Patents by Inventor Robertus Nicodemus Jacobus Van Ballegoij
Robertus Nicodemus Jacobus Van Ballegoij has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 10139735Abstract: A method of modifying a lithographic apparatus comprising an illumination system for providing a radiation beam, a support structure for supporting a patterning device to impart the radiation beam with a pattern in its cross-section, a first lens for projecting the radiation beam at the patterning device with a first magnification, a substrate table for holding a substrate, and a first projection system for projecting the patterned radiation beam at a target portion of the substrate with a second magnification. The first lens and the first projection system together provide a third magnification. The method comprises reducing by a first factor the first magnification to provide a second lens for projecting the radiation beam with a fourth magnification; and increasing by the first factor the second magnification to provide a second projection system for projecting the patterned radiation beam at the target portion of the substrate with a fifth magnification.Type: GrantFiled: May 13, 2015Date of Patent: November 27, 2018Assignee: ASML Netherlands B.V.Inventors: Johannes Jacobus Matheus Baselmans, Hans Butler, Christiaan Alexander Hoogendam, Sander Kerssemakers, Bart Smeets, Robertus Nicodemus Jacobus Van Ballegoij, Hubertus Petrus Leonardus Henrica Van Bussel
-
Patent number: 10031428Abstract: A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate (410) positioned between the movable stage (401) and the projection system (208). The plate includes an opening (411) that comprises a first sidewall (411a) and a second sidewall (411b). The plate may be configured to provide a gas flow pattern (424) in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.Type: GrantFiled: February 20, 2014Date of Patent: July 24, 2018Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Koen Cuypers, Marcelo Henrique De Andrade Oliveira, Marinus Jan Remie, Chattarbir Singh, Laurentius Johannes Adrianus Van Bokhoven, Henricus Anita Jozef Wilhemus Van De Ven, José Nilton Fonseca Junior, Frank Johannes Jacobus Van Boxtel, Daniel Nathan Burbank, Erik Roelof Loopstra, Johannes Onvlee, Mark Josef Schuster, Robertus Nicodemus Jacobus Van Ballegoij, Christopher Charles Ward, Jan Steven Christiaan Westerlaken
-
Publication number: 20170131642Abstract: A method of modifying a lithographic apparatus comprising an illumination system for providing a radiation beam, a support structure for supporting a patterning device to impart the radiation beam with a pattern in its cross-section, a first lens for projecting the radiation beam at the patterning device with a first magnification, a substrate table for holding a substrate, and a first projection system for projecting the patterned radiation beam at a target portion of the substrate with a second magnification. The first lens and the first projection system together provide a third magnification. The method comprises reducing by a first factor the first magnification to provide a second lens for projecting the radiation beam with a fourth magnification; and increasing by the first factor the second magnification to provide a second projection system for projecting the patterned radiation beam at the target portion of the substrate with a fifth magnification.Type: ApplicationFiled: May 13, 2015Publication date: May 11, 2017Applicant: ASML Netherlands B.V.Inventors: Johannes Jacobus Matheus BASELMANS, Hans BUTLER, Christiaan Alexander HOOGENDAM, Sander KERSSEMAKERS, Bart SMEETS, Robertus Nicodemus Jacobus VAN BALLEGOIJ, Hubertus Petrus Leonardus Henrica VAN BUSSEL
-
Patent number: 9213246Abstract: An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.Type: GrantFiled: February 12, 2014Date of Patent: December 15, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Nicolaas Rudolf Kemper, Robertus Nicodemus Jacobus Van Ballegoij, Marcus Martinus Petrus Adrianus Vermeulen, Michel Riepen, Martinus Wilhelmus Van Den Heuvel, Paul Petrus Joannes Berkvens, Christophe De Metsenaere, Jimmy Matheus Wilhelmus Van De Winkel, Cornelius Maria Rops
-
