Patents by Inventor Rodney A. Kendall

Rodney A. Kendall has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6369396
    Abstract: A scattering target for use in a particle beam system is formed from a grid of gold on a substrate of carbon, with an intermediate smoothing layer (e.g. copper) on the carbon to provide a surface sufficiently smooth to provide an adequate target. An optional bonding layer may be used to improve adhesion between the gold and the smoothing layer.
    Type: Grant
    Filed: September 29, 1999
    Date of Patent: April 9, 2002
    Assignee: International Business Machines Corporation
    Inventors: John G. Hartley, Timothy R. Groves, Rodney A. Kendall, Maris A. Sturans
  • Patent number: 6175122
    Abstract: A method of operating multiple beam direct write e-beam system employs a set of miniature beam writing modules acting in parallel, each of which employs the combination of a uniform magnetic field and a uniform parallel electric field to form an image of a low-brightness electron emitting surface and also to modify the shape of an initially square beam, thereby producing a set of separately and independently modified beams; the modified beams are deflected in parallel by the same magnetic field and a uniform transverse electric field to cover a desired area; emitters, beamshaping deflection electrodes and fine-deflection electrodes are formed by microlithographic techniques.
    Type: Grant
    Filed: January 9, 1998
    Date of Patent: January 16, 2001
    Assignee: International Business Machines Corporation
    Inventors: Timothy R. Groves, Rodney A. Kendall
  • Patent number: 6091187
    Abstract: Direct and indirect electron bombardment provide a sufficiently high degree of temperature uniformity across the emitting surface of a large-area electron source for an electron beam projection system such that a broad beam having illumination uniformity within 1% can be achieved. A diode gun is used to obtain extraction field uniformity and maintain uniformity of illumination. Power requirements and power dissipation in beam periphery truncating apertures is reduced by roughening the surface of a monocrystalline cathode or depositing materials having a higher work function thereon.
    Type: Grant
    Filed: April 8, 1998
    Date of Patent: July 18, 2000
    Assignee: International Business Machines Corporation
    Inventors: Steven D. Golladay, Rodney A. Kendall, Carl E. Bohnenkamp
  • Patent number: 6028662
    Abstract: The invention relates to a method and apparatus for measuring The landing angle of a particle beam is adjusted by scanning the beam over two cylindrical beam target surfaces that are positioned close to the system axis. The output of a beam detector is differentiated and displayed on an oscilloscope. The relevant lens current is adjusted until one side of the scan indicates that the focal plane of the beam is at the center of the beam target. The angle of the beam is then adjusted with the relevant deflector until both sides of the scan are the same, indicating that the beam is accurately vertical.
    Type: Grant
    Filed: May 26, 1999
    Date of Patent: February 22, 2000
    Assignee: International Business Machines Corporation
    Inventors: Maris A. Sturans, Rodney A. Kendall
  • Patent number: 5981962
    Abstract: A multiple beam direct write e-beam system employs a set of miniature beam writing modules acting in parallel, each of which employs the combination of a uniform magnetic field and a uniform parallel electric field to form an image of a low-brightness electron emitting surface and also to modify the shape of an initially square beam, thereby producing a set of separately and independently modified beams; the modified beams are deflected in parallel by the same magnetic field and a uniform transverse electric field to cover a desired area; emitters, beamshaping deflection electrodes and fine-deflection electrodes are formed by microlithographic techniques.
    Type: Grant
    Filed: January 9, 1998
    Date of Patent: November 9, 1999
    Assignee: International Business Machines Corporation
    Inventors: Timothy R. Groves, Rodney A. Kendall
  • Patent number: 5962859
    Abstract: A multiple beam direct write e-beam system employs a set of miniature beam writing modules acting in parallel, each of which employs the combination of a uniform magnetic field and a uniform parallel electric field to form an image of a low-brightness electron emitting surface and also to modify the shape of an initially square beam, thereby producing a set of separately and independently modified beams, in which emitters, beamshaping deflection electrodes and fine-deflection electrodes are formed by microlithographic techniques.
    Type: Grant
    Filed: January 9, 1998
    Date of Patent: October 5, 1999
    Assignee: International Business Machines Corporation
    Inventors: Timothy R. Groves, Rodney A. Kendall
  • Patent number: 5585629
    Abstract: An electron beam nanometer-level metrology tool includes an ambient temperature electron source and a movable stage for mounting a workpiece. The stage is adapted to position the workpiece's surface in a beam interrogation region. Electrostatic focus lenses convert electrons emitted by the electron source into a beam with a focal point that is positioned in the beam interrogation region. The lenses cause the electron beam to traverse a path that is generally orthogonal to the workpiece surface. Along the beam path are positioned upper and lower electrostatic deflection plates which are connected to an adjustable voltage source that applies ganged, opposite-sense d/c potentials thereto. Those potentials enable a scanning of the beam across the beam interrogation region while the beam remains substantially orthogonal to the workpiece surface, thereby enabling more accurate measurements of surface features.
