Patents by Inventor Robert T. Trujillo
Robert T. Trujillo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10273578Abstract: A heating module for use in a substrate processing chamber. The heating module having a housing with a heat source therein. The heating module can be part of a gas distribution assembly positioned above a susceptor assembly to heat the top surface of the susceptor and wafers directly. The heating module can have constant or variable power output. Processing chambers and methods of processing a wafer using the heating module are described.Type: GrantFiled: October 3, 2014Date of Patent: April 30, 2019Assignee: Applied Materials, Inc.Inventors: Joseph Yudovsky, Robert T. Trujillo, Kevin Griffin, Garry K. Kwong, Kallol Bera, Li-Qun Xia, Mandyam Sriram
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Patent number: 9441295Abstract: One embodiment of the present invention provides a gas-delivery system for delivering reaction gas to a reactor chamber. The gas-delivery system includes a main gas-inlet port for receiving reaction gases and a gas-delivery plate that includes a plurality of gas channels. A gas channel includes a plurality of gas holes for allowing the reaction gases to enter the reactor chamber from the gas channel. The gas-delivery system further includes a plurality of sub-gas lines coupling together the main gas-inlet port and the gas-delivery plate, and a respective sub-gas line is configured to deliver a portion of the received reaction gases to a corresponding gas channel.Type: GrantFiled: November 22, 2010Date of Patent: September 13, 2016Assignee: SolarCity CorporationInventors: Yan Rozenzon, Robert T. Trujillo, Steven C. Beese
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Publication number: 20160133778Abstract: One embodiment of the present invention provides a support system for providing dynamic support to a deposition reactor. The system includes a coupling mechanism configured to provide coupling between the deposition reactor and the support system, an attachment mechanism configured to attach the support system to an external frame, and at least one gas bellows situated between the coupling mechanism and the attachment mechanism.Type: ApplicationFiled: January 15, 2016Publication date: May 12, 2016Applicant: SolarCity CorporationInventors: Robert T. Trujillo, Steven C. Beese, Yan Rozenzon
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Publication number: 20160097122Abstract: A heating module for use in a substrate processing chamber. The heating module having a housing with a heat source therein. The heating module can be part of a gas distribution assembly positioned above a susceptor assembly to heat the top surface of the susceptor and wafers directly. The heating module can have constant or variable power output. Processing chambers and methods of processing a wafer using the heating module are described.Type: ApplicationFiled: October 3, 2014Publication date: April 7, 2016Inventors: Joseph Yudovsky, Robert T. Trujillo, Kevin Griffin, Garry K. Kwong, Kallol Bera, Li-Qun Xia, Mandyam Sriram
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Patent number: 9240513Abstract: One embodiment of the present invention provides a support system for providing dynamic support to a deposition reactor. The system includes a coupling mechanism configured to provide coupling between the deposition reactor and the support system, an attachment mechanism configured to attach the support system to an external frame, and at least one gas bellows situated between the coupling mechanism and the attachment mechanism.Type: GrantFiled: April 4, 2011Date of Patent: January 19, 2016Assignee: SolarCity CorporationInventors: Robert T. Trujillo, Steven C. Beese, Yan Rozenzon
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Patent number: 8562745Abstract: One embodiment of the present invention provides a wafer-carrier system used in a deposition chamber for carrying wafers. The wafer-carrier system includes a base susceptor and a top susceptor nested inside the base susceptor with its wafer-mounting side facing the base susceptor's wafer-mounting side, thereby forming a substantially enclosed narrow channel. The base susceptor provides an upward support to the top susceptor.Type: GrantFiled: December 8, 2010Date of Patent: October 22, 2013Assignee: Silevo, Inc.Inventors: Yan Rozenzon, Robert T. Trujillo, Steven C. Beese
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Publication number: 20110283941Abstract: One embodiment of the present invention provides a wafer-carrier system used in a deposition chamber for carrying wafers. The wafer-carrier system includes a base susceptor and a top susceptor nested inside the base susceptor with its wafer-mounting side facing the base susceptor's wafer-mounting side, thereby forming a substantially enclosed narrow channel. The base susceptor provides an upward support to the top susceptor.Type: ApplicationFiled: December 8, 2010Publication date: November 24, 2011Applicant: SIERRA SOLAR POWER, INC.Inventors: Yan Rozenzon, Robert T. Trujillo, Steven C. Beese
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Publication number: 20110277688Abstract: One embodiment of the present invention provides a support system for providing dynamic support to a deposition reactor. The system includes a coupling mechanism configured to provide coupling between the deposition reactor and the support system, an attachment mechanism configured to attach the support system to an external frame, and at least one gas bellows situated between the coupling mechanism and the attachment mechanism.Type: ApplicationFiled: April 4, 2011Publication date: November 17, 2011Applicant: SIERRA SOLAR POWER, INC.Inventors: Robert T. Trujillo, Steven C. Beese, Yan Rozenzon
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Publication number: 20110277690Abstract: One embodiment of the present invention provides a gas-delivery system for delivering reaction gas to a reactor chamber. The gas-delivery system includes a main gas-inlet port for receiving reaction gases and a gas-delivery plate that includes a plurality of gas channels. A gas channel includes a plurality of gas holes for allowing the reaction gases to enter the reactor chamber from the gas channel. The gas-delivery system further includes a plurality of sub-gas lines coupling together the main gas-inlet port and the gas-delivery plate, and a respective sub-gas line is configured to deliver a portion of the received reaction gases to a corresponding gas channel.Type: ApplicationFiled: November 22, 2010Publication date: November 17, 2011Applicant: SIERRA SOLAR POWER, INC.Inventors: Yan Rozenzon, Robert T. Trujillo, Steven C. Beese
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Patent number: 7643146Abstract: Methods and apparatus for performing scatterometry measurements of biological samples as described herein. A substrate having formed therein one or more sample wells is provided. Each sample well is configured to hold a sample solution containing objects that are to be characterized based on their light scattering properties. One or more sample solutions are dispensed into the sample wells. A specular reflection reducing element is applied to at least some of the sample solutions in the sample wells to decrease reflections of light into one or more detectors. A light beam is directed from a light source onto the objects in the sample wells. Light scattered by the objects in the sample wells is collected and transmitted to one or more detectors. The signal from the detectors is analyzed to detect the one or more characteristics of the one or more samples.Type: GrantFiled: January 20, 2006Date of Patent: January 5, 2010Assignee: Blueshift Biotechnologies, Inc.Inventors: Evan F. Cromwell, Steven C. Miller, Robert T. Trujillo, Paul B. Comita
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Publication number: 20030178145Abstract: An apparatus that includes a susceptor having a number of through holes, a number of lift pins positioned within the through holes, each lift pin having a lift pin head able to translate a wafer by contacting the wafer at an outer diameter edge, the lift pins capable of extending to lift the wafer off the susceptor; and the lift pins capable of retracting to place the wafer onto the susceptor, and upon placing the wafer onto the susceptor, each of the lift pin heads are capable of contacting a floor of the susceptor for restricting flow of a gas through the through holes.Type: ApplicationFiled: March 25, 2002Publication date: September 25, 2003Applicant: Applied Materials, Inc.Inventors: Roger N. Anderson, Robert T. Trujillo