user-specified parameters that configure operation of the plurality of transistors to control timing and voltage of the positive kick rail voltage and the at least one intermediate rail voltage.Type: ApplicationFiled: May 4, 2023Publication date: November 9, 2023Inventors: Robert A. Stubbers, Brian E. Jurczyk, Ian F. Haehnlein, Elizabeth Atkinson, Thomas J. Houlahan, JR.
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Patent number: 11675102Abstract: An associated particle-based inspection apparatus is described. The apparatus includes a grounded target region and a neutron generator that produces a neutron and one or more corresponding charged particles. The apparatus further includes an associated particle imaging (API) detector comprising a particle detector that detects the one or more corresponding charged particles, wherein the particle detector comprises at least one particle detector element that facilitates determining a trajectory, origination time, and a velocity of the neutron based upon a detection, by a particular one of the at least one particle detector element, of the corresponding charged particles.Type: GrantFiled: March 23, 2021Date of Patent: June 13, 2023Assignee: Starfire Industries LLCInventors: Brian E. Jurczyk, Robert A. Stubbers, Darren A. Alman, Matthew D. Coventry
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Publication number: 20220230859Abstract: A radial magnetron system for plasma surface modification and deposition of high-quality coatings for multi-dimensional structures is described. The system includes an axial electrode, a target material disposed on a portion of the axial electrode, an applied potential from an external electrical power source, and a high-current contact attached to the axial electrode for the applied potential. The system further includes a primary permanent magnet assembly comprising individual magnetic material elements configured to produce a target-region magnetic field for generating a Hall-effect dense plasma region under application of the applied potential to the axial electrode, and a magnet substrate that supports the primary permanent magnet assembly within the axial electrode. The magnet substrate is configured to provide a passageway for cooling the primary permanent magnet assembly and the axial electrode.Type: ApplicationFiled: January 20, 2022Publication date: July 21, 2022Inventors: Thomas J. Houlahan, JR., Daniel P. Menet, Ian F. Haehnlein, Robert A. Stubbers, Brian E. Jurczyk
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SYSTEM FOR COUPLING RF POWER INTO LINACS AND BELLOWS COATING BY MAGNETRON SPUTTERING WITH KICK PULSE
Publication number: 20210327694Abstract: A system and associated method are described for depositing high-quality films for providing a coating on a three-dimensional surface such as an internal surface of a bellows structure. The system includes a magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along a sputter target. The system further includes an elongated sputtering electrode material tube surrounding the magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along the sputter target. During operation, the system generates and controls ion flux for direct current high-power impulse magnetron sputtering. During operation logic circuitry issues a control signal to control a kick pulse property of a sustained positive voltage kick pulse taken from the group consisting of: onset delay, amplitude and duration.Type: ApplicationFiled: May 17, 2021Publication date: October 21, 2021Inventors: Thomas J. Houlahan, JR., Daniel P. Menet, Ian F. Haehnlein, Ivan A. Shchelkanov, Robert A. Stubbers, Brian E. Jurczyk -
Publication number: 20210208303Abstract: An associated particle-based inspection apparatus is described. The apparatus includes a grounded target region and a neutron generator that produces a neutron and one or more corresponding charged particles. The apparatus further includes an associated particle imaging (API) detector comprising a particle detector that detects the one or more corresponding charged particles, wherein the particle detector comprises at least one particle detector element that facilitates determining a trajectory, origination time, and a velocity of the neutron based upon a detection, by a particular one of the at least one particle detector element, of the corresponding charged particles.Type: ApplicationFiled: March 23, 2021Publication date: July 8, 2021Inventors: Brian E. Jurczyk, Robert A. Stubbers, Darren A. Alman, Matthew D. Coventry
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Patent number: 11008650Abstract: A system and associated method are described for depositing high-quality films for providing a nanolayered coating on a three-dimensional surface. The system includes a magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along a sputter target. The system further includes an elongated sputtering electrode material tube surrounding the magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along the sputter target. During operation, the system generates and controls ion flux for direct current high-power impulse magnetron sputtering. During operation logic circuitry issues a control signal to control a kick pulse property of a sustained positive voltage kick pulse taken from the group consisting of: onset delay, amplitude and duration.Type: GrantFiled: April 14, 2020Date of Patent: May 18, 2021Assignee: Starfire Industries LLCInventors: Thomas J. Houlahan, Jr., Daniel P. Menet, Ian F. Haehnlein, Ivan A. Shchelkanov, Robert A. Stubbers, Brian E. Jurczyk
