Abstract: Disclosed are methods and systems for locating and classifying optical sources. In one aspect, a pair of imaging spectrometers is orthogonally oriented relative to an optical axis to accommodate simultaneous creation of two diffraction profiles for each imaged optical source. Such orientation increases the accuracy of detecting diffraction profiles of interest (“DPI”), as a DPI will not be declared unless it is sensed by both spectrometers. Furthermore, the spectrometers' orientation allows data such as a two-dimensional angle of incidence to be collected from an identified DPI without identification of either DPI's 0th order ray segment, thereby increasing the accuracy of the collected data. Such increased accuracy in both data determinations allows optical sources to be more accurately located and classified as information such as wavelength, amplitude, etc. may be calculated from the detected DPI with a greater degree of accuracy. Furthermore, false DPI detections are minimized.

Abstract: Disclosed are methods and systems for locating and classifying optical sources. In one aspect, a pair of imaging spectrometers is orthogonally oriented relative to an optical axis to accommodate simultaneous creation of two diffraction profiles for each imaged optical source. Such orientation increases the accuracy of detecting diffraction profiles of interest (“DPI”), as a DPI will not be declared unless it is sensed by both spectrometers. Furthermore, the spectrometers' orientation allows data such as a two-dimensional angle of incidence to be collected from an identified DPI without identification of either DPI's 0th order ray segment, thereby increasing the accuracy of the collected data. Such increased accuracy in both data determinations allows optical sources to be more accurately located and classified as information such as wavelength, amplitude, etc. may be calculated from the detected DPI with a greater degree of accuracy. Furthermore, false DPI detections are minimized.