Patents by Inventor Roderick Boswell

Roderick Boswell has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Compact plasma thruster
    Patent number: 11828273
    Abstract: According to certain aspects, an electric-propulsion thruster is used as part of a base or platform which also includes a power converter, having a plurality of inductors and other electrical components, and a printed circuit board (PCB). The PCB includes a layer at which the other electrical components and printed circuit inductor traces, for the plurality of inductors, are secured. The electric-propulsion thruster includes a housing (e.g., as part of the base or platform) providing a cavity and having at least one structurally-rigid side wall along the cavity, where the PCB is integrated with the electric-propulsion thruster for a compact arrangement which can be used to propel the apparatus. Such a compact design might be used as an important part of thruster spacecraft architecture such as micro-satellites (e.g., CubeSats).
    Type: Grant
    Filed: March 23, 2018
    Date of Patent: November 28, 2023
    Assignee: The Board of Trustees of the Leland Stanford Junior University
    Inventors: Wei Liang, Luke C. Raymond, Juan M. Rivas Davila, Roderick Boswell, Christine Charles
  • COMPACT PLASMA THRUSTER
    Publication number: 20200378372
    Abstract: According to certain aspects, an electric-propulsion thruster is used as part of a base or platform which also includes a power converter, having a plurality of inductors and other electrical components, and a printed circuit board (PCB). The PCB includes a layer at which the other electrical components and printed circuit inductor traces, for the plurality of inductors, are secured. The electric-propulsion thruster includes a housing (e.g., as part of the base or platform) providing a cavity and having at least one structurally-rigid side wall along the cavity, where the PCB is integrated with the electric-propulsion thruster for a compact arrangement which can be used to propel the apparatus. Such a compact design might be used as an important part of thruster spacecraft architecture such as micro-satellites (e.g., CubeSats).
    Type: Application
    Filed: March 23, 2018
    Publication date: December 3, 2020
    Inventors: Wei Liang, Luke C. Raymond, Juan M. Rivas Davila, Roderick Boswell, Christine Charles
  • Plasma source for a focused ion beam system
    Patent number: 9640367
    Abstract: The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source.
    Type: Grant
    Filed: September 9, 2014
    Date of Patent: May 2, 2017
    Assignee: FEI Company
    Inventors: John Keller, Noel Smith, Roderick Boswell, Lawrence Scipioni, Christine Charles, Orson Sutherland
  • Magnetically Enhanced, Inductively coupled Plasma Source For a Focused Ion Beam System
    Publication number: 20150130348
    Abstract: The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source.
    Type: Application
    Filed: September 9, 2014
    Publication date: May 14, 2015
    Applicant: FEI Company
    Inventors: John Keller, Noel Smith, Roderick Boswell, Lawrence Scipioni, Christine Charles, Orson Sutherland
  • Magnetically enhanced, inductively coupled plasma source for a focused ion beam system
    Patent number: 8829468
    Abstract: The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source.
    Type: Grant
    Filed: April 2, 2012
    Date of Patent: September 9, 2014
    Assignee: FEI Company
    Inventors: John Keller, Noel Smith, Roderick Boswell, Lawrence Scipioni, Christine Charles, Orson Sutherland
  • Charged particle extraction device and method of design there for
    Patent number: 8653474
    Abstract: The present invention provides a method for extracting a charged particle beam from a charged particle source. A set of electrodes is provided at the output of the source. The potentials applied to the electrodes produce a low-emittance growth beam with substantially zero electric field at the output of the electrodes.
    Type: Grant
    Filed: February 28, 2013
    Date of Patent: February 18, 2014
    Assignee: FEI Company
    Inventors: Roderick Boswell, Orson Sutherland
  • Charged Particle Extraction Device and Method of Design There for
    Publication number: 20130240751
    Abstract: The present invention provides a method for extracting a charged particle beam from a charged particle source. A set of electrodes is provided at the output of the source. The potentials applied to the electrodes produce a low-emittance growth beam with substantially zero electric field at the output of the electrodes.
    Type: Application
    Filed: February 28, 2013
    Publication date: September 19, 2013
    Applicant: FEI Company
    Inventors: Roderick Boswell, Orson Sutherland
  • Charged particle extraction device and method of design there for
    Patent number: 8405043
    Abstract: The present invention provides a method for extracting a charged particle beam from a charged particle source. A set of electrodes is provided at the output of the source. The potentials applied to the electrodes produce a low-emittance growth beam with substantially zero electric field at the output of the electrodes.
    Type: Grant
    Filed: January 10, 2011
    Date of Patent: March 26, 2013
    Assignee: FEI Company
    Inventors: Roderick Boswell, Orson Sutherland
  • MAGNETICALLY ENHANCED, INDUCTIVELY COUPLED PLASMA SOURCE FOR A FOCUSED ION BEAM SYSTEM
    Publication number: 20120319000
    Abstract: The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source.
