Patents by Inventor Roberto Klinger

Roberto Klinger has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Technique for forming a dielectric etch stop layer above a structure including closely spaced lines
    Patent number: 7763532
    Abstract: When forming line structures of semiconductor devices in accordance with the 90 nm technology, sidewall spacers of the lines are reduced in size immediately prior to the deposition of an etch stop layer that is formed on the device layer. Due to the reduced spacer elements or due to a complete removal of the spacer elements, the subsequent deposition of the etch stop layer and of the interlayer dielectric is significantly enhanced with respect to void formation and defect rate.
    Type: Grant
    Filed: June 6, 2005
    Date of Patent: July 27, 2010
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Kai Frohberg, Matthias Schaller, Roberto Klinger