Patents by Inventor Robert Weller

Robert Weller has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Question-answer reference data set generation for artificial intelligence
    Patent number: 12339881
    Abstract: In an example embodiment, a system is provided that takes a knowledge graph as input and generates multiple question templates based on predefined query types. These query types may be, for example, SPARQL query types and may also be configurable. The system repeatedly presents a single randomly or pseudo-randomly picked question template to a user, and asks the user to type a corresponding natural language question. The system persists the answer provided by the user with the question in a specialized format. Then, for each typed question, the system creates additional linguistic variations and asks users to rate them.
    Type: Grant
    Filed: January 30, 2023
    Date of Patent: June 24, 2025
    Assignee: SAP SE
    Inventors: Guilherme Ehrhardt Soares Ferreira da Costa, Jan Portisch, Katharina Minninger, Michael Hladik, Robert Weller
  • QUESTION-ANSWER REFERENCE DATA SET GENERATION FOR ARTIFICIAL INTELLIGENCE
    Publication number: 20240273123
    Abstract: In an example embodiment, a system is provided that takes a knowledge graph as input and generates multiple question templates based on predefined query types. These query types may be, for example, SPARQL query types and may also be configurable. The system repeatedly presents a single randomly or pseudo-randomly picked question template to a user, and asks the user to type a corresponding natural language question. The system persists the answer provided by the user with the question in a specialized format. Then, for each typed question, the system creates additional linguistic variations and asks users to rate them.
    Type: Application
    Filed: January 30, 2023
    Publication date: August 15, 2024
    Inventors: Guilherme Ehrhardt Soares Ferreira da Costa, Jan Portisch, Katharina Minninger, Michael Hladik, Robert Weller
  • Inclusion of nitrogen at the silicon dioxide-silicon carbide interface for passivation of interface defects
    Publication number: 20060024978
    Abstract: In one aspect the present invention provides a method for manufacturing a silicon carbide semiconductor device. A layer of silicon dioxide is formed on a silicon carbide substrate and nitrogen is incorporated at the silicon dioxide/silicon carbide interface. In one embodiment, nitrogen is incorporated by annealing the semiconductor device in nitric oxide or nitrous oxide. In another embodiment, nitrogen is incorporated by annealing the semiconductor device in ammonia. In another aspect, the present invention provides a silicon carbide semiconductor device that has a 4H-silicon carbide substrate, a layer of silicon dioxide disposed on the 4H-silicon carbide substrate and a region of substantial nitrogen concentration at the silicon dioxide/silicon carbide interface.
    Type: Application
    Filed: May 5, 2005
    Publication date: February 2, 2006
    Applicants: Vanderbilt University, Auburn University
    Inventors: Gilyong Chung, Chin-Che Tin, John Williams, Kyle McDonald, Massimiliano De Ventra, Robert Weller, Socrates Pantelides, Leonard Feldman