Patents by Inventor Robert Stubbers

Robert Stubbers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240074465
    Abstract: A food irradiation system including a plurality of compact linac systems is described herein. Each compact linac system, of the plurality of compact linac systems, includes: a high energy particle beam source providing a particle beam at up to 10 MeV; an emission target assembly configured to generate bremsstrahlung x-rays when impacted by particles of the particle beam; and a drift tube through which the particle beam passes on a path from the high energy particle beam source to the emission target assembly. The emission target assembly is positioned at a distal end of the drift tube for direct impingement of the particle beam to generate the bremsstrahlung x-rays in a directed radiation beam. Ones of the plurality of compact linac systems are individually positioned such that, as a group, the plurality of compact linac systems provide directed radiation beam coverage at prescribed radiation dose levels for an overall cumulative volume.
    Type: Application
    Filed: September 5, 2023
    Publication date: March 7, 2024
    Inventors: Robert A. Stubbers, Brian E. Jurczyk, Thomas J. Houlahan, JR., Matthew D. Coventry, Darren A. Alman
  • Publication number: 20230360898
    Abstract: A system and associated method are described. The system includes a controlled power supply for generating electrical pulses for a plasma discharge source. The controlled power supply includes an output pulse rail, a direct current power source, and energy storage capacitors, coupled to the direct current power source. The energy storage capacitors are configured to supply: a main negative rail voltage, a positive kick rail voltage, and at least one intermediate rail voltage. A controlled pulse power transistor group includes: a plurality of transistors interposed between the energy storage capacitors and the output pulse rail, and a transmission control configured to control power transmission. The transmission control is configured to specify a positive kick pulse waveform defined by user-specified parameters that configure operation of the plurality of transistors to control timing and voltage of the positive kick rail voltage and the at least one intermediate rail voltage.
    Type: Application
    Filed: May 4, 2023
    Publication date: November 9, 2023
    Inventors: Robert A. Stubbers, Brian E. Jurczyk, Ian F. Haehnlein, Elizabeth Atkinson, Thomas J. Houlahan, JR.
  • Patent number: 11675102
    Abstract: An associated particle-based inspection apparatus is described. The apparatus includes a grounded target region and a neutron generator that produces a neutron and one or more corresponding charged particles. The apparatus further includes an associated particle imaging (API) detector comprising a particle detector that detects the one or more corresponding charged particles, wherein the particle detector comprises at least one particle detector element that facilitates determining a trajectory, origination time, and a velocity of the neutron based upon a detection, by a particular one of the at least one particle detector element, of the corresponding charged particles.
    Type: Grant
    Filed: March 23, 2021
    Date of Patent: June 13, 2023
    Assignee: Starfire Industries LLC
    Inventors: Brian E. Jurczyk, Robert A. Stubbers, Darren A. Alman, Matthew D. Coventry
  • Publication number: 20220230859
    Abstract: A radial magnetron system for plasma surface modification and deposition of high-quality coatings for multi-dimensional structures is described. The system includes an axial electrode, a target material disposed on a portion of the axial electrode, an applied potential from an external electrical power source, and a high-current contact attached to the axial electrode for the applied potential. The system further includes a primary permanent magnet assembly comprising individual magnetic material elements configured to produce a target-region magnetic field for generating a Hall-effect dense plasma region under application of the applied potential to the axial electrode, and a magnet substrate that supports the primary permanent magnet assembly within the axial electrode. The magnet substrate is configured to provide a passageway for cooling the primary permanent magnet assembly and the axial electrode.
    Type: Application
    Filed: January 20, 2022
    Publication date: July 21, 2022
    Inventors: Thomas J. Houlahan, JR., Daniel P. Menet, Ian F. Haehnlein, Robert A. Stubbers, Brian E. Jurczyk
  • Publication number: 20210327694
    Abstract: A system and associated method are described for depositing high-quality films for providing a coating on a three-dimensional surface such as an internal surface of a bellows structure. The system includes a magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along a sputter target. The system further includes an elongated sputtering electrode material tube surrounding the magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along the sputter target. During operation, the system generates and controls ion flux for direct current high-power impulse magnetron sputtering. During operation logic circuitry issues a control signal to control a kick pulse property of a sustained positive voltage kick pulse taken from the group consisting of: onset delay, amplitude and duration.