Publication number: 20150355557Abstract: A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate (410) positioned between the movable stage (401) and the projection system (208). The plate includes an opening (411) that comprises a first sidewall (411a) and a second sidewall (411b). The plate may be configured to provide a gas flow pattern (424) in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.Type: ApplicationFiled: February 20, 2014Publication date: December 10, 2015Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Koen CUYPERS, Marcelo Henrique DE ANDRADE OLIVEIRA, Marinus Jan REMIE, Chattarbir SINGH, Laurentius Johannes Adrianus VAN BOKHOVEN, Henricus Anita Jozef Wilhemus VAN DE VEN, José Nilton FONSECA JUNIOR, Frank Johannes Jacobus VAN BOXTEL, Daniel Nathan BURBANK, Erik Roelof LOOPSTRA, Johannes ONVLEE, Mark Josef SCHUSTER, Robertus Nicodemus Jacobus VAN BALLEGOIJ, Christopher Charles WARD, Jan Steven Christiaan WESTERLAKEN
-
Publication number: 20140300879Abstract: An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.Type: ApplicationFiled: February 12, 2014Publication date: October 9, 2014Applicant: ASML NETHERLANDS B.V.Inventors: Nicolaas Rudolf KEMPER, Robertus Nicodemus Jacobus Van Ballegoij, Marcus Martinus Petrus Adrianus Vermeulen, Michel Riepen, Martinus Wilhelmus Van Den Heuvel, Paul Petrus Joannes Berkvens, Christophe De Metsenaere, Jimmy Matheus Wilhelmus Van De Winkel, Cornelius Maria Rops
-
Patent number: 8654309Abstract: An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.Type: GrantFiled: December 9, 2009Date of Patent: February 18, 2014Assignee: ASML Netherlands B.V.Inventors: Nicolaas Rudolf Kemper, Robertus Nicodemus Jacobus Van Ballegoij, Marcus Martinus Petrus Adrianus Vermeulen, Michel Riepen, Martinus Wilhelmus Van Den Heuvel, Paul Petrus Joannes Berkvens, Christophe De Metsenaere, Jimmy Matheus Wilhelmus Van De Winkel, Cornelius Maria Rops
-
Publication number: 20100149501Abstract: An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.Type: ApplicationFiled: December 9, 2009Publication date: June 17, 2010Applicant: ASML Netherlands B.V.Inventors: Nicolaas Rudolf KEMPER, Robertus Nicodemus Jacobus Van Ballegoij, Marcus Martinus Petrus Adrianus Vermeulen, Michel Riepen, Martinus Wilhelmus Van Den Heuvel, Paul Petrus Joannes Berkvens, Christophe De Metsenaere, Jimmy Matheus Wilhelmus Van De Winkel, Cornelius Maria Rops
-
Patent number: 7361911Abstract: A device manufacturing method includes projecting a patterned beam of radiation through an optics compartment and a channel that provides an open connection between the optics compartment and a substrate compartment onto a substrate, maintaining an ionized flush gas at a higher pressure in the channel than in the substrate compartment and in the optics compartment during the projecting, intercepting particles that emanate from the substrate with the ionized flush gas, pumping the flush gas carrying the intercepted particles from the substrate compartment using a pump coupled to a gas outlet coupled to at least one of the compartments, and establishing an electrical potential difference between a wall of the channel and the outlet and/or a rotor of the pump so that the outlet and/or the rotor of the pump attracts positively charged ions that stem from the flush gas in the channel.Type: GrantFiled: December 9, 2004Date of Patent: April 22, 2008Assignee: ASML Netherlands B.V.Inventors: Johannes Hubertus Josephina Moors, Robertus Nicodemus Jacobus Van Ballegoij, Vadim Yevgenyevich Banine, Gert-Jan Heerens, Frederik Theodorus Elisabeth Heuts, Johannes Henricus Wilhelmus Jacobs, Paulus Martinus Maria Liebregts, Hendrik Antony Johannes Neerhof
-
Patent number: 7072025Abstract: A lithographic projection apparatus in which a reaction force is generated between a balance mass and a substrate table. The balance mass is elastically coupled to the base frame with a suspension eigenfrequency of between 0.3 and 10 Hz.Type: GrantFiled: May 2, 2005Date of Patent: July 4, 2006Assignee: ASML Netherlands B.V.Inventors: Henrikus Herman Marie Cox, Robertus Nicodemus Jacobus Van Ballegoij, Petrus Matthijs Henricus Vosters, Sven Antoin Johan Hol, Sebastiaan Maria Johannes Cornelissen
-
