Patents by Inventor Rodolfo Guglielmi Rabe

Rodolfo Guglielmi Rabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY HAVING A CONNECTING ELEMENT
    Publication number: 20240168396
    Abstract: A projection exposure apparatus for semiconductor lithography comprises a connecting element for connecting two components of the projection exposure apparatus. The connecting element comprises at least two mechanical decoupling elements, which each decouple in two mutually orthogonal rotational degrees of freedom. Overall a decoupling in all three rotational degrees of freedom is achieved by the at least two decoupling elements.
    Type: Application
    Filed: January 30, 2024
    Publication date: May 23, 2024
    Inventors: Rodolfo Guglielmi Rabe, Timo Speidel
  • SUPPORT FOR AN OPTICAL ELEMENT
    Publication number: 20240159988
    Abstract: A connection arrangement for connecting a first component and a second component of an imaging device for micro lithography, such as for using light in the extreme UV range (EUV), includes a connection unit having a first contact portion, a second contact portion and a coupling portion.
    Type: Application
    Filed: January 22, 2024
    Publication date: May 16, 2024
    Inventor: Rodolfo Guglielmi Rabe
  • Lithographic apparatus and device manufacturing method
    Patent number: 9696630
    Abstract: Lithography apparatus and device manufacturing methods are disclosed in which means are provided for reducing the extent to which vibrations propagate between a first element of a projection system and a second element of a projection system. Approaches disclosed include the use of plural resilient members in series as part of a vibration isolation system, plural isolation frames for separately supporting first and second projection system frames, and modified connection positions for the interaction between the first and second projection system frames and the isolation frame(s).
    Type: Grant
    Filed: September 14, 2015
    Date of Patent: July 4, 2017
    Assignees: ASML Netherlands B.V., Carl Zeiss SMT GMBH
    Inventors: Marc Wilhelmus Maria Van Der Wijst, Hans Butler, Erik Roelof Loopstra, Bernhard Geuppert, Marco Hendrikus Hermanus Oude Nijhuis, Rodolfo Guglielmi Rabe, Yim Bun Patrick Kwan, Dick Antonius Hendrikus Laro
  • Lithographic Apparatus and Device Manufacturing Method
    Publication number: 20160004170
    Abstract: Lithography apparatus and device manufacturing methods are disclosed in which means are provided for reducing the extent to which vibrations propagate between a first element of a projection system and a second element of a projection system. Approaches disclosed include the use of plural resilient members in series as part of a vibration isolation system, plural isolation frames for separately supporting first and second projection system frames, and modified connection positions for the interaction between the first and second projection system frames and the isolation frame(s).
    Type: Application
    Filed: September 14, 2015
    Publication date: January 7, 2016
    Applicants: ASML Netherlands B.V., Carl Zeiss SMT GmbH
    Inventors: Marc Wilhelmus Maria VAN DER WIJST, Hans Butler, Erik Roelof Loopstra, Bernhard Geuppert, Marco Hendrikus Hermanus Oude Nijhuis, Rodolfo Guglielmi Rabe, Yim Bun Patrick Kwan, Dick Antonius Hendrikus Laro
  • Lithographic apparatus and device manufacturing method
    Patent number: 9134632
    Abstract: Lithography apparatus and device manufacturing methods are disclosed in which means are provided for reducing the extent to which vibrations propagate between a first element of a projection system and a second element of a projection system. Approaches disclosed include the use of plural resilient members in series as part of a vibration isolation system, plural isolation frames for separately supporting first and second projection system frames, and modified connection positions for the interaction between the first and second projection system frames and the isolation frame(s).
    Type: Grant
    Filed: November 21, 2011
    Date of Patent: September 15, 2015
    Assignees: ASML Netherlands B.V., Carl Zeiss SMT GMBH
    Inventors: Marc Wilhelmus Maria Van Der Wijst, Hans Butler, Yim Bun Patrick Kwan, Erik Roelof Loopstra, Bernhard Geuppert, Marco Hendrikus Hermanus Oude Nijhuis, Rodolfo Guglielmi Rabe, Dick Antonius Hendrikus Laro
  • Lithographic Apparatus and Device Manufacturing Method
    Publication number: 20120154774
    Abstract: Lithography apparatus and device manufacturing methods are disclosed in which means are provided for reducing the extent to which vibrations propagate between a first element of a projection system and a second element of a projection system. Approaches disclosed include the use of plural resilient members in series as part of a