Patents by Inventor Roderick William Boswell

Roderick William Boswell has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140202131
    Abstract: A plasma micro-thruster, including: an elongate and substantially non-conductive tube having a first end to receive a supply of propellant gas, and an open second end to act as an exhaust; first, second, and third electrodes extending circumferentially around the tube and being mutually spaced along a longitudinal axis of the tube, the third electrode being longitudinally interposed between the first and second electrodes; wherein the tube and the first, second and third electrodes are configured to generate a plasma from propellant gas flowing though the tube from the first end of the tube when the third electrode receives radio frequency power and the first and second electrodes are electrically grounded relative to the third electrode, such that the expansion of the plasma from the open end of the tube generates a corresponding thrust.
    Type: Application
    Filed: May 12, 2012
    Publication date: July 24, 2014
    Inventor: Roderick William Boswell
  • Patent number: 5686796
    Abstract: Disclosed is an ion implantation source for producing a plasma with an electron cyclotron resonance zone including a chamber for plasma processing and having at least one extraction slit, said extraction slit situated at a first end of the chamber; at least one antenna encircling the chamber for prodding a radio frequency induced electromagnetic field to generate an inductive/helicon plasma within the chamber; a plurality of magnetic dipoles at the periphery of the chamber; and at least one magnetic dipole at a second end of the chamber; the magnetic dipoles at the periphery and second end of the chamber having their fields directed towards the interior of the chamber, wherein the fields are adjacent to the periphery and the second end of the chamber and keep the plasma spaced from the periphery and the second end of the chamber.
    Type: Grant
    Filed: December 20, 1995
    Date of Patent: November 11, 1997
    Assignee: International Business Machines Corporation
    Inventors: Roderick William Boswell, Albert Rogers Ellingboe, John Howard Keller