    Type: Application
    Filed: April 2, 2012
    Publication date: December 20, 2012
    Applicant: FEI COMPANY
    Inventors: John Keller, Noel Smith, Roderick Boswell, Lawrence Scipioni, Christine Charles, Orson Sutherland
  • Magnetically enhanced, inductively coupled plasma source for a focused ion beam system
    Patent number: 8168957
    Abstract: The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source.
    Type: Grant
    Filed: February 11, 2010
    Date of Patent: May 1, 2012
    Assignee: FEI Company
    Inventors: John Keller, Noel Smith, Roderick Boswell, Lawrence Scipioni, Christine Charles, Orson Sutherland
  • Charged Particle Extraction Device And Method Of Design There for
    Publication number: 20110100798
    Abstract: The present invention provides a method for extracting a charged particle beam from a charged particle source. A set of electrodes is provided at the output of the source. The potentials applied to the electrodes produce a low-emittance growth beam with substantially zero electric field at the output of the electrodes.
    Type: Application
    Filed: January 10, 2011
    Publication date: May 5, 2011
    Applicant: FEI Company
    Inventors: Roderick Boswell, Orson Sutherland
  • Charged particle extraction device and method of design there for
    Patent number: 7872242
    Abstract: The present invention provides a method for extracting a charged particle beam from a charged particle source. A set of electrodes is provided at the output of the source. The potentials applied to the electrodes produce a low-emittance growth beam with substantially zero electric field at the output of the electrodes.
    Type: Grant
    Filed: October 16, 2004
    Date of Patent: January 18, 2011
    Assignees: FEI Company, Australian National University
    Inventors: Roderick Boswell, Orson Sutherland
  • Magnetically Enhanced, Inductively Coupled Plasma Source for a Focused Ion Beam System
    Publication number: 20100294648
    Abstract: The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source.
    Type: Application
    Filed: February 11, 2010
    Publication date: November 25, 2010
    Applicant: FEI COMPANY
    Inventors: John Keller, Noel Smith, Roderick Boswell, Lawrence Scipioni, Christine Charles, Orson Sutherland
  • Magnetically enhanced, inductively coupled plasma source for a focused ion beam system
    Patent number: 7670455
    Abstract: The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source.
    Type: Grant
    Filed: July 2, 2007
    Date of Patent: March 2, 2010
    Assignee: FEI Company
    Inventors: John Keller, Noel Smith, Roderick Boswell, Lawrence Scipioni, Christine Charles, Orson Sutherland
  • Charged Particle Extraction Device and Method of Design There For
    Publication number: 20100044580
    Abstract: The present invention provides a method for extracting a charged particle beam from a charged particle source. A set of electrodes is provided at the output of the source. The potentials applied to the electrodes produce a low-emittance growth beam with substantially zero electric field at the output of the electrodes.
    Type: Application
    Filed: October 16, 2004
    Publication date: February 25, 2010
    Applicants: FEI Company, Australian National University
    Inventors: Roderick Boswell, Orson Sutherland
  • Magnetically enhanced, inductively coupled plasma source for a focused ion beam system
    Publication number: 20080017319
    Abstract: The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source.
    Type: Application
    Filed: July 2, 2007
    Publication date: January 24, 2008
    Applicant: FEI Company
    Inventors: John Keller, Noel Smith, Roderick Boswell, Lawrence Scipioni, Christine Charles, Orson Sutherland
  • Magnetically enhanced, inductively coupled plasma source for a focused ion beam system
    Patent number: 7241361
    Abstract: The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source.
    Type: Grant
    Filed: November 13, 2004
    Date of Patent: July 10, 2007
    Assignee: FEI Company
    Inventors: John Keller, Noel Smith, Roderick Boswell, Lawrence Scipioni, Christine Charles, Orson Sutherland
  • Magnetically enhanced, inductively coupled plasma source for a focused ion beam system
    Publication number: 20050183667
    Abstract: The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source.
    Type: Application
    Filed: November 13, 2004
    Publication date: August 25, 2005
    Inventors: John Keller, Noel Smith, Roderick Boswell, Lawrence Scipioni, Christine Charles, Orson Sutherland
  • Method and apparatus for coating a substrate
    Patent number: 5900063
    Abstract: A method and apparatus for forming a coating on a substrate. The system (1) comprises an electron-beam evaporator (5) to produce an evaporant (6) from a source material, a plasma generation chamber (3), within which a magnetoplasma is generated, and a magnetic field supply means (10) to apply a magnetic field (11) to the apparatus (1), to transport the magnetoplasma (60) to the substrate (12).
    Type: Grant
    Filed: September 5, 1996
    Date of Patent: May 4, 1999
    Assignee: The Australian National University
    Inventors: Roderick Boswell, Antoine Durandet, David MacKenzie