Abstract: The present disclosure relates to a camera system for a mobile device. The camera system comprises at least one camera which is freely mounted to the mobile device. Further, the camera system comprises at least one motion measurement unit configured to provide motion data of the camera and a data processing circuitry configured to determine a pose of the camera from the motion data.

Abstract: A method for estimating a 3D map is described. The method includes performing an initialization of a plurality of 3D points in the 3D map based on the plurality of 2D images, reprojecting ones of the 3D points onto ones of the 2D images to obtain reprojection points, determining respective reprojection errors of ones of the reprojection points, determining a robust camera parameter associated with a weighting function based on the respective reprojection errors, and performing bundle adjustment to update the 3D map and update the plurality of poses, based on the robust camera parameter and the weighting function. Related systems, devices and computer program products are also described.

Abstract: A method for estimating a 3D map and a plurality of poses is described. The method includes non-recursively performing an initialization of the 3D map and the respective poses of the plurality of poses based on a plurality of first 2D images of the series of 2D images, and recursively performing sequential updating of the 3D map based on recursively updating the 3D map for respective ones of a plurality of second 2D images of the series of 2D images. Related systems, devices and computer program products are also described.

Abstract: A method of generating a refined depth map for a three-dimensional (3D) model of an object is described. The method may include may include warping a set of target images, resulting in warped target images, wherein the set of target images is selected from the plurality of images; determining a difference between each warped target image and a reference image, wherein the reference image is from the plurality of images; determining, for each warped target image, an alpha mask comprising per-pixel weights; and updating an initialized depth map based on alpha mask, resulting in the estimated depth map. Related systems, devices and computer program products are also described.

Abstract: A method for estimating a 3D map and a plurality of poses is described. The method includes non-recursively performing an initialization of the 3D map and the respective poses of the plurality of poses based on a plurality of first 2D images of the series of 2D images, and recursively performing sequential updating of the 3D map based on recursively updating the 3D map for respective ones of a plurality of second 2D images of the series of 2D images. Related systems, devices and computer program products are also described.

Abstract: A method of generating a refined depth map for a three-dimensional (3D) model of an object is described. The method may include may include warping a set of target images, resulting in warped target images, wherein the set of target images is selected from the plurality of images; determining a difference between each warped target image and a reference image, wherein the reference image is from the plurality of images; determining, for each warped target image, an alpha mask comprising per-pixel weights; and updating an initialized depth map based on alpha mask, resulting in the estimated depth map. Related systems, devices and computer program products are also described.

Abstract: A method for estimating a 3D map is described. The method includes performing an initialization of a plurality of 3D points in the 3D map based on the plurality of 2D images, reprojecting ones of the 3D points onto ones of the 2D images to obtain reprojection points, determining respective reprojection errors of ones of the reprojection points, determining a robust camera parameter associated with a weighting function based on the respective reprojection errors, and performing bundle adjustment to update the 3D map and update the plurality of poses, based on the robust camera parameter and the weighting function. Related systems, devices and computer program products are also described.

Abstract: An electronic system includes a circuitry configured to obtain a sequence of frames of an object under different viewing angles at consecutive time instances. For a first time instance, the circuitry generates a point cloud descriptive for an external surface of the object on basis of (i) a point cloud obtained for a second time instance preceding the first time instance and (ii) disparity information concerning a frame captured at the first time instance.

Abstract: An electronic system includes a circuitry configured to obtain a sequence of frames of an object under different viewing angles at consecutive time instances. For a first time instance, the circuitry generates a point cloud descriptive for an external surface of the object on basis of (i) a point cloud obtained for a second time instance preceding the first time instance and (ii) disparity information concerning a frame captured at the first time instance.

Abstract: An optical system includes an illumination unit and an imaging unit configured to image a scene including at least one object into a first image and a second image by using Helmholtz reciprocity. The illumination unit is configured to emit light into at least one light emitting solid angle and the imaging unit is configured to receive light from a light receiving solid angle. The light receiving solid angle is at least as large as each of the light emitting solid angles.

Abstract: An electronic system includes a circuitry (910) configured to obtain a sequence of frames of an object (990) under different viewing angles at consecutive time instances. For a first time instance, the circuitry (910) generates a point cloud descriptive for an external surface of the object on basis of (i) a point cloud obtained for a second time instance preceding the first time instance and (ii) disparity information concerning a frame captured at the first time instance.

