Abstract: An optical pulse for an extreme ultraviolet (EUV) light source may be formed by illuminating a semiconductor material of a modulation system with a first light beam having a first wavelength; applying a voltage to the semiconductor material for a time duration, the applied voltage being sufficient to modify an index of refraction of the semiconductor material such that a polarization state of a light beam having a second wavelength passing through the semiconductor material is modified to pass through at least one polarization-based optical element of the modulation system; and forming an optical pulse by passing a second light beam having the second wavelength through the semiconductor material during the time duration.

Abstract: An optical pulse for an extreme ultraviolet (EUV) light source may be formed by illuminating a semiconductor material of a modulation system with a first light beam having a first wavelength; applying a voltage to the semiconductor material for a time duration, the applied voltage being sufficient to modify an index of refraction of the semiconductor material such that a polarization state of a light beam having a second wavelength passing through the semiconductor material is modified to pass through at least one polarization-based optical element of the modulation system; and forming an optical pulse by passing a second light beam having the second wavelength through the semiconductor material during the time duration.

Abstract: An optical pulse for an extreme ultraviolet (EUV) light source may be formed by illuminating a semiconductor material of a modulation system with a first light beam having a first wavelength; applying a voltage to the semiconductor material for a time duration, the applied voltage being sufficient to modify an index of refraction of the semiconductor material such that a polarization state of a light beam having a second wavelength passing through the semiconductor material is modified to pass through at least one polarization-based optical element of the modulation system; and forming an optical pulse by passing a second light beam having the second wavelength through the semiconductor material during the time duration.

Abstract: An optical pulse for an extreme ultraviolet (EUV) light source may be formed by illuminating a semiconductor material of a modulation system with a first light beam having a first wavelength; applying a voltage to the semiconductor material for a time duration, the applied voltage being sufficient to modify an index of refraction of the semiconductor material such that a polarization state of a light beam having a second wavelength passing through the semiconductor material is modified to pass through at least one polarization-based optical element of the modulation system; and forming an optical pulse by passing a second light beam having the second wavelength through the semiconductor material during the time duration.

Abstract: Techniques are disclosed for sensing a location of laser and/or other optical signals. According to certain embodiments of the invention, an electro-optical assembly can include a detector array coupled to one or more lenses for detecting the signals. Outputs of the photo detectors can be processed using peak detection and/or other techniques to conserve power, help ensure detection, and avoid the need for moving parts.

Abstract: Techniques are disclosed for sensing a location of laser and/or other optical signals. According to certain embodiments of the invention, an electro-optical assembly can include a detector array coupled to one or more lenses for detecting the signals. Outputs of the photo detectors can be processed using peak detection and/or other techniques to conserve power, help ensure detection, and avoid the need for moving parts.

Abstract: A fuel supply assembly is provided that may allow for use of vaporized fuel to power an engine and enhance fuel efficiency. The fuel supply assembly may include a vaporizing tank, a heating source, a temperature control and a monitoring and control system configured to control intermixing of ambient air and vaporized gasoline to maintain a desired hydrocarbon level in an exhaust.

Abstract: A fuel supply assembly is provided that may allow for use of vaporized fuel to power an engine and enhance fuel efficiency. The fuel supply assembly may include a vaporizing tank, a heating source, a temperature control and a monitoring and control system configured to control intermixing of ambient air and vaporized gasoline to maintain a desired hydrocarbon level in an exhaust.

Abstract: A fuel supply assembly is provided that may allow for use of vaporized fuel to power an engine and enhance fuel efficiency. The fuel supply assembly may include a vaporizing tank, a heating source, a temperature control and a monitoring and control system configured to control intermixing of ambient air and vaporized gasoline to maintain a desired hydrocarbon level in an exhaust.

Abstract: A fuel supply assembly is provided that may allow for use of vaporized fuel to power an engine and enhance fuel efficiency. The fuel supply assembly may include a vaporizing tank, a heating source, a temperature control and a monitoring and control system configured to control intermixing of ambient air and vaporized gasoline to maintain a desired hydrocarbon level in an exhaust.

Abstract: A fuel supply assembly is provided that may allow for use of vaporized fuel to power an engine and enhance fuel efficiency. The fuel supply assembly may include a vaporizing tank, a heating source, a temperature control and a monitoring and control system configured to control intermixing of ambient air and vaporized gasoline to maintain a desired hydrocarbon level in an exhaust.