Abstract: There is provided a transparent composite conductor. The composite conductor has a first layer that includes a transparent conductive material and a second layer that includes a fluorinated acid polymer.

Abstract: The present invention is drawn to the use of alkanes that are highly transparent to UV wavelengths ranging from about 170 nm to 260 nm in optical couplants, optical cements, optical elements, optical inspection media for semiconductor wafers and devices, and immersion photolithography, particularly at 193 and 248 nm exposure wavelength.

Abstract: The present invention provides a clean closed loop fluid transport system and methods for recycling low absorbance liquid alkanes. The alkanes can be advantageously employed as immersion liquids in the production of electronic or integrated optical circuit elements by photolithographic methods employing ultraviolet wavelengths.

Abstract: Hexafluoroisobutylene and its higher homologs are easily reacted with SO3 to give fluorosulfates of the formula CH2?C(R)CF2OSO2F, wherein R is a linear branched or cyclic fluoroalkyl group comprised of 1 to 10 carbon atoms and may contain ether oxygen. These compounds react under mild conditions with many nucleophiles to give CH2?C(R)CF2X, where X is derived from the nucleophile. This reaction provides a route to many substituted hexafluoroisobutylenes, which copolymerize easily with other fluoro- and hydrocarbon monomers such as vinylidene fluoride and ethylene.

Abstract: Hexafluoroisobutylene and its higher homologs are easily reacted with SO3 to give fluorosulfates of the formula CH2?C(R)CF2OSO2F, wherein R is a linear, branched or cyclic fluoroalkyl group comprised of 1 to 10 carbon atoms and may contain ether oxygen. These compounds react under mild conditions with many nucleophiles to give CH2?C(R)CF2X, where X is derived from the nucleophile. This reaction provides a route to many substituted hexafluoroisobutylenes, which copolymerize easily with other fluoro- and hydrocarbon monomers such as vinylidene fluoride and ethylene.

Abstract: A one layer coating system has been developed for plastic substrates. The one coating system low reflective layer consists of VF2/TFE/HFP, VF2/HFP, VF2/TFE/PMVE.

Abstract: Coatings containing fluoropolymers and fluorinated telomers have been developed. The coatings are suitable for coating plastic substrates and are suitable for use in applications wherein relatively low reflectivity is desired.

Abstract: Disclosed are packages holding liquid alkanes exhibiting high transparency and photochemical stability at wavelengths of about 193 nm. The packages holding the liquid alkanes can be stored for a period of months or longer with little or no loss of transparency and stability. Also disclosed are methods for preparing the packages.

Abstract: The present invention is drawn to liquid perfluoro-n-alkanes that are highly transparent to UV wavelengths ranging from about 150 nm to 165 nm, and to the method by which high transparency may be obtained. The liquid perfluoro-n-alkanes of the invention are useful in optical couplants, optical cements, optical elements, optical inspection media for semiconductor wafers and devices, and immersion photolithography at 157 nm exposure wavelength.

Abstract: The present invention is drawn to the use of alkanes that are highly transparent to UV wavelengths ranging from about 170 nm to 260 nm in optical couplants, optical cements, optical elements, optical inspection media for semiconductor wafers and devices, and immersion photolithography, particularly at 193 and 248 nm exposure wavelength.

Abstract: This invention concerns liquid perfluoro-n-alkanes for use in applications demanding high transparency at UV wavelengths ranging from about 150 to 165 nm, especially 157 nm. Uses include optical couplants, optical cements, optical elements, optical inspection media for semiconductor wafers and devices, and most especially immersion photolithography at 157 nm exposure wavelength.

Abstract: This invention concerns radiation durable organic compositions which are well-suited for use in 157 nm lithography by virtue of their high transparency and excellent radiation durability, and to a process for the preparation thereof.

Abstract: This invention relates to processes useful for fabricating electronic devices, more particularly to a process for laminating a layer of dielectric material onto a semiconductor.