Patents by Inventor Robert William Courtenay

Robert William Courtenay has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for coating a wafer
    Publication number: 20040052956
    Abstract: Disclosed is a method and apparatus for coating liquid films on to the surface of a wafer substrate by rotating the substrate at a speed sufficient to cause a liquid, through centrifugal effect, to flow outwardly toward the perimeter of the surface and form a substantially uniform thickness liquid coating thereon and starting at the central region of the wafer surface and moving radially outward therefrom, spraying a fine mist of the liquid to the surface of the wafer.
    Type: Application
    Filed: September 5, 2003
    Publication date: March 18, 2004
    Inventor: Robert William Courtenay
  • Apparatus for coating of a semiconductor wafer
    Patent number: 6666917
    Abstract: Disclosed is a method and apparatus for coating liquid films on to the surface of a wafer substrate by rotation the substrate at a speed sufficient to cause a liquid, through centrifugal effect, to flow outwardly toward the perimeter of the surface and form a substantially uniform thickness liquid coating thereon and starting at the central region of the wafer surface and moving radially outward therefrom, spraying a fine mist of the liquid to the surface of the wafer.
    Type: Grant
    Filed: May 22, 2002
    Date of Patent: December 23, 2003
    Assignee: Micron Technology, Inc.
    Inventor: Robert William Courtenay
  • Apparatus for coating of a semiconductor wafer
    Publication number: 20020146516
    Abstract: Disclosed is a method and apparatus for coating liquid films on to the surface of a wafer substrate by rotation the substrate at a speed sufficient to cause a liquid, through centrifugal effect, to flow outwardly toward the perimeter of the surface and form a substantially uniform thickness liquid coating thereon and starting at the central region of the wafer surface and moving radially outward therefrom, spraying a fine mist of the liquid to the surface of the wafer.
    Type: Application
    Filed: May 22, 2002
    Publication date: October 10, 2002
    Inventor: Robert William Courtenay
  • Method of coating a semiconductor wafer
    Patent number: 6423380
    Abstract: Disclosed is a method and apparatus for coating liquid films on to the surface of a wafer substrate by rotation the substrate at a speed sufficient to cause a liquid, through centrifugal effect, to flow outwardly toward the perimeter of the surface and form a substantially uniform thickness liquid coating thereon and starting at the central region of the wafer surface and moving radially outward therefrom, spraying a fine mist of the liquid to the surface of the wafer.
    Type: Grant
    Filed: April 14, 1999
    Date of Patent: July 23, 2002
    Assignee: Micron Technology, Inc.
    Inventor: Robert William Courtenay
  • Method and apparatus for improved coating of a semiconductor wafer
    Patent number: 5902399
    Abstract: A method and apparatus for coating liquid films on to the surface of a wafer substrate by rotation the substrate at a speed sufficient to cause a liquid, through centrifugal effect, to flow outwardly toward the perimeter of the surface and form a substantially uniform thickness liquid coating thereon and starting at the central region of the wafer surface and moving radially outward therefrom, spraying a fine mist of the liquid to the surface of the wafer.
    Type: Grant
    Filed: October 10, 1997
    Date of Patent: May 11, 1999
    Assignee: Micron Technology, Inc.
    Inventor: Robert William Courtenay