Abstract: An instrument has been designed to study the pulsatile motion of the eye by analysis of a beam of light reflected from the corneal surface. A laser light beam probe of small spot size and low divergence strikes the cornea apex and the reflected movement is recorded by a sensor. Analysis of the beam movement reveals the energy in the eye pulse without the necessity of physically touching the eye. The value of the intraocular pressure is determined from the calculated power spectrum. The sensitivity, accuracy and efficiency of the light beam makes possible studying both eyes concurrently and comparison of the pulse parameters of onset, amplitude and duration reveals any delay in circulation to an eye.

Abstract: A method of and apparatus for processing semiconductor wafers which include observing optical characteristics of exposed undeveloped photoresist, without removing the wafers from the stepper is disclosed. The present invention includes the steps of loading a wafer having a layer of photoresist into a photolithography system, exposing the photoresist in accordance with an initial set of control parameters including exposure time, position of the wafer within the photolithography system, and/or focus change. Prior to developing the photoresist, optical characteristics of the exposed photoresist are observed using a phase contrast microscope which detects latent images. Then, according to the observations of the latent image, the initial set of control parameters are adjusted to generate a second set of control parameters.

Abstract: A method of and apparatus for processing semiconductor wafers which include observing optical characteristics of exposed undeveloped photoresist, without removing the wafers from the stepper is disclosed. The present invention includes the steps of loading a wafer having a layer of photoresist into a photolithography system, exposing the photoresist in accordance with an initial set of control parameters including exposure time, position of the wafer within the photolithography system, and/or focus change. Prior to developing the photoresist, optical characteristics of the exposed photoresist are observed using a phase contrast microscope which detects latent images. Then, according to the observations of the latent image, the initial set of control parameters are adjusted to generate a second set of control parameters.