Abstract: A biaxially oriented composite film includes a polyester substrate supporting one or more coatings on one or both surfaces of said substrate, wherein the polyester substrate is a biaxially oriented film; wherein the one or more coatings is/are derived from a predominantly inorganic hardcoat coating composition including inorganic particles contained in a polymerisable predominantly inorganic matrix; and wherein the biaxially oriented composite film has been annealed at a temperature Ta (° C.) above Tg where Tg<Ta?Tg+100 (° C.) for a time t after thermal equilibrium where 1 hour ?t?72 hours. A method of making the film is provided.

Abstract: A biaxially oriented composite film includes a polyester substrate supporting one or more coatings on one or both surfaces of said substrate, wherein the polyester substrate is a biaxially oriented film; wherein the one or more coatings is/are derived from a predominantly inorganic hardcoat coating composition including inorganic particles contained in a polymerisable predominantly inorganic matrix; and wherein the biaxially oriented composite film has been annealed at a temperature Ta (° C.) above Tg where Tg<Ta?Tg+100 (° C.) for a time t after thermal equilibrium where 1 hour ?t?72 hours. A method of making the film is provided.

Abstract: A method of preventing or minimizing the formation of haze in a biaxially oriented polyester film during the annealing of said film above its glass transition temperature, said method comprising: (a) selecting a biaxially oriented polyester film having glass transition temperature (Tg (° C.

Abstract: A method of manufacture of a coated polymeric film which comprises performing in sequence the steps of: (i) forming a substrate layer comprising poly(ethylene naphthalate) having a thickness in a range from 50 ?m to 250 ?m; (ii) stretching the substrate layer in at least one direction; (iii) heat-setting the substrate layer under dimensional restraint at a tension in the range of about 19 to about 75 kg/m of film width, at a temperature above the glass transition temperature of the poly(ethylene naphthalate) but below the melting temperature thereof; (iv) heat-stabilizing the substrate layer under a tension of less than 5 kg/m of film width, and at a temperature above the glass transition temperature of the poly(ethylene naphthalate) but below the melting temperature thereof; and (v) disposing a coating layer on a surface of the substrate layer by a process comprising applying a planarizing coating composition thereto such that a surface of said coating layer exhibits an Ra value of less than 0.

Abstract: A composite film comprising a heat-stabilised, heat-set, oriented poly(ethylene naphthalate) substrate, and a coating layer having a surface; wherein said substrate exhibits one or more of: (i) a shrinkage at 30 mins at 230° C. of less than 1%; and/or (ii) a residual dimensional change ?Lr measured at 25° C. before and after heating the substrate from 8° C. to 200° C. and then cooling to 8° C., of less than 0.75% of the original dimension; and/or (iii) a coefficient of linear thermal expansion (CLTE) within the temperature range from ?40° C. to +100° C. of less than 40×10?6/° C.; and wherein the surface of said coating layer exhibits an Ra value of less than 0.6 nm, and/or an Rq value of less than 0.8 nm, the thickness of the substrate is between 50 and 250 ?m and wherein the number of surface peaks in the range 300 to 600 nm per 5 cm2 area (N(300-600)) of the film is less than 50.

Abstract: A donor element useful in an assemblage for imaging by exposure to light comprises a support layer, a light-to-heat conversion layer disposed adjacent the support layer containing a light absorber, and a transfer layer disposed adjacent the light-to-heat conversion layer opposite the support layer. The donor element also includes a release-modifier disposed between the support layer and the transfer layer.

Abstract: The use of a coating composition comprising: (a) from about 5 to about 50 weight percent solids, the solids comprising from about 10 to about 70 weight percent silica and from about 90 to about 30 weight percent of a partially polymerized organic silanol of the general formula RSi(OH)3, wherein R is selected from methyl and up to about 40% of a group selected from the group consisting of vinyl, phenyl, gamma-glycidoxypropyl, and gamma-methacryloxypropyl, and (b) from about 95 to about 50 weight percent solvent, the solvent comprising from about 10 to about 90 weight percent water and from about 90 to about 10 weight percent lower aliphatic alcohol, wherein the coating composition has a pH of from about 3.0 to about 8.0, for the purpose of improving the surface smoothness of a polymeric substrate, particularly a heat-stabilised, heat-set, oriented polyester substrate, and use of said coated substrate in the manufacture of an electronic or opto-electronic device containing a conjugated conductive polymer.