    Type: Application
    Filed: May 17, 2021
    Publication date: October 21, 2021
    Inventors: Thomas J. Houlahan, JR., Daniel P. Menet, Ian F. Haehnlein, Ivan A. Shchelkanov, Robert A. Stubbers, Brian E. Jurczyk
  • Publication number: 20210208303
    Abstract: An associated particle-based inspection apparatus is described. The apparatus includes a grounded target region and a neutron generator that produces a neutron and one or more corresponding charged particles. The apparatus further includes an associated particle imaging (API) detector comprising a particle detector that detects the one or more corresponding charged particles, wherein the particle detector comprises at least one particle detector element that facilitates determining a trajectory, origination time, and a velocity of the neutron based upon a detection, by a particular one of the at least one particle detector element, of the corresponding charged particles.
    Type: Application
    Filed: March 23, 2021
    Publication date: July 8, 2021
    Inventors: Brian E. Jurczyk, Robert A. Stubbers, Darren A. Alman, Matthew D. Coventry
  • Patent number: 11008650
    Abstract: A system and associated method are described for depositing high-quality films for providing a nanolayered coating on a three-dimensional surface. The system includes a magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along a sputter target. The system further includes an elongated sputtering electrode material tube surrounding the magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along the sputter target. During operation, the system generates and controls ion flux for direct current high-power impulse magnetron sputtering. During operation logic circuitry issues a control signal to control a kick pulse property of a sustained positive voltage kick pulse taken from the group consisting of: onset delay, amplitude and duration.
    Type: Grant
    Filed: April 14, 2020
    Date of Patent: May 18, 2021
    Assignee: Starfire Industries LLC
    Inventors: Thomas J. Houlahan, Jr., Daniel P. Menet, Ian F. Haehnlein, Ivan A. Shchelkanov, Robert A. Stubbers, Brian E. Jurczyk
  • Patent number: 10955582
    Abstract: A wellbore inspection apparatus and a corresponding method of operation are described. The wellbore inspection apparatus comprises a neutron generator that produces, by a fusion reaction, a neutron and a corresponding charged particle. An associated particle imaging (API) detector comprises a particle detector array that detects the corresponding charged particle. The particle detector array comprises a plurality of particle detector elements that facilitate determining a trajectory of the neutron based upon a detection, by a particular one of the plurality of particle detector elements, of the corresponding charged particle. A gamma-ray detector assembly comprises a set of gamma-ray detector elements, and a set of collimating structures, where adjacent pairs of the set of collimating structures define a gamma-ray path for a gamma-ray arising from an inelastic collision of the neutron.
    Type: Grant
    Filed: February 26, 2019
    Date of Patent: March 23, 2021
    Assignee: Starfire Industries LLC
    Inventors: Brian E. Jurczyk, Robert A. Stubbers, Darren A. Alman, Matthew D. Coventry
  • Publication number: 20200377995
    Abstract: A system and associated method are described for depositing high-quality films for providing a nanolayered coating on a three-dimensional surface. The system includes a magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along a sputter target. The system further includes an elongated sputtering electrode material tube surrounding the magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along the sputter target. During operation, the system generates and controls ion flux for direct current high-power impulse magnetron sputtering. During operation logic circuitry issues a control signal to control a kick pulse property of a sustained positive voltage kick pulse taken from the group consisting of: onset delay, amplitude and duration.
    Type: Application
    Filed: April 14, 2020
    Publication date: December 3, 2020
    Inventors: Thomas J. Houlahan, JR., Daniel P. Menet, Ian F. Haehnlein, Ivan A. Shchelkanov, Robert A. Stubbers, Brian E. Jurczyk
  • Publication number: 20200273684
    Abstract: A system is described that includes a sputter target and a magnetic element array including multiple sets of magnets arranged to have a Hall-Effect region that extends along a length of the sputter target. The elongated sputtering electrode material tube is interposed between the magnetic array and an object to be deposited with a sputtered material from the sputter target. During a direct current high-power impulse magnetron sputtering operation, the system performs a depositing on a surface of the object by generating and controlling an ion and neutral particle flux by: providing a vacuum apparatus containing a sputter target holder electrode; first generating a high-power pulsed plasma magnetron discharge with a high-current negative direct current (DC) pulse to the sputter a target holder electrode; and second generating a configurable positive voltage kick pulse to the sputter target holder electrode after terminating the negative DC pulse.