    Type: Grant
    Filed: January 11, 1996
    Date of Patent: December 17, 1996
    Assignee: International Business Machines Corporation
    Inventors: Samuel K. Doran, William A. Enichen, Timothy R. Groves, Rodney A. Kendall, Henri A. Khoury, Richard D. Moore, Paul F. Petric, James D. Rockrohr
  • Patent number: 5532903
    Abstract: An electrostatic chuck for high vacuum operations and the like includes a membrane that allows conformal, full surface, electrostatic clamping to prevent substrate slippage and in-plane distortion. Because clamping of the substrate is performed with an electrostatic membrane chuck, the membrane is permitted to conform to the clamping surface of non-planar substrates. Thus, the substrate can be firmly held electrostatically without causing in-plane distortion.
    Type: Grant
    Filed: May 3, 1995
    Date of Patent: July 2, 1996
    Assignee: International Business Machines Corporation
    Inventor: Rodney A. Kendall
  • Patent number: 5508518
    Abstract: The optical components of an imaging or exposure tool are isolated from vibrations emanating from components such as vacuum pumps, stage drives, and substrate translating and handling components, by connecting all sources of vibrations to the frame, and suspending the optical components from the frame using isolating and damping components. Connections to portions of the optical components are made using high vacuum, heavily damped, bellows type connectors, or the like.
    Type: Grant
    Filed: May 3, 1995
    Date of Patent: April 16, 1996
    Assignee: International Business Machines Corporation
    Inventor: Rodney A. Kendall
  • Patent number: 5434424
    Abstract: A reticle disk with an annular pattern area is used in a reduction projection lithography system in place of a reticle with a rectilinear pattern layout. The reticle disk is rotated on a continuous basis during patterning of a substrate, and the patterning-beam emanating from the annular pattern area is scanned over the substrate using an X-Y stage. The imaging beam, which is preferably an electron-beam, may be scanned across the annular pattern area in a radial direction to allow patterning a plurality of subfields.
    Type: Grant
    Filed: September 21, 1994
    Date of Patent: July 18, 1995
    Assignee: International Business Machines Corporation
    Inventors: Werner Stickel, Rodney A. Kendall
  • Patent number: 5140242
    Abstract: A positioning stage has a base which carries a stage plate slidably on its upper surface. Three rotatable drives engage both the stage plate and the base to move the stage plate on the base to provide motion along the x and y axes plus rotation. The linear drives each include a motor and a capstan driven by the motor and a drivebar frictionally coupled to the capstan. The stage is spring loaded to provide constant down-load force, regardless of the varying extension length of the drivebar. A ball joint permits varying between the cones and the ball of the ball joint dynamically to desired levels. Measurement of position is provided by integrated, parallel dual axis plane mirror interferometers.
    Type: Grant
    Filed: April 30, 1990
    Date of Patent: August 18, 1992
    Assignee: International Business Machines Corporation
    Inventors: Samuel K. Doran, Rodney A. Kendall
  • Patent number: 5059090
    Abstract: A two-dimensional positioning mechanism, comprising a moveable platform, a first translating device connected to the platform to move the platform in a first direction, and a second translating device connected to the platform to move the platform in a second direction orthogonal to the first direction. The first translating device includes first and second links, each of which is pivotally connected to the platform, and a first linear actuator pivotally connected to the first and second links to move those links in the first direction. The first and second links, the moveable platform and the linear actuator form a pivotal parallelogram structure to maintain the orientation of the platform substantially constant during movement thereof. Preferably, the positioning mechanism further includes a control system connected to the first and second translating devices to control those translating devices to move the platform from a first position to a second position.
    Type: Grant
    Filed: January 16, 1990
    Date of Patent: October 22, 1991
    Assignee: International Business Machines Corp.
    Inventors: Norman Bobroff, Rodney A. Kendall
  • Patent number: 5052844
    Abstract: A ball joint can dynamically alter the preload between the cones and the ball of the ball joint to desired levels. When the stage or other device is in motion, the preload can be reduced to provide low friction and wear. When the stage or other device is not in motion, then the preload can be increased to provide zero backlash and high stiffness. The ball-type pivot joint with dynamic preload adjustment includes a ball and a pair of cones which are dynamically preloaded by servo (feedback) control of a preload actuator. Alternate designs are limited by manufacturing and assembly tolerances as well as wear of bearing surfaces or are subject to change due to thermal fluctuations. A flexible member provides flexure of the bearing members in response to the preload actuator.
    Type: Grant
    Filed: April 30, 1990
    Date of Patent: October 1, 1991
    Assignee: International Business Machines Corporation
    Inventor: Rodney A. Kendall