Abstract: Embodiments of the invention relate to correcting errors in scanning electron measurements during measuring structural dimensions of an integrated circuit for optical proximity correction by extracting feature edges of a test pattern within an image, calculating at least one scaling error of the image by comparing the extracted feature edges of assist structures with a layout pattern, modifying feature edges of test structures within the test pattern by incorporating the at least one scaling error so as to at least partially compensate the scaling errors, and verifying a model for optical proximity corrections and/or model input data by using the modified feature edges of the test structures.

Abstract: System and method of correcting etch and lithographic processes on a photo mask provides for performing an etch proximity correction on a layout design pattern. A first and a second intermediate layout pattern each being based on the etch proximity corrected layout design pattern are provided. An optical proximity correction on the first intermediate layout pattern is performed so as to generate a modified first intermediate layout pattern. Scatterbar generation on the second intermediate layout pattern is performed so as to generate a modified second intermediate layout pattern including scatterbars. Generating a mask layout pattern being based on the first and the second modified intermediate layout pattern is performed.

Abstract: Embodiments of the invention relate to correcting errors in scanning electron measurements during measuring structural dimensions of an integrated circuit for optical proximity correction by extracting feature edges of a test pattern within an image, calculating at least one scaling error of the image by comparing the extracted feature edges of assist structures with a layout pattern, modifying feature edges of test structures within the test pattern by incorporating the at least one scaling error so as to at least partially compensate the scaling errors, and verifying a model for optical proximity corrections and/or model input data by using the modified feature edges of the test structures.

Abstract: A cooling system particularly suitable for use in the air-conditioning of buildings is described. The system includes:(a) A cooling zone containing a conduit for cooling fluid, the conduit encountering the heat load, means in the conduit for propelling the fluid through the conduit, and cooling fluid in the conduit;(b) A refrigeration zone containing a closed refrigeration circuit for refrigerant, chiller means in the circuit for extracting energy from the refrigerant, means for circulating refrigerant in the circuit and refrigerant in the circuit; and(c) Collection means connected to the refrigeration zone for removing energy extracted by the chiller.The cooling and refrigeration zones are connectable through a heat exchanger for transfer of energy between the fluid and the refrigerant and the refrigerant comprises a slurry of ice and water which may be partly stored in a reservoir constituting part of the refrigeration zone.

Abstract: A cooling system particularly suitable for use in the air-conditioning of buildings is described. The system includes:(a) A cooling zone containing a conduit for cooling fluid, the conduit encountering the heat load, means in the conduit for propelling the fluid through the conduit, and cooling fluid in the conduit;(b) A refrigeration zone containing a closed refrigeration circuit for refrigerant, chiller means in the circuit for extracting energy from the refrigerant, means for circulating refrigerant in the circuit and refrigerant in the circuit; and(c) Collection means connected to the refrigeration zone for removing energy extracted by the chiller.The cooling and refrigeration zones are connectable through a heat exchanger for transfer of energy between the fluid and the refrigerant. The refrigeration circuit includes a reservoir constituting part of its zone.