Abstract: A firearm handgrip with integrated safety lock system includes a handgrip having a plurality of connectors, a generally hollow interior space and an aperture, An elongated retractable plate is positioned within the aperture and is connected to a plate alignment unit located within the interior space of the handgrip. The plate transitions between an extended position and a retracted position. In the extended position, the plate physically engages the firearm's integrated safety mechanism to maintain the same in the “safe” position. The system further includes a biometric authentication system, an electromechanical latch and an internal controller.

Abstract: The present invention provides a means for restricting access to the trigger guard enclosure of a long gun. The present invention enshrouds the perimeter of the trigger guard enclosure preventing access when not in use. When the weapon is in use, the present invention slides away from the trigger guard enclosure and secures as a handgrip for use while aiming and firing the weapon, all the while remaining permanently affixed to the weapon.

Abstract: The electromechanical trigger guard protective enclosure is a safety device intended to prevent access to the trigger of any firearm with an accessory rail. The present invention has a keypad, which activates the drive mechanism. The drive mechanism either covers the trigger or slides open revealing the trigger for use. The protective enclosure is affixed to the accessory rail on a gun, ensuring that it is able to be used at all times, preventing any inability to properly enclose the trigger. This protective sheath allows for the weapon to remain loaded and ready to fire at all times, aiding greatly in times of self-defense.

Abstract: According to one embodiment of the invention, a method for managing security for an organization is provided. The method includes receiving a plurality of requests from a plurality of parties. Each request is a request for permission to implement a deviation from a security rule. Each request includes a statement describing a benefit associated with the deviation. The method also includes determining a risk associated with the deviation. The method also includes deciding whether to approve each request based on the determined risk and the statement. The method also includes storing the requests and a status of each request. The status indicates whether the request is approved. The stored requests includes at least one approved request. The method also includes deciding, after a predetermined time period, whether to continue an approval of the approved request.

Abstract: A plasma etch reactor 20 includes a upper electrode 24, a lower electrode 24, a peripheral ring electrode 26 disposed therebetween. The upper electrode 24 is grounded, the peripheral electrode 26 is powered by a high frequency AC power supply, while the lower electrode 28 is powered by a low frequency AC power supply, as well as a DC power supply. The reactor chamber 22 is configured with a solid source 50 of gaseous species and a protruding baffle 40. A nozzle 36 provides a jet stream of process gases in order to ensure uniformity of the process gases at the surface of a semiconductor wafer 48. The configuration of the plasma etch reactor 20 enhances the range of densities for the plasma in the reactor 20, which range can be selected by adjusting more of the power supplies 30, 32.