Abstract: An optical system includes an illumination unit and an imaging unit configured to image a scene including at least one object into a first image and a second image by using Helmholtz reciprocity. The illumination unit is configured to emit light into at least one light emitting solid angle and the imaging unit is configured to receive light from a light receiving solid angle. The light receiving solid angle is at least as large as each of the light emitting solid angles.

Abstract: Multi-beam lithography systems and methods of manufacturing semiconductor devices using the same are disclosed. For example, the method utilizes non-coincidence of boundaries of electrical fields emanating from chrome on glass or phase shifted mask features distributed over two masks for the optimization of lithographic process windows, side lobe suppression, or pattern orientation dependent process window optimization employing one mask with polarization rotating film on the backside.

Abstract: A lithographic mask comprises a first layer including grooves, a second layer including regions, sections and a groove-like structure that encloses the sections. The first and second layers are formed so as to reduce electrical potential differences within the second layer. A method of forming a lithographic mask includes forming first and second layers to dispose the second layer over the first layer, patterning the second layer to comprise sections, a region, and a groove-like structure enclosing the sections, and forming grooves in the first layer at portions not covered by the second layer. The first and second layers are formed to reduce potential differences within the second layers during the step of forming the grooves in the first layer.

Abstract: A lithographic mask comprises a first layer including grooves, a second layer including regions, sections and a groove-like structure that encloses the sections. The first and second layers are formed so as to reduce electrical potential differences within the second layer. A method of forming a lithographic mask includes forming first and second layers to dispose the second layer over the first layer, patterning the second layer to comprise sections, a region, and a groove-like structure enclosing the sections, and forming grooves in the first layer at portions not covered by the second layer. The first and second layers are formed to reduce potential differences within the second layers during the step of forming the grooves in the first layer.

Abstract: The present invention is applicable to a recording apparatus of a CD or DVD, a recording method thereof and a recording medium, and an object of the present invention is to clearly record a second information such as characters and figures between two recording levels in an optical disk. The second information is recorded in a predetermined area in a radius direction and a angular direction on the optical information recording medium, and further, the second information is recorded according to a change of a pit width based on a change of power of the laser beam, a change of a pit length based on an on/off control of the laser beam, or a change of depression or bulge of the pit based on a change in the vicinity of the on/off control of the laser beam. Whereby it is possible to record the second information such as a watermark pattern or a visible image, which is capable of being confirmed by seeing a disk.

Abstract: Lithography systems and methods of manufacturing semiconductor devices are disclosed. For example, a lithography system includes at least two reticle stages and a common projection lens system disposed between the reticle stages and a wafer stage, and at least one alignment system for aligning the reticle stages.

Abstract: Multi-beam lithography systems and methods of manufacturing semiconductor devices using the same are disclosed. For example, the method utilizes non-coincidence of boundaries of electrical fields emanating from chrome on glass or phase shifted mask features distributed over two masks for the optimization of lithographic process windows, side lobe suppression, or pattern orientation dependent process window optimization employing one mask with polarization rotating film on the backside.

Abstract: The invention, which relates to a method for checking periodic structures on lithography masks, in which an image of the structure of the lithography mask is generated by an imaging optic of a microscope, provides a method for inspecting structures on lithography masks which is used to represent deviations in the periodic structure of a lithography mask, a better demarcation of the periodic structure from a deviation being achieved. The parameters of wavelength ?, the numerical aperture NA and the coherence of the illumination ? of the imaging optic of the microscope are chosen such that the inequality P ? ? NA ? ( 1 + ? ) describing the resolution limit for a periodic structure having the period P is fulfilled, and in that the image of the structure that is generated in this way is evaluated for deviations in the periodic structure.

Abstract: A set of at least two masks for the projection of structure patterns coordinated with one another by a projection system into the same photosensitive layer of a semiconductor wafer, in which the set of at least two masks includes a primary mask having an opaque structure element, which is formed at a first position on the first mask. A second mask of the set, for example a trimming mask, which is assigned to the first mask, can have a semitransparent region assigned to the structure element of the first mask. The semitransparent region can be formed at the same position on the second mask as the opaque structure element on the first mask. With the aid of the suitable choice of the transparency of the semitransparent region, it is possible to enable an undesirable resist region to be trimmed away for enlargement of a process window during exposure of the photosensitive layer on the semiconductor wafer.