Abstract: A method is useful for forming a product including a cyclic siloxane compound. The method includes combining an organodihalosilane and a transition metal on cerium (IV) oxide catalyst, in a reactor at a temperature of to form the product.

Abstract: The present invention relates to a method for separating organohalosilanes. The method includes introducing a mixture including at least a first organohalosilane and a second organohalosilane onto a chromatographic bed including a stationary phase. The method also includes passing a liquid mobile phase through the chromatographic bed to produce an eluate including at least one fraction enriched in the first organohalosilane and at least one fraction enriched in the second organohalosilane.

Abstract: A method of preparing organohalosilanes comprising combining an organohalide having the formula RX (I), wherein R is a hydrocarbyl group having 1 to 10 carbon atoms and X is fluoro, chloro, bromo, or iodo, with a contact mass comprising at least 2% (w/w) of a palladium suicide of the formula PdxSiy (II), wherein x is an integer from 1 to 5 and y is 1 to 8, or a platinum suicide of formula PtzSi (III), wherein z is 1 or 2, in a reactor at a temperature from 250 to 700° C. to form an organohalosilane.

Abstract: The present invention relates to a method for separating organohalosilanes. The method includes introducing a mixture including at least a first organohalosilane and a second organohalosilane onto a chromatographic bed including a stationary phase. The method also includes passing a liquid mobile phase through the chromatographic bed to produce an eluate including at least one fraction enriched in the first organohalosilane and at least one fraction enriched in the second organohalosilane.

Abstract: A mixture of at least two polyhedral oligomeric silsesquioxane (POSS) compounds is formed in the presence of rhenium on cerium(IV) oxide. The POSS compounds are formed utilizing a method that includes the step of combining (a) a trihalosilane, (b) hydrogen gas, and (c) the rhenium on cerium(IV) oxide, in a reactor at a temperature of from 250° C. to 600° C. to form the mixture. The trihalosilane has the formula RSiX3 wherein R is an alkyl group having from 1 to 4 carbon atoms, an aryl group, and wherein X is a halo atom. This method allows for the efficient, predictable, and accurate production of the POSS compounds with a minimized need for use of expensive separation techniques. In addition, this method produces the POSS compounds in commercially useful quantities as major reaction products thereby avoiding the need to run multiple reactions.

Abstract: A method of preparing a trihalosilane comprising the separate and consecutive steps of (i) contacting a copper catalyst with hydrogen gas and a silicon tetrahalide at a temperature of from 500 to 1400° C. to form a silicon-containing copper catalyst comprising at least 0.1% (w/w) of silicon, wherein the copper catalyst comprises a metal selected from copper and a mixture comprising copper and at least one element selected from gold, magnesium, and platinum; and (ii) contacting the silicon-containing copper catalyst with a hydrogen halide at a temperature of from 100 to 600° C. to form a trihalosilane.

Abstract: A mixture of at least one polysilane and at least one polycarbosilane is formed in the presence of a metal silicide. The mixture is formed utilizing a method that includes the step of combining the metal silicide and an alkyl halide in a reactor at a temperature of from 200° C. to 600° C. The alkyl halide has the formula RX, wherein R is C1-C10 alkyl and X is halo. This method forms high yield mixtures of the at least one polysilane and the at least one polycarbosilane. Additionally, the mixture is time and cost effective and allows the mixture to be formed in a predictable and controlled manner. Moreover, the components used in this method can be easily recycled and/or re-used in other processes.

Abstract: A process for preparing organohalosilanes comprising combining hydrogen, a halosilane having the formula HaSiX4-a (I) and an organohalide having the formula RX (II), wherein R is C1-C10 alkyl or C4-C10 cycloalkyl, each X is independently halo, and the subscript a is 0, 1, or 2, in the presence of a sufficient amount of a catalyst effective in enabling the replacement of one or more of the halo groups of the halosilane with the R group from the organohalide, at a temperature from 200 to 800° C., to form an organohalosilane and a hydrogen halide, wherein the volumetric ratio of hydrogen to halosilane is from 1:3 to 1:0.001 and the volumetric ratio of hydrogen to organohalide is from 1:1 to 1:0.001, and wherein the catalyst is optionally treated with the hydrogen or the halosilane prior to the combining.

Abstract: A mixture of at least two polyhedral oligomeric silsesquioxane (POSS) compounds is formed in the presence of rhenium on cerium(IV) oxide. The POSS compounds are formed utilizing a method that includes the step of combining (a) a trihalosilane, (b) hydrogen gas, and (c) the rhenium on cerium(IV) oxide, in a reactor at a temperature of from 250° C. to 600° C. to form the mixture. The trihalosilane has the formula RSiX3 wherein R is an alkyl group having from 1 to 4 carbon atoms, an aryl group, and wherein X is a halo atom. This method allows for the efficient, predictable, and accurate production of the POSS compounds with a minimized need for use of expensive separation techniques. In addition, this method produces the POSS compounds in commercially useful quantities as major reaction products thereby avoiding the need to run multiple reactions.

Abstract: A method of preparing a trihalosilane comprising the separate and consecutive steps of (i) contacting a copper catalyst with hydrogen gas and a silicon tetrahalide at a temperature of from 500 to 1400° C. to form a silicon-containing copper catalyst comprising at least 0.1% (w/w) of silicon, wherein the copper catalyst comprises a metal selected from copper and a mixture comprising copper and at least one element selected from gold, magnesium, and platinum; and (ii) contacting the silicon-containing copper catalyst with a hydrogen halide at a temperature of from 100 to 600° C. to form a trihalosilane.

Abstract: A process for preparing organohalosilanes comprising combining hydrogen, a halosilane having the formula HaSiX4-a (I) and an organohalide having the formula RX (II), wherein R is C1-C10 alkyl or C4-C10 cycloalkyl, each X is independently halo, and the subscript a is 0, 1, or 2, in the presence of a sufficient amount of a catalyst effective in enabling the replacement of one or more of the halo groups of the halosilane with the R group from the organohalide, at a temperature from 200 to 800° C., to form an organohalosilane and a hydrogen halide, wherein the volumetric ratio of hydrogen to halosilane is from 1:3 to 1:0.001 and the volumetric ratio of hydrogen to organohalide is from 1:1 to 1:0.001, and wherein the catalyst is optionally treated with the hydrogen or the halosilane prior to the combining.

Abstract: A method of preparing organohalosilanes comprising combining an organohalide having the formula RX (I), wherein R is a hydrocarbyl group having 1 to 10 carbon atoms and X is fluoro, chloro, bromo, or iodo, with a contact mass comprising at least 2% (w/w) of a palladium suicide of the formula PdxSiy (II), wherein x is an integer from 1 to 5 and y is 1 to 8, or a platinum suicide of formula Pt2Si (III), wherein z is 1 or 2, in a reactor at a temperature from 250 to 700° C. to form an organohalosilane.

Abstract: A method of making a trihalosilane comprising contacting an organotrihalosilane according to the formula RS1X3 (I), wherein R is C1-C10 hydrocarbyl and each X independently is halo, with hydrogen, wherein the mole ratio of the organotrihalosilane to hydrogen is from 0.009:1 to 1:2300, in the presence of a catalyst comprising a metal selected from (i) Re, (ii) a mixture comprising Re and at least one element selected from Pd, Ru, Mn, Cu, and Rh, (iii) a mixture comprising Ir and at least one element selected from Pd and Rh, (iv) Mn, (v) a mixture comprising Mn and Rh, (vi) Ag, (vii) Mg, and (viii) Rh at from 300 to 800° C. to form a trihalosilane.