Patents by Inventor Robert Won Chol Kim

Robert Won Chol Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9397646
    Abstract: Systems and methods for delay control are described herein. In one embodiment, a delay circuit comprises a first delay path and a second delay path. The delay circuit also comprises a plurality of switches, wherein each switch is coupled between different points on the first and second delay paths, and each switch is configured to turn on or off in response to a respective one of a plurality of select signals. The delay circuit further comprises a multiplexer having a first input coupled to an output of the first delay path, a second input coupled to an output of the second delay path, and an output coupled to an output of the delay circuit, wherein the multiplexer is configured to selectively couple one of the outputs of the first and second delay paths to the output of the delay circuit in response to a second select signal.
    Type: Grant
    Filed: September 17, 2014
    Date of Patent: July 19, 2016
    Assignee: QUALCOMM Incorporated
    Inventors: Guneet Singh, Yuehchun Claire Cheng, Jan Christian Diffenderfer, Vaishnav Srinivas, Robert Won Chol Kim
  • Patent number: 9312326
    Abstract: Capacitor structures capable of providing both low-voltage capacitors and high-voltage capacitors are described herein. In one embodiment, a capacitor structure comprises a first electrode formed from a first metal layer, a second electrode formed from a second metal layer, and a third electrode formed from a third metal layer, wherein second and third electrodes are spaced farther apart than the first and second electrodes. The capacitor structure also comprises a first dielectric layer between the first and second electrodes, and a second dielectric layer between the second and third metal layers, wherein the second dielectric layer has a larger thickness than the first dielectric layer. The first electrode is coupled to a first power-supply rail, the third electrode is coupled to a second power-supply rail, and the second power-supply rail has a higher power-supply voltage than the first power-supply rail.
    Type: Grant
    Filed: April 16, 2015
    Date of Patent: April 12, 2016
    Assignee: QUALCOMM Incorporated
    Inventors: Renatas Jakushokas, Vaishnav Srinivas, Robert Won Chol Kim
  • Publication number: 20160079971
    Abstract: Systems and methods for delay control are described herein. In one embodiment, a delay circuit comprises a first delay path and a second delay path. The delay circuit also comprises a plurality of switches, wherein each switch is coupled between different points on the first and second delay paths, and each switch is configured to turn on or off in response to a respective one of a plurality of select signals. The delay circuit further comprises a multiplexer having a first input coupled to an output of the first delay path, a second input coupled to an output of the second delay path, and an output coupled to an output of the delay circuit, wherein the multiplexer is configured to selectively couple one of the outputs of the first and second delay paths to the output of the delay circuit in response to a second select signal.
    Type: Application
    Filed: September 17, 2014
    Publication date: March 17, 2016
    Inventors: Guneet Singh, Yuehchun Claire Cheng, Jan Christian Diffenderfer, Vaishnav Srinivas, Robert Won Chol Kim
  • Publication number: 20150294970
    Abstract: Capacitor, resistor and resistor-capacitor components are described herein. In one embodiment, a die comprises first and second metal interconnect layers in a back end of line (BEOL) of the die, and an insulator between the first and second metal interconnect layers. The die also comprises a metal-insulator-metal (MIM) capacitor embedded in the insulator, the MIM capacitor comprising a first metal plate, a second metal plate, and a dielectric layer between the first and second metal plates. The die further comprises a metal resistor embedded in the insulator, wherein the metal resistor and the first metal plate of the MIM capacitor are formed from a same metal layer. In one example, the dielectric layer may have a higher dielectric constant than the insulator. In another example, the second metal plate of the MIM capacitor may overlap the metal resistor.
    Type: Application
    Filed: April 14, 2014
    Publication date: October 15, 2015
    Applicant: QUALCOMM INCORPORATED
    Inventors: Renatas Jakushokas, Robert Won Chol Kim, Vaishnav Srinivas
  • Publication number: 20150221716
    Abstract: Capacitor structures capable of providing both low-voltage capacitors and high-voltage capacitors are described herein. In one embodiment, a capacitor structure comprises a first electrode formed from a first metal layer, a second electrode formed from a second metal layer, and a third electrode formed from a third metal layer, wherein second and third electrodes are spaced farther apart than the first and second electrodes. The capacitor structure also comprises a first dielectric layer between the first and second electrodes, and a second dielectric layer between the second and third metal layers, wherein the second dielectric layer has a larger thickness than the first dielectric layer. The first electrode is coupled to a first power-supply rail, the third electrode is coupled to a second power-supply rail, and the second power-supply rail has a higher power-supply voltage than the first power-supply rail.
    Type: Application
    Filed: April 16, 2015
    Publication date: August 6, 2015
    Inventors: Renatas Jakushokas, Vaishnav Srinivas, Robert Won Chol Kim
  • Patent number: 9041148
    Abstract: Capacitor structures capable of providing both low-voltage capacitors and high-voltage capacitors are described herein. In one embodiment, a capacitor structure comprises a low-voltage capacitor and a high-voltage capacitor. The low-voltage capacitor comprises a first electrode formed from a first metal layer, a second electrode formed from a second metal layer, a third electrode formed from a third metal layer, a first dielectric layer between the first and second electrodes, and a second dielectric layer between the second and third electrodes. The high-voltage capacitor comprises a fourth electrode formed from the first metal layer, a fifth electrode formed from the third metal layer, and a third dielectric layer between the fourth and fifth electrodes, wherein the third dielectric layer is thicker than either the first dielectric layer or the second dielectric layer.
    Type: Grant
    Filed: June 13, 2013
    Date of Patent: May 26, 2015
    Assignee: QUALCOMM Incorporated
    Inventors: Renatas Jakushokas, Vaishnav Srinivas, Robert Won Chol Kim
  • Patent number: 9032358
    Abstract: An integrated circuit includes core logic and a plurality of interface blocks disposed about a periphery of the core logic. A plurality of input or output (I/O) circuits is assigned to one of the plurality of interface blocks. The I/O circuits include external I/O circuits coupled to a device other than the integrated circuit and internal I/O circuits coupled to the integrated circuit. Each interface block includes a first plurality of I/O circuits disposed on a first side of the interface block and a second plurality of I/O circuits disposed on a second side of the interface block. Each interface block also includes interface logic for the interface block between the first plurality of I/O circuits and the second plurality of I/O circuits, and a logic hub that includes a clock distribution of minimal length that drives launch logic and capture logic to form the I/O circuits of the interface block.
    Type: Grant
    Filed: March 6, 2013
    Date of Patent: May 12, 2015
    Assignee: QUALCOMM Incorporated
    Inventors: Vaishnav Srinivas, Robert Won Chol Kim, Philip Michael Clovis, David Ian West
  • Publication number: 20140367757
    Abstract: Capacitor structures capable of providing both low-voltage capacitors and high-voltage capacitors are described herein. In one embodiment, a capacitor structure comprises a low-voltage capacitor and a high-voltage capacitor. The low-voltage capacitor comprises a first electrode formed from a first metal layer, a second electrode formed from a second metal layer, a third electrode formed from a third metal layer, a first dielectric layer between the first and second electrodes, and a second dielectric layer between the second and third electrodes. The high-voltage capacitor comprises a fourth electrode formed from the first metal layer, a fifth electrode formed from the third metal layer, and a third dielectric layer between the fourth and fifth electrodes, wherein the third dielectric layer is thicker than either the first dielectric layer or the second dielectric layer.
    Type: Application
    Filed: June 13, 2013
    Publication date: December 18, 2014
    Inventors: Renatas Jakushokas, Vaishnav Srinivas, Robert Won Chol Kim
  • Publication number: 20140253228
    Abstract: An integrated circuit includes core logic and a plurality of interface blocks disposed about a periphery of the core logic. A plurality of input or output (I/O) circuits is assigned to one of the plurality of interface blocks. The I/O circuits include external I/O circuits coupled to a device other than the integrated circuit and internal I/O circuits coupled to the integrated circuit. Each interface block includes a first plurality of I/O circuits disposed on a first side of the interface block and a second plurality of I/O circuits disposed on a second side of the interface block. Each interface block also includes interface logic for the interface block between the first plurality of I/O circuits and the second plurality of I/O circuits, and a logic hub that includes a clock distribution of minimal length that drives launch logic and capture logic to form the I/O circuits of the interface block.
    Type: Application
    Filed: March 6, 2013
    Publication date: September 11, 2014
    Applicant: QUALCOMM Incorporated
    Inventors: Vaishnav Srinivas, Robert Won Chol Kim, Philip Michael Clovis, David Ian West