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Patent number: 10955582Abstract: A wellbore inspection apparatus and a corresponding method of operation are described. The wellbore inspection apparatus comprises a neutron generator that produces, by a fusion reaction, a neutron and a corresponding charged particle. An associated particle imaging (API) detector comprises a particle detector array that detects the corresponding charged particle. The particle detector array comprises a plurality of particle detector elements that facilitate determining a trajectory of the neutron based upon a detection, by a particular one of the plurality of particle detector elements, of the corresponding charged particle. A gamma-ray detector assembly comprises a set of gamma-ray detector elements, and a set of collimating structures, where adjacent pairs of the set of collimating structures define a gamma-ray path for a gamma-ray arising from an inelastic collision of the neutron.Type: GrantFiled: February 26, 2019Date of Patent: March 23, 2021Assignee: Starfire Industries LLCInventors: Brian E. Jurczyk, Robert A. Stubbers, Darren A. Alman, Matthew D. Coventry
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Publication number: 20200377995Abstract: A system and associated method are described for depositing high-quality films for providing a nanolayered coating on a three-dimensional surface. The system includes a magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along a sputter target. The system further includes an elongated sputtering electrode material tube surrounding the magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along the sputter target. During operation, the system generates and controls ion flux for direct current high-power impulse magnetron sputtering. During operation logic circuitry issues a control signal to control a kick pulse property of a sustained positive voltage kick pulse taken from the group consisting of: onset delay, amplitude and duration.Type: ApplicationFiled: April 14, 2020Publication date: December 3, 2020Inventors: Thomas J. Houlahan, JR., Daniel P. Menet, Ian F. Haehnlein, Ivan A. Shchelkanov, Robert A. Stubbers, Brian E. Jurczyk
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Publication number: 20200273684Abstract: A system is described that includes a sputter target and a magnetic element array including multiple sets of magnets arranged to have a Hall-Effect region that extends along a length of the sputter target. The elongated sputtering electrode material tube is interposed between the magnetic array and an object to be deposited with a sputtered material from the sputter target. During a direct current high-power impulse magnetron sputtering operation, the system performs a depositing on a surface of the object by generating and controlling an ion and neutral particle flux by: providing a vacuum apparatus containing a sputter target holder electrode; first generating a high-power pulsed plasma magnetron discharge with a high-current negative direct current (DC) pulse to the sputter a target holder electrode; and second generating a configurable positive voltage kick pulse to the sputter target holder electrode after terminating the negative DC pulse.Type: ApplicationFiled: February 25, 2020Publication date: August 27, 2020Applicant: Starfire Industries LLCInventors: Brian E. Jurczyk, Robert A. Stubbers, Ivan Shchelkanov, Thomas James Houlahan, JR., Ian F. Haehnlein
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Patent number: 10624199Abstract: A system for injecting radio frequency (RF) pulses into an RF linear accelerator (RF LINAC) cavity is described. In accordance with the description an RF power amplifying element, typically a compact planar triode (CPT), is directly mounted to an outside of a hermetically sealed RF cavity. The direct mounting of the RF power amplifying element places the antenna—responsible for coupling power into the RF cavity—physically on the RF cavity side of a hermetic high-voltage (HV) break. The RF input, RF circuitry, biasing circuitry, and RF power amplifier are all outside of the vacuum cavity region. The direct mounting arrangement facilitates easy inspection and replacement of the RF power amplifier, the RF input and biasing circuitry. The direct mounting arrangement also mitigates the deleterious effects of multipactoring associated with placing the RF power amplifier and associated RF circuitry in the vacuum environment of the RF LINAC cavity.Type: GrantFiled: November 3, 2017Date of Patent: April 14, 2020Assignee: Starfire Industries, LLCInventors: Robert A. Stubbers, Brian E. Jurczyk, Thomas J. Houlahan, Jr., James M. Potter
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Patent number: 10531553Abstract: Systems and methods are described herein for generating surface-wave plasmas capable of simultaneously achieving high density with low temperature and planar scalability. A key feature of the invention is reduced damage to objects in contact with the plasma due to the lack of an RF bias; allowing for damage free processing. The preferred embodiment is an all-in-one processing reactor suitable for photovoltaic cell manufacturing, performing saw-damage removal, oxide stripping, deposition, doping and formation of hetero structures. The invention is scalable for atomic-layer deposition, etching, and other surface interaction processes.Type: GrantFiled: January 4, 2018Date of Patent: January 7, 2020Assignee: STARFIRE INDUSTRIES, LLCInventors: David N. Ruzic, Robert A. Stubbers, Brian E. Jurczyk
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Publication number: 20190265384Abstract: A wellbore inspection apparatus and a corresponding method of operation are described. The wellbore inspection apparatus comprises a neutron generator that produces, by a fusion reaction, a neutron and a corresponding charged particle. An associated particle imaging (API) detector comprises a particle detector array that detects the corresponding charged particle. The particle detector array comprises a plurality of particle detector elements that facilitate determining a trajectory of the neutron based upon a detection, by a particular one of the plurality of particle detector elements, of the corresponding charged particle. A gamma-ray detector assembly comprises a set of gamma-ray detector elements, and a set of collimating structures, where adjacent pairs of the set of collimating structures define a gamma-ray path for a gamma-ray arising from an inelastic collision of the neutron.Type: ApplicationFiled: February 26, 2019Publication date: August 29, 2019Inventors: Brian E. Jurczyk, Robert A. Stubbers, Darren A. Alman, Matthew D. Coventry
