Patents by Inventor Robert W. Rezuke

Robert W. Rezuke has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11000824
    Abstract: A filter composition effective in reacting with airborne or gaseous organic impurities, such as formaldehyde. The filter composition is formed from a filter substrate, such as for example, a fibrous web or extruded carbon block, treated with tris-(hydroxymethyl) aminomethane. The unexpected result of this combination is a longer lasting filter capable of adsorbing organic airborne impurities for a much longer period of time than an untreated filter media of the same type. The removal of formaldehyde is presented as an illustrious example.
    Type: Grant
    Filed: May 18, 2020
    Date of Patent: May 11, 2021
    Assignee: Graver Technologies LLC
    Inventors: Kartik Potukuchi, Robert W. Rezuke
  • Publication number: 20200276557
    Abstract: A filter composition effective in reacting with airborne or gaseous organic impurities, such as formaldehyde. The filter composition is formed from a filter substrate, such as for example, a fibrous web or extruded carbon block, treated with tris-(hydroxymethyl) aminomethane. The unexpected result of this combination is a longer lasting filter capable of adsorbing organic airborne impurities for a much longer period of time than an untreated filter media of the same type. The removal of formaldehyde is presented as an illustrious example.
    Type: Application
    Filed: May 18, 2020
    Publication date: September 3, 2020
    Inventors: Kartik Potukuchi, Robert W. Rezuke
  • Patent number: 10688468
    Abstract: A filter composition effective in reacting with airborne or gaseous organic impurities, such as formaldehyde. The filter composition is formed from a filter substrate, such as for example, a fibrous web or extruded carbon block, treated with tris-(hydroxymethyl) aminomethane. The unexpected result of this combination is a longer lasting filter capable of adsorbing organic airborne impurities for a much longer period of time than an untreated filter media of the same type. The removal of formaldehyde is presented as an illustrious example.
    Type: Grant
    Filed: October 21, 2016
    Date of Patent: June 23, 2020
    Assignee: Graver Technologies LLC
    Inventors: Robert W. Rezuke, Kartik Potukuchi
  • Publication number: 20170113203
    Abstract: A filter composition effective in reacting with airborne or gaseous organic impurities, such as formaldehyde. The filter composition is formed from a filter substrate, such as for example, a fibrous web or extruded carbon block, treated with tris-(hydroxymethyl) aminomethane. The unexpected result of this combination is a longer lasting filter capable of adsorbing organic airborne impurities for a much longer period of time than an untreated filter media of the same type. The removal of formaldehyde is presented as an illustrious example.
    Type: Application
    Filed: October 21, 2016
    Publication date: April 27, 2017
    Inventors: Robert W. Rezuke, Kartik Potukuchi
  • Patent number: 7022164
    Abstract: A clean, high efficiency, low pressure drop, adsorptive filter material that is porous and includes an acidic functional group. The filter can include, for example, a non-woven filter composite has a porous sulfonated divinyl benzene styrene copolymer beads having sulfonic acid functional side groups. The non-woven filter is used to remove molecular bases, including ammonia, organic amines, inides, aminoalcohols, alcoholoamines from the atmosphere used in semiconductor fabrication and other processes that require uncontaminated gaseous environments of high quality.
    Type: Grant
    Filed: August 25, 2003
    Date of Patent: April 4, 2006
    Assignee: Mykrolis Corporation
    Inventors: Oleg Kishkovich, Robert W. Rezuke, Devon Kinkead
  • Publication number: 20040154470
    Abstract: A clean, high efficiency, low pressure drop, adsorptive filter material that is porous and includes an acidic functional group. The filter can include, for example, a non-woven filter composite has a porous sulfonated divinyl benzene styrene copolymer beads having sulfonic acid functional side groups. The non-woven filter is used to remove molecular bases, including ammonia, organic amines, inides, aminoalcohols, alcoholoamines from the atmosphere used in semiconductor fabrication and other processes that require uncontaminated gaseous environments of high quality.
    Type: Application
    Filed: August 25, 2003
    Publication date: August 12, 2004
    Applicant: Extraction Systems, Inc
    Inventors: Oleg Kishkovich, Robert W. Rezuke, Devon Kinkead
  • Publication number: 20020166450
    Abstract: A clean, high efficieny, low pressure drop, adsorptive filter material that is porous and includes an acidic functional group. The filter can include, for example, a non-woven filter composite has a porous sulfonated divinyl benzene styrene copolymer beads having sulfonic acid functional side groups. The non-woven filter is used to remove molecular bases, including ammonia, organic amines, inides, aminoalcohols, alcoholoamines from the atmosphere used in semiconductor fabrication and other processes that require uncontaminated gaseous environments of high quality.
    Type: Application
    Filed: June 24, 2002
    Publication date: November 14, 2002
    Applicant: Extraction Systems, Inc.
    Inventors: Oleg Kishkovich, Robert W. Rezuke, Devon Kinkead
  • Patent number: 6447584
    Abstract: A clean, high efficiency, low pressure drop, adsorptive filter material that is porous and includes an acidic functional group. The filter can include, for example, a non-woven filter composite has a porous sulfonated divinyl benzene styrene copolymer beads having sulfonic acid functional side groups. The non-woven filter is used to remove molecular bases, including ammonia, organic amines, inides, aminoalcohols, alcoholoamines from the atmosphere used in semiconductor fabrication and other processes that require uncontaminated gaseous environments of high quality.
    Type: Grant
    Filed: August 20, 1999
    Date of Patent: September 10, 2002
    Assignee: Extraction Systems, Inc.
    Inventors: Oleg Kishkovich, Robert W. Rezuke, Devon Kinkhead
  • Patent number: 5626820
    Abstract: The invention features a clean room and a chemical air filter suitable for use in the air handling system of the clean room directly upstream of high-efficiency particulate air (HEPA) filters. The chemical filter is of the pleated filter type comprising an air permeable, relatively thick web of non-woven fibrous carrier material of pleated form. The web includes a matrix formed of a large multiplicity of synthetic fibers and is characterized in that activated carbon particles are distributed throughout the web, bound in the interstices of the matrix in a manner preventing loss to the air of particles in quantity substantially detrimental to the performance of the HEPA filter. The activated carbon particles are of the type selected to remove the predetermined gas-phase contaminant from the air from the source. The invention also features a non-off gassing filter casing that may easily be installed into existing clean room air handling systems.
    Type: Grant
    Filed: December 2, 1993
    Date of Patent: May 6, 1997
    Inventors: Devon A. Kinkead, Robert W. Rezuke, John K. Higley
  • Patent number: 5582865
    Abstract: A method of making a high efficiency, low pressure drop, adsorptive, non-woven filter composite is disclosed, comprising a high surface area chemically impregnated adsorbent, and a non-woven carrier material; and a method for forming said composite comprising dry application of the chemically impregnated adsorbent to the non-woven carrier material which is then heated and calendared with or without a cover sheet.
    Type: Grant
    Filed: January 12, 1994
    Date of Patent: December 10, 1996
    Assignee: Extraction Systems, Inc.
    Inventors: Robert W. Rezuke, Devon A. Kinkead