Abstract: The use of a coating composition comprising: (a) from about 5 to about 50 weight percent solids, the solids comprising from about 10 to about 70 weight percent silica and from about 90 to about 30 weight percent of a partially polymerized organic silanol of the general formula RSi(OH)3, wherein R is selected from methyl and up to about 40% of a group selected from the group consisting of vinyl, phenyl, gamma-glycidoxypropyl, and gamma-methacryloxypropyl, and (b) from about 95 to about 50 weight percent solvent, the solvent comprising from about to about 90 weight percent water and from about 90 to about 10 weight percent lower aliphatic alcohol, wherein the coating composition has a pH of from about 3.0 to about 8.0, for the purpose of improving the surface smoothness of a polymeric substrate, particularly a heat-stabilised, heat-set, oriented polyester substrate, and use of said coated substrate in the manufacture of an electronic or opto-electronic device containing a conjugated conductive polymer.

Abstract: The use of a coating composition comprising: (a) from about 5 to about 50 weight percent solids, the solids comprising from about 10 to about 70 weight percent silica and from about 90 to about 30 weight percent of a partially polymerized organic silanol of the general formula RSi(OH)3, wherein R is selected from methyl and up to about 40% of a group selected from the group consisting of vinyl, phenyl, gamma-glycidoxypropyl, and gamma-methacryloxypropyl, and (b) from about 95 to about 50 weight percent solvent, the solvent comprising from about 10 to about 90 weight percent water and from about 90 to about 10 weight percent lower aliphatic alcohol, wherein the coating composition has a pH of from about 3.0 to about 8.0, for the purpose of improving the surface smoothness of a polymeric substrate, particularly a heat-stabilised, heat-set, oriented polyester substrate, and use of said coated substrate in the manufacture of an electronic or optoelectronic device containing a conjugated conductive polymer.

Abstract: A donor element useful in an assemblage for imaging by exposure to light comprises a support layer, a light-to-heat conversion layer disposed adjacent the support layer containing a light absorber, and a transfer layer disposed adjacent the light-to-heat conversion layer opposite the support layer. The donor element also includes a release-modifier disposed between the support layer and the transfer layer.

Abstract: A donor element useful in an assemblage for imaging by exposure to radiation comprises a substrate, a transfer-assist layer disposed adjacent the substrate comprising one or more water-soluble or water-dispersible radiation-absorbing compound(s), and a transfer layer disposed adjacent the transfer-assist layer opposite the substrate.

Abstract: A method of preventing or minimising the formation of haze in a biaxially oriented polyester film during the annealing of said film above its glass transition temperature, said method comprising: (a) selecting a biaxially oriented polyester film having glass transition temperature (Tg (° C.

Abstract: A method of manufacture of a composite film, and a method of manufacturing an electronic or opto-electronic device, said method comprising the steps of (i) forming a polymeric substrate layer; (ii) stretching the substrate layer in at least one direction; (iii) heat-setting under dimensional restraint at a tension in the range of about 19 to about 75 kg/m of film width, at a temperature above the glass transition temperature of the polymer of the substrate layer but below the melting temperature thereof; (iv) heat-stabilising the film at a temperature above the glass transition temperature of the polymer of the substrate layer but below the melting temperature thereof; (v) applying a planarising coating composition such that the surface of said coated substrate exhibits an Ra value of less than 0.6 nm, and/or an Rq value of less than 0.

Abstract: A donor element useful in an assemblage for imaging by exposure to light comprises a support layer formed by a stretching process, a light-to-heat conversion layer disposed adjacent the support layer containing a light absorber, and a transfer layer disposed adjacent the light-to-heat conversion layer opposite the support layer. The light-to-heat conversion layer is coated on the support prior to completion of the stretching process.