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Publication number: 20180199423Abstract: Systems and methods are described herein for generating surface-wave plasmas capable of simultaneously achieving high density with low temperature and planar scalability. A key feature of the invention is reduced damage to objects in contact with the plasma due to the lack of an RF bias; allowing for damage free processing. The preferred embodiment is an all-in-one processing reactor suitable for photovoltaic cell manufacturing, performing saw-damage removal, oxide stripping, deposition, doping and formation of hetero structures. The invention is scalable for atomic-layer deposition, etching, and other surface interaction processes.Type: ApplicationFiled: January 4, 2018Publication date: July 12, 2018Inventors: David N. Ruzic, Robert A. Stubbers, Brian E. Jurczyk
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Publication number: 20180124910Abstract: A system for injecting radio frequency (RF) pulses into an RF linear accelerator (RF LINAC) cavity is described. In accordance with the description an RF power amplifying element, typically a compact planar triode (CPT), is directly mounted to an outside of a hermetically sealed RF cavity. The direct mounting of the RF power amplifying element places the antenna—responsible for coupling power into the RF cavity—physically on the RF cavity side of a hermetic high-voltage (HV) break. The RF input, RF circuitry, biasing circuitry, and RF power amplifier are all outside of the vacuum cavity region. The direct mounting arrangement facilitates easy inspection and replacement of the RF power amplifier, the RF input and biasing circuitry. The direct mounting arrangement also mitigates the deleterious effects of multipactoring associated with placing the RF power amplifier and associated RF circuitry in the vacuum environment of the RF LINAC cavity.Type: ApplicationFiled: November 3, 2017Publication date: May 3, 2018Inventors: Robert A. Stubbers, Brian E. Jurczyk, Thomas J. Houlahan, JR., James M. Potter
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Patent number: 9867269Abstract: Systems and methods are described herein for generating surface-wave plasmas capable of simultaneously achieving high density with low temperature and planar scalability. A key feature of the invention is reduced damage to objects in contact with the plasma due to the lack of an RF bias; allowing for damage free processing. The preferred embodiment is an all-in-one processing reactor suitable for photovoltaic cell manufacturing, performing saw-damage removal, oxide stripping, deposition, doping and formation of heterostructures. The invention is scalable for atomic-layer deposition, etching, and other surface interaction processes.Type: GrantFiled: March 17, 2014Date of Patent: January 9, 2018Assignee: STARFIRE INDUSTRIES, LLCInventors: David N. Ruzic, Robert A. Stubbers, Brian E. Jurczyk
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Patent number: 9728376Abstract: Systems and methods are described herein for coupling electromagnetic (EM) energy from a remotely-located primary antenna into a plasma ion source. The EM energy is radiated by a first by through an intermediary secondary antenna. The embodiments described herein enable the elevation of the plasma ion source to a high electric potential bias relative to the primary antenna, which can be maintained at or near a grounded electric potential.Type: GrantFiled: March 17, 2014Date of Patent: August 8, 2017Assignee: STARFIRE INDUSTRIES, LLCInventors: Robert A. Stubbers, Daniel P. Menet, Michael J. Williams, Brian E. Jurczyk
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Publication number: 20170196073Abstract: Systems and methods are described herein for coupling electromagnetic (EM) energy from a remotely-located primary antenna into a plasma ion source. The EM energy is radiated by a first by through an intermediary secondary antenna. The embodiments described herein enable the elevation of the plasma ion source to a high electric potential bias relative to the primary antenna, which can be maintained at or near a grounded electric potential.Type: ApplicationFiled: March 17, 2014Publication date: July 6, 2017Applicant: Starfire Industries, LLCInventors: Robert A. Stubbers, Daniel P. Menet, Michael J. Williams, Brian E. Jurczyk
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Patent number: 9213112Abstract: Embodiments utilize high energy particles generated by nuclear reactions involving neutron radiation and neutron-sensitive materials to generate and maintain an electric potential gradient between an electrode and a region separated from the electrode by an electric insulator. System and methods contemplated by the invention thereby enable passive detection of neutrons without an externally applied electric potential bias by maintaining a charge accumulation facilitated by nuclear reactions involving neutrons. The charge accumulation produces an electric potential gradient within an electric insulator that separates the charge accumulation from an exterior region.Type: GrantFiled: March 17, 2014Date of Patent: December 15, 2015Assignee: Starfire Industries, LLCInventors: Robert A. Stubbers, Darren A. Alman, Brian E. Jurczyk, Matthew D. Coventry
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Publication number: 20150038790Abstract: Chronic sinusitis is treated by the application of cold plasma or plasma-activated species to the infected mucosal surfaces through use of an endoscope having a steerable end which may be projected into the sinus cavities through the nasal cavity. The cold plasma is generated at either the distal end of the endoscope with a power source by application of a power, or at the distal end by gas and electrical connections extending through the endoscope. The cold plasma or plasma-activated species act to destroy bacterial cells but not eukaryotic cells.Type: ApplicationFiled: October 20, 2014Publication date: February 5, 2015Inventors: Michael Rontal, Robert Stubbers, David Ruzic, Brian Jurczyk