Abstract: The invention relates to a method for optimizing a mask layout pattern comprising at least one structural feature. First a desired layout pattern is provided. Based on the desired layout pattern, an optimized reference diffraction coefficient is provided. After selecting an initial mask geometry having polygon-shaped structures, initial diffraction coefficients are calculated. A difference based on the reference diffraction coefficient and initial diffraction coefficients is used to optimize the initial geometry in order to provide a mask layout pattern.

Abstract: A lithography mask has an angled structure element (O) formed by a first opaque segment (O1) and by a second opaque segment (O2). The structure element has at least one reflex angle (?). The angled structure element (O) includes at least one convex section (A) facing the reflex angle (?). At least one transparent structure (T) adjacent to the angled structure element (O) is provided at the convex section (A) of the angled structure element (O). The transparent structure (T) is formed in separated fashion at the convex section (A) of the angled structure element (O) and thus comprises two distinguishable transparent segments (T1, T2) formed at least in sections essentially axially symmetrically with respect to the angle bisector (WH) of the reflex angle.

Abstract: The present invention relates to a method for determining a matrix of transmission cross coefficients w for an optical modeling in an optical proximity correction of mask layouts. In a first step, there is calculation of Fourier transforms of an illumination aperture, a lens aperture and a complex conjugate lens aperture, which are present in the form of image matrices with a predetermined raster. A second step involves calculating Fourier transforms for the transmission cross coefficients w from the Fourier transforms by means of a convolution theorem in order to obtain the matrix of the Fourier transforms of the transmission cross coefficients w. A further step involves inverse-transforming the Fourier transforms of the transmission cross coefficients w by means of a fast Fourier transformation in order to obtain the matrix of the transmission cross coefficients w for the optical modeling in the optical proximity correction of mass layouts.

Abstract: The present invention is applicable to a recording apparatus of a CD or DVD, a recording method thereof and a recording medium, and an object of the present invention is to clearly record a second information such as characters and figures between two recording levels in an optical disk. The second information is recorded in a predetermined area in a radius direction and a angular direction on the optical information recording medium, and further, the second information is recorded according to a change of a pit width based on a change of power of the laser beam, a change of a pit length based on an on/off control of the laser beam, or a change of depression or bulge of the pit based on a change in the vicinity of the on/off control of the laser beam. Whereby it is possible to record the second information such as a watermark pattern or a visible image, which is capable of being confirmed by seeing a disk.

Abstract: The invention relates to a method for inspection of periodic structures on lithography masks using a microscope with adjustable illumination and an operating element for movement of a mechanical stage with the lithography mask attached to it in order to record images of the lithography mask at a computer-controlled location on the lithography mask. The position, the size and the pitch specification of the lithography mask are stored.

Abstract: The present invention is applicable to a recording apparatus of a CD or DVD, a recording method thereof and a recording medium, and an object of the present invention is to clearly record a second information such as characters and figures between two recording levels in an optical disk. The second information is recorded in a predetermined area in a radius direction and a angular direction on the optical information recording medium, and further, the second information is recorded according to a change of a pit width based on a change of power of the laser beam, a change of a pit length based on an on/off control of the laser beam, or a change of depression or bulge of the pit based on a change in the vicinity of the on/off control of the laser beam. Whereby it is possible to record the second information such as a watermark pattern or a visible image, which is capable of being confirmed by seeing a disk.

Abstract: The invention relates to a method for optimizing a mask layout pattern comprising at least one structural feature. First a desired layout pattern is provided. Based on the desired layout pattern, an optimized reference diffraction coefficient is provided. After selecting an initial mask geometry having polygon-shaped structures, initial diffraction coefficients are calculated. A difference based on the reference diffraction coefficient and initial diffraction coefficients is used to optimize the initial geometry in order to provide a mask layout pattern.

Abstract: In the method, which is to be carried out on a computer system, firstly design data of a semiconductor substrate are read in and, on the basis thereof, a mask image is generated in the form of a data structure with contact holes and with auxiliary structures on the computer system. Afterwards, contact hole biases are determined by means of an optical proximity correction method and the relevant contact holes are corrected on the basis of these contact hole biases. By means of subsequent imaging simulation of the mask image on the semiconductor substrate, undesired imaging auxiliary structures and contact holes deviating from specified tolerances on the semiconductor substrate are detected and corrected. During the imaging simulation of the mask image, a mask bias is employed in order to compensate for three-dimensional mask effects. A real mask can be produced on the basis of the mask image thus determined.

Abstract: In the method, which is to be carried out on a computer system, firstly design data of a semiconductor substrate are read in and, on the basis thereof, a mask image is generated in the form of a data structure with contact holes and with auxiliary structures on the computer system. Afterwards, contact hole biases are determined by means of an optical proximity correction method and the relevant contact holes are corrected on the basis of these contact hole biases. By means of subsequent imaging simulation of the mask image on the semiconductor substrate, undesired imaging auxiliary structures and contact holes deviating from specified tolerances on the semiconductor substrate are detected and corrected. During the imaging simulation of the mask image, a mask bias is employed in order to compensate for three-dimensional mask effects. A real mask can be produced on the basis of the mask image thus determined.

Abstract: The invention, which relates to a method for checking periodic structures on lithography masks, in which an image of the structure of the lithography mask is generated by an imaging optic of a microscope, provides a method for inspecting structures on lithography masks which is used to represent deviations in the periodic structure of a lithography mask, a better demarcation of the periodic structure from a deviation being achieved. The parameters of wavelength ?, the numerical aperture NA and the coherence of the illumination ? of the imaging optic of the microscope are chosen such that the inequality P??/NA(1+?) describing the resolution limit for a periodic structure having the period P is fulfilled, and in that the image of the structure that is generated in this way is evaluated for deviations in the periodic structure.

Abstract: The present invention is applicable to a recording apparatus of a CD or DVD, a recording method thereof and a recording medium, and an object of the present invention is to clearly record a second information such as characters and figures between two recording levels in an optical disk. The second information is recorded in a predetermined area in a radius direction and a angular direction on the optical information recording medium, and further, the second information is recorded according to a change of a pit width based on a change of power of the laser beam, a change of a pit length based on an on/off control of the laser beam, or a change of depression or bulge of the pit based on a change in the vicinity of the on/off control of the laser beam. Whereby it is possible to record the second information such as a watermark pattern or a visible image, which is capable of being confirmed by seeing a disk.

Abstract: The invention relates to a method for inspection of periodic structures on lithography masks using a microscope with adjustable illumination and an operating element for movement of a mechanical stage with the lithography mask attached to it in order to record images of the lithography mask at a computer-controlled location on the lithography mask. The position, the size and the pitch specification of the lithography mask are stored.

Abstract: The present invention is applicable to a recording apparatus of a CD or DVD, a recording method thereof and a recording medium, and an object of the present invention is to clearly record a second information such as characters and figures between two recording levels in an optical disk. The second information is recorded in a predetermined area in a radius direction and a angular direction on the optical information recording medium, and further, the second information is recorded according to a change of a pit width based on a change of power of the laser beam, a change of a pit length based on an on/off control of the laser beam, or a change of depression or bulge of the pit based on a change in the vicinity of the on/off control of the laser beam. Whereby it is possible to record the second information such as a watermark pattern or a visible image, which is capable of being confirmed by seeing a disk.

Abstract: An optical information recording apparatus, an optical information recording method and an optical information recording medium according to the present invention enable second information such as character information, graphic information and the like to be recorded on a disk as a large laser output difference, thereby making it possible to record the second information clearly.