Patents by Inventor Roderick Devine

Roderick Devine has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for depositing a Ta2O5 dielectric layer
    Patent number: 6475928
    Abstract: The process comprises the following steps: a) pretreatment of a surface of the substrate by means of a cold gas plasma at low or medium pressure in order to clean the said surface; b) growth, from the said cleaned surface of the substrate, of a nitride barrier layer by means of a cold gas plasma made up of an N2/H2 mixture at low or medium pressure; and c) deposition, on the nitride barrier layer, of a Ta2O5 dielectric layer by chemical vapor deposition (CVD) or plasma enhanced chemical vapor deposition (PECVD).
    Type: Grant
    Filed: July 15, 1998
    Date of Patent: November 5, 2002
    Assignee: France Telecom
    Inventors: Marc Berenguer, Roderick Devine