Patents by Inventor Rodney Holland

Rodney Holland has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9038329
    Abstract: An adjustable photovoltaic panel mounting system that allows for variations in roofs and roof elements, while still maintaining a rigid and secure assembly. The specific location for supporting feet and structural elements of the mounting system may be varied to allow for variations in roof features and different panel configurations. The mounting mechanisms are adjustable in both a North/South and a East/West direction to provide for maximum layout flexibility.
    Type: Grant
    Filed: October 11, 2012
    Date of Patent: May 26, 2015
    Assignee: SunLink Corporation
    Inventors: Todd Pelman, Miguel Praca, Rodney Holland, Louis Basel, Jaquelyn Miyatake
  • Patent number: 6818925
    Abstract: An oxide layer on an indium phosphide semiconductor substrate is doped with silicon. This enables epitaxial layers to be deposited upon the substrate in a conventional manner, including mesa etching and overgrowth, to form a semiconductor structure. The doped oxide layer is thought to reduce diffusion of phosphorus out of the substrate and thus to reduce the zinc levels in the active region of the structure. Additionally, or as an alternative, after mesa etching oxide can be formed on the mesa sides and then doped with silicon. Conventional blocking layers can then be formed over the doped oxide, reducing the diffusion of zinc from the blocking layers into the rest of the structure.
    Type: Grant
    Filed: April 25, 2003
    Date of Patent: November 16, 2004
    Assignee: Agilent Technologies, Inc.
    Inventors: John Stephen Massa, Adrian John Taylor, Rodney Hollands Moss
  • Publication number: 20030205716
    Abstract: An oxide layer on an indium phosphide semiconductor substrate is doped with silicon. This enables epitaxial layers to be deposited upon the substrate in a conventional manner, including mesa etching and overgrowth, to form a semiconductor structure. The doped oxide layer is thought to reduce diffusion of phosphorus out of the substrate and thus to reduce the zinc levels in the active region of the structure. Additionally, or as an alternative, after mesa etching oxide can be formed on the mesa sides and then doped with silicon. Conventional blocking layers can then be formed over the doped oxide, reducing the diffusion of zinc from the blocking layers into the rest of the structure.
    Type: Application
    Filed: April 25, 2003
    Publication date: November 6, 2003
    Inventors: John Stephen Massa, Adrian John Taylor, Rodney Hollands Moss