Patents by Inventor Robin Charis Scott

Robin Charis Scott has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process and apparatus for treating wafers
    Patent number: 7871937
    Abstract: Methods and systems are provided for low pressure baking to remove impurities from a semiconductor surface prior to deposition. Advantageously, the short, low temperature processes consume only a small portion of the thermal budget, while still proving effective at removing interfacial oxygen from the semiconductor surface. The methods and systems are particularly well suited for treating semiconductor surfaces before epitaxy.
    Type: Grant
    Filed: December 9, 2008
    Date of Patent: January 18, 2011
    Assignee: ASM America, Inc.
    Inventors: Robin Charis Scott, Matt Johnson
  • PROCESS AND APPARATUS FOR TREATING WAFERS
    Publication number: 20090286406
    Abstract: Methods and systems are provided for low pressure baking to remove impurities from a semiconductor surface prior to deposition. Advantageously, the short, low temperature processes consume only a small portion of the thermal budget, while still proving effective at removing interfacial oxygen from the semiconductor surface. The methods and systems are particularly well suited for treating semiconductor surfaces before epitaxy.
    Type: Application
    Filed: December 9, 2008
    Publication date: November 19, 2009
    Applicant: ASM AMERICA, INC.
    Inventors: Robin Charis Scott, Matt Johnson