    Type: Application
    Filed: February 25, 2020
    Publication date: August 27, 2020
    Applicant: Starfire Industries LLC
    Inventors: Brian E. Jurczyk, Robert A. Stubbers, Ivan Shchelkanov, Thomas James Houlahan, JR., Ian F. Haehnlein
  • Patent number: 10624199
    Abstract: A system for injecting radio frequency (RF) pulses into an RF linear accelerator (RF LINAC) cavity is described. In accordance with the description an RF power amplifying element, typically a compact planar triode (CPT), is directly mounted to an outside of a hermetically sealed RF cavity. The direct mounting of the RF power amplifying element places the antenna—responsible for coupling power into the RF cavity—physically on the RF cavity side of a hermetic high-voltage (HV) break. The RF input, RF circuitry, biasing circuitry, and RF power amplifier are all outside of the vacuum cavity region. The direct mounting arrangement facilitates easy inspection and replacement of the RF power amplifier, the RF input and biasing circuitry. The direct mounting arrangement also mitigates the deleterious effects of multipactoring associated with placing the RF power amplifier and associated RF circuitry in the vacuum environment of the RF LINAC cavity.
    Type: Grant
    Filed: November 3, 2017
    Date of Patent: April 14, 2020
    Assignee: Starfire Industries, LLC
    Inventors: Robert A. Stubbers, Brian E. Jurczyk, Thomas J. Houlahan, Jr., James M. Potter
  • Patent number: 10531553
    Abstract: Systems and methods are described herein for generating surface-wave plasmas capable of simultaneously achieving high density with low temperature and planar scalability. A key feature of the invention is reduced damage to objects in contact with the plasma due to the lack of an RF bias; allowing for damage free processing. The preferred embodiment is an all-in-one processing reactor suitable for photovoltaic cell manufacturing, performing saw-damage removal, oxide stripping, deposition, doping and formation of hetero structures. The invention is scalable for atomic-layer deposition, etching, and other surface interaction processes.
    Type: Grant
    Filed: January 4, 2018
    Date of Patent: January 7, 2020
    Assignee: STARFIRE INDUSTRIES, LLC
    Inventors: David N. Ruzic, Robert A. Stubbers, Brian E. Jurczyk
  • Publication number: 20190265384
    Abstract: A wellbore inspection apparatus and a corresponding method of operation are described. The wellbore inspection apparatus comprises a neutron generator that produces, by a fusion reaction, a neutron and a corresponding charged particle. An associated particle imaging (API) detector comprises a particle detector array that detects the corresponding charged particle. The particle detector array comprises a plurality of particle detector elements that facilitate determining a trajectory of the neutron based upon a detection, by a particular one of the plurality of particle detector elements, of the corresponding charged particle. A gamma-ray detector assembly comprises a set of gamma-ray detector elements, and a set of collimating structures, where adjacent pairs of the set of collimating structures define a gamma-ray path for a gamma-ray arising from an inelastic collision of the neutron.
    Type: Application
    Filed: February 26, 2019
    Publication date: August 29, 2019
    Inventors: Brian E. Jurczyk, Robert A. Stubbers, Darren A. Alman, Matthew D. Coventry
  • Publication number: 20180199423
    Abstract: Systems and methods are described herein for generating surface-wave plasmas capable of simultaneously achieving high density with low temperature and planar scalability. A key feature of the invention is reduced damage to objects in contact with the plasma due to the lack of an RF bias; allowing for damage free processing. The preferred embodiment is an all-in-one processing reactor suitable for photovoltaic cell manufacturing, performing saw-damage removal, oxide stripping, deposition, doping and formation of hetero structures. The invention is scalable for atomic-layer deposition, etching, and other surface interaction processes.
    Type: Application
    Filed: January 4, 2018
    Publication date: July 12, 2018
    Inventors: David N. Ruzic, Robert A. Stubbers, Brian E. Jurczyk
  • Publication number: 20180124910
    Abstract: A system for injecting radio frequency (RF) pulses into an RF linear accelerator (RF LINAC) cavity is described. In accordance with the description an RF power amplifying element, typically a compact planar triode (CPT), is directly mounted to an outside of a hermetically sealed RF cavity. The direct mounting of the RF power amplifying element places the antenna—responsible for coupling power into the RF cavity—physically on the RF cavity side of a hermetic high-voltage (HV) break. The RF input, RF circuitry, biasing circuitry, and RF power amplifier are all outside of the vacuum cavity region. The direct mounting arrangement facilitates easy inspection and replacement of the RF power amplifier, the RF input and biasing circuitry. The direct mounting arrangement also mitigates the deleterious effects of multipactoring associated with placing the RF power amplifier and associated RF circuitry in the vacuum environment of the RF LINAC cavity.
    Type: Application
    Filed: November 3, 2017
    Publication date: May 3, 2018
    Inventors: Robert A. Stubbers, Brian E. Jurczyk, Thomas J. Houlahan, JR., James M. Potter
  • Patent number: 9867269
    Abstract: Systems and methods are described herein for generating surface-wave plasmas capable of simultaneously achieving high density with low temperature and planar scalability. A key feature of the invention is reduced damage to objects in contact with the plasma due to the lack of an RF bias; allowing for damage free processing. The preferred embodiment is an all-in-one processing reactor suitable for photovoltaic cell manufacturing, performing saw-damage removal, oxide stripping, deposition, doping and formation of heterostructures. The invention is scalable for atomic-layer deposition, etching, and other surface interaction processes.
    Type: Grant
    Filed: March 17, 2014
    Date of Patent: January 9, 2018
    Assignee: STARFIRE INDUSTRIES, LLC
    Inventors: David N. Ruzic, Robert A. Stubbers, Brian E. Jurczyk
  • Patent number: 9728376
    Abstract: Systems and methods are described herein for coupling electromagnetic (EM) energy from a remotely-located primary antenna into a plasma ion source. The EM energy is radiated by a first by through an intermediary secondary antenna. The embodiments described herein enable the elevation of the plasma ion source to a high electric potential bias relative to the primary antenna, which can be maintained at or near a grounded electric potential.
    Type: Grant
    Filed: March 17, 2014
    Date of Patent: August 8, 2017
    Assignee: STARFIRE INDUSTRIES, LLC
    Inventors: Robert A. Stubbers, Daniel P. Menet, Michael J. Williams, Brian E. Jurczyk
  • Publication number: 20170196073
    Abstract: Systems and methods are described herein for coupling electromagnetic (EM) energy from a remotely-located primary antenna into a plasma ion source. The EM energy is radiated by a first by through an intermediary secondary antenna. The embodiments described herein enable the elevation of the plasma ion source to a high electric potential bias relative to the primary antenna, which can be maintained at or near a grounded electric potential.
    Type: Application
    Filed: March 17, 2014
    Publication date: July 6, 2017
    Applicant: Starfire Industries, LLC
    Inventors: Robert A. Stubbers, Daniel P. Menet, Michael J. Williams, Brian E. Jurczyk
  • Patent number: 9213112
    Abstract: Embodiments utilize high energy particles generated by nuclear reactions involving neutron radiation and neutron-sensitive materials to generate and maintain an electric potential gradient between an electrode and a region separated from the electrode by an electric insulator. System and methods contemplated by the invention thereby enable passive detection of neutrons without an externally applied electric potential bias by maintaining a charge accumulation facilitated by nuclear reactions involving neutrons. The charge accumulation produces an electric potential gradient within an electric insulator that separates the charge accumulation from an exterior region.
    Type: Grant
    Filed: March 17, 2014
    Date of Patent: December 15, 2015
    Assignee: Starfire Industries, LLC
    Inventors: Robert A. Stubbers, Darren A. Alman, Brian E. Jurczyk, Matthew D. Coventry
  • Publication number: 20150038790
    Abstract: Chronic sinusitis is treated by the application of cold plasma or plasma-activated species to the infected mucosal surfaces through use of an endoscope having a steerable end which may be projected into the sinus cavities through the nasal cavity. The cold plasma is generated at either the distal end of the endoscope with a power source by application of a power, or at the distal end by gas and electrical connections extending through the endoscope. The cold plasma or plasma-activated species act to destroy bacterial cells but not eukaryotic cells.
    Type: Application
    Filed: October 20, 2014
    Publication date: February 5, 2015
    Inventors: Michael Rontal, Robert Stubbers, David Ruzic, Brian Jurczyk