Patent number: 7030967Abstract: A substrate holder has burls having a height not less than 100 ?m and at least 10 vacuum ports arranged within a central region extending to a radius of two thirds the radius of the substrate. Thereby concave wafers can be reliably clamped by generating an initial vacuum in a central region which exerts a clamping force tending to flatten the wafer and allowing the initial vacuum to deepen until the wafer is fully clamped.Type: GrantFiled: December 19, 2003Date of Patent: April 18, 2006Assignee: ASML Netherlands B.V.Inventors: Robertus Nicodemus Jacobus Van Ballegoij, Martinus Agnes Willem Cuijpers, Pieter Johannes Gertrudis Meijers, Gerardus Petrus Matthijs Van Nunen, Joost Jeroen Ottens
-
Patent number: 6906786Abstract: A lithographic projection apparatus in which a reaction force is generated between a balance mass and a substrate table. The balance mass is elastically coupled to the base frame with a suspension eigenfrequency of between 0.3 and 10 Hz.Type: GrantFiled: June 5, 2003Date of Patent: June 14, 2005Assignee: ASML Netherlands B.V.Inventors: Henrikus Herman Marie Cox, Robertus Nicodemus Jacobus Van Ballegoij, Petrus Matthijs Henricus Vosters, Sven Antoin Johan Hol, Sebastiaan Maria Johannes Cornelissen
-
Publication number: 20040179183Abstract: A substrate holder has burls having a height not less than 100 &mgr;m and at least 10 vacuum ports arranged within a central region extending to a radius of two thirds the radius of the substrate. Thereby concave wafers can be reliably clamped by generating an initial vacuum in a central region which exerts a clamping force tending to flatten the wafer and allowing the initial vacuum to deepen until the wafer is fully clamped.Type: ApplicationFiled: December 19, 2003Publication date: September 16, 2004Applicant: ASML NETHERLANDS B.V.Inventors: Robertus Nicodemus Jacobus Van Ballegoij, Martinus Agnes Willem Cuijpers, Pieter Johannes Gertrudis Meijers, Gerardus Petrus Matthijs Van Nunen, Joost Jeroen Ottens
-
Publication number: 20040008331Abstract: A lithographic projection apparatus in which a reaction force is generated between a balance mass and a substrate table. The balance mass is elastically coupled to the base frame with a suspension eigenfrequency of between 0.3 and 10 Hz.Type: ApplicationFiled: June 5, 2003Publication date: January 15, 2004Applicant: ASML NETHERLANDS B.V.Inventors: Henrikus Herman Marie Cox, Robertus Nicodemus Jacobus Van Ballegoij, Petrus Matthijs Henricus Vosters, Sven Antoin Johan Hol, Sebastiaan Maria Johannes Cornelissen
-
Patent number: 6473161Abstract: A supporting assembly for use in a lithographic projection apparatus includes a moveable member which is journalled in a housing such that substantially no vibration forces are transmitted between the moveable member and the housing. The assembly comprises a gas filled pressure chamber in which the gas in the pressure chamber acts on the moveable member so as to at least partially counteract the force due to the weight of the moveable member and any other object which it carries. The pressure chamber is supplied with gas and the whole assembly is constructed and arranged such that substantially no gas flows through the pressure chamber when the moveable member is substantially stationary. The supporting assembly may be applied to a lithographic projection apparatus, object table, or metrology frame.Type: GrantFiled: May 30, 2001Date of Patent: October 29, 2002Assignee: ASML Netherlands B.V.Inventors: Martinus Agnes Willem Cuijpers, Frank Auer, Robertus Nicodemus Jacobus van Ballegoij
-
Publication number: 20020005939Abstract: A supporting assembly for use in a lithographic projection apparatus includes a moveable member which is journalled in a housing such that substantially no vibration forces are transmitted between the moveable member and the housing. The assembly comprises a gas filled pressure chamber in which the gas in the pressure chamber acts on the moveable member so as to at least partially counteract the force due to the weight of the moveable member and any other object which it carries. The pressure chamber is supplied with gas and the whole assembly is constructed and arranged such that substantially no gas flows through the pressure chamber when the moveable member is substantially stationary. The supporting assembly may be applied to a lithographic projection apparatus, object table, or metrology frame.Type: ApplicationFiled: May 30, 2001Publication date: January 17, 2002Inventors: Martinus Agnes Willem Cuijpers, Frank Auer, Robertus Nicodemus Jacobus van Ballegoij