Patents by Inventor Robertus Cornelis Martinus De Kruif
Robertus Cornelis Martinus De Kruif has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11635681Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.Type: GrantFiled: July 14, 2021Date of Patent: April 25, 2023Assignee: ASML Netherlands B.V.Inventors: Derk Servatius Gertruda Brouns, Dennis De Graaf, Robertus Cornelis Martinus De Kruif, Paul Janssen, Matthias Kruizinga, Arnoud Willem Notenboom, Daniel Andrew Smith, Beatrijs Louise Marie-Joseph Katrien Verbrugge, James Norman Wiley
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Publication number: 20210341831Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.Type: ApplicationFiled: July 14, 2021Publication date: November 4, 2021Applicant: ASML Netherlands B.V.Inventors: Derk Servatius Gertruda BROUNS, Dennis DE GRAAF, Robertus Cornelis Martinus DE KRUIF, Paul JANSSEN, Matthias KRUIZINGA, Arnoud Willem NOTENBOOM, Daniel Andrew SMITH, Beatrijs Louise Marie-Josep VERBRUGGE, James Norman WILEY
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Patent number: 11086213Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.Type: GrantFiled: February 24, 2020Date of Patent: August 10, 2021Assignee: ASML Netherlands B.V.Inventors: Derk Servatius Gertruda Brouns, Dennis De Graaf, Robertus Cornelis Martinus De Kruif, Paul Janssen, Matthias Kruizinga, Amoud Willem Notenboom, Daniel Andrew Smith, Beatrijs Louise Marie-Joseph Katrien Verbrugge, James Norman Wiley
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Patent number: 11029595Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.Type: GrantFiled: December 9, 2019Date of Patent: June 8, 2021Assignee: ASML Netherlands B.V.Inventors: Derk Servatius Gertruda Brouns, Dennis De Graaf, Robertus Cornelis Martinus De Kruif, Paul Janssen, Matthias Kruizinga, Arnoud Willem Notenboom, Daniel Andrew Smith, Beatrijs Louise Marie-Joseph Katrien Verbrugge, James Norman Wiley
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Publication number: 20200117082Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.Type: ApplicationFiled: December 9, 2019Publication date: April 16, 2020Applicant: ASML Netherlands B.V.Inventors: Derk Servatius Gertruda BROUNS, Dennis DE GRAAF, Robertus Cornelis Martinus DE KRUIF, Paul JANSSEN, Matthias KRUIZINGA, Arnoud Willem NOTENBOOM, Daniel Andrew SMITH, Beatrijs Louise Marie-Josep VERBRUGGE, James Norman WILEY
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Patent number: 10571800Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.Type: GrantFiled: February 1, 2016Date of Patent: February 25, 2020Assignee: ASML Netherlands B.V.Inventors: Derk Servatius Gertruda Brouns, Dennis De Graaf, Robertus Cornelis Martinus De Kruif, Paul Janssen, Matthias Kruizinga, Arnoud Willem Notenboom, Daniel Andrew Smith, Beatrijs Louise Marie-Joseph Katrien Verbrugge, James Norman Wiley
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Publication number: 20180314150Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.Type: ApplicationFiled: February 1, 2016Publication date: November 1, 2018Applicant: ASML Netherlands B.V.Inventors: Derk Servatius Gertruda BROUNS, Dennis DE GRAAF, Robertus Cornelis Martinus DE KRUIF, Paul JANSSEN, Matthias KRUIZINGA, Arnoud Willem NOTENBOOM, Daniel Andrew SMITH, Beatrijs Louise Marie-Joseph Katrien VERBRUGGE, James Norman WILEY
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Patent number: 10054862Abstract: Disclosed is a method of monitoring a focus parameter during a lithographic process. The method comprises acquiring first and second measurements of, respectively first and second targets, wherein the first and second targets have been exposed with a relative best focus offset. The method then comprises determining the focus parameter from first and second measurements. Also disclosed are corresponding measurement and lithographic apparatuses, a computer program and a method of manufacturing devices.Type: GrantFiled: June 10, 2016Date of Patent: August 21, 2018Assignee: ASML Netherlands B.V.Inventors: Anton Bernhard Van Oosten, Paul Christiaan Hinnen, Robertus Cornelis Martinus De Kruif, Robert John Socha
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Publication number: 20180046091Abstract: Disclosed is a patterning device configured to pattern a beam of radiation according to a desired pattern during a lithographic process. The patterning device comprises first features configured to form a first target on a substrate during the lithographic process and second features configured to form a second target on the substrate during the lithographic process. The second features are taller, in a direction transverse to the plane of the first and second targets, than the first features, such that the first and second targets have a relative best focus offset.Type: ApplicationFiled: October 24, 2017Publication date: February 15, 2018Applicant: ASML Netherlands B.V.Inventors: Anton Bernhard VAN OOSTEN, Paul Christiaan HINNEN, Robertus Cornelis Martinus DE KRUIF, Robert John SOCHA
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Publication number: 20160363871Abstract: Disclosed is a method of monitoring a focus parameter during a lithographic process. The method comprises acquiring first and second measurements of, respectively first and second targets, wherein the first and second targets have been exposed with a relative best focus offset. The method then comprises determining the focus parameter from first and second measurements. Also disclosed are corresponding measurement and lithographic apparatuses, a computer program and a method of manufacturing devices.Type: ApplicationFiled: June 10, 2016Publication date: December 15, 2016Applicant: ASML Netherlands B.V.Inventors: Anton Bernhard VAN OOSTEN, Paul Christiaan HINNEN, Robertus Cornelis Martinus DE KRUIF, Robert John SOCHA
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Patent number: 9316924Abstract: A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and comprises a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.Type: GrantFiled: October 12, 2011Date of Patent: April 19, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Robertus Cornelis Martinus De Kruif, Richard Joseph Bruls, Johannes Wilhelmus Maria Cornelis Teeuwsen, Erik Petrus Buurman
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Patent number: 8988653Abstract: The invention relates to a lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, wherein apparatus is operable to measure higher-order distortions and/or image plane deviations of the patterning device, apparatus comprising: a device for transmission image detection; and a processor configured and arranged to model higher-order distortions of the patterning device using signals received from the device for transmission image detection; wherein patterning device has a main imaging field, and a perimeter and apparatus is operable to model higher-order distortions using signals resultant from alignment structures comprised in perimeter and/or in the imaging field.Type: GrantFiled: March 18, 2010Date of Patent: March 24, 2015Assignee: ASML Netherlands B.V.Inventors: Marcus Adrianus Van De Kerkhof, Robertus Cornelis Martinus De Kruif
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Publication number: 20120057144Abstract: A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and comprises a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.Type: ApplicationFiled: October 12, 2011Publication date: March 8, 2012Applicant: ASML Netherlands B.V.Inventors: Robertus Cornelis Martinus DE KRUIF, Richard Joseph Bruls, Johannes Wihelmus Maria Cornelis Teeuwsen, Erik Petrus Buurman
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Patent number: 8089613Abstract: A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and comprises a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.Type: GrantFiled: July 19, 2010Date of Patent: January 3, 2012Assignee: ASML Netherlands B.V.Inventors: Robertus Cornelis Martinus De Kruif, Richard Joseph Bruls, Johannes Wilhelmus Maria Cornelis Teeuwsen, Erik Petrus Buurman
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Publication number: 20110043775Abstract: The invention relates to a lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, wherein said apparatus is operable to measure higher-order distortions and/or image plane deviations of the patterning device, said apparatus comprising: a device for transmission image detection; and a processor configured and arranged to model higher-order distortions of the patterning device using signals received from the device for transmission image detection; wherein said patterning device has a main imaging field, and a perimeter and said apparatus is operable to model said higher-order distortions using signals resultant from alignment structures comprised in said perimeter and/or in the imaging field.Type: ApplicationFiled: March 18, 2010Publication date: February 24, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Marcus Adrianus VAN DE KERKHOF, Robertus Cornelis Martinus DE KRUIF
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Publication number: 20100329290Abstract: A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and comprises a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.Type: ApplicationFiled: July 19, 2010Publication date: December 30, 2010Applicant: ASML Netherlands B.V.Inventors: Robertus Cornelis Martinus DE KRUIF, Richard Joseph Bruls, Johannes Wilhelmus Maria Cornelis Teeuwsen, Erik Petrus Buurman
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Patent number: 7817247Abstract: A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and comprises a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.Type: GrantFiled: December 23, 2005Date of Patent: October 19, 2010Assignee: ASML Netherlands B.V.Inventors: Robertus Cornelis Martinus De Kruif, Richard Joseph Bruls, Johannes Wilhelmus Maria Cornelis Teeuwsen, Erik Petrus Buurman
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Patent number: 7534552Abstract: In known lithographic apparatus the projection beam is symmetrical, while the process window can be asymmetrical. The invention addresses this problem by providing a lithographic apparatus comprising an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein there is further provided a system for providing an asymmetric projection beam bandwidth distribution.Type: GrantFiled: December 23, 2004Date of Patent: May 19, 2009Assignee: ASML Netherlands B.V.Inventors: Robertus Cornelis Martinus De Kruif, Richard Joseph Bruls