Patents by Inventor Robert Wayne Donis

Robert Wayne Donis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120288643
    Abstract: A method for affecting film growth on a substrate during a deposition process includes steps of: applying a first voltage or current to a first zone of a chuck adapted to hold the substrate in position, the film growth on at least a portion of the substrate proximate the first zone being affected as a function of a level of the first voltage or current; and applying a second voltage or current to a second zone of the chuck, the film growth on at least a portion of the substrate proximate the second zone being affected as a function of a level of the second voltage or current.
    Type: Application
    Filed: July 20, 2012
    Publication date: November 15, 2012
    Applicant: LSI CORPORATION
    Inventor: Robert Wayne Donis
  • Patent number: 7201633
    Abstract: An electromagnetic polish head (100) comprises at least one electromagnet. An embodiment may also include the addition of a slurry component or components that can be affected by an electromagnetic field. During polishing or planarization, a field or fields may be generated by the polish head (100) to affect the polishing of a wafer by attracting or repelling the slurry to a portion or portions of the substrate.
    Type: Grant
    Filed: February 22, 2005
    Date of Patent: April 10, 2007
    Assignee: LSI Logic Corporation
    Inventor: Robert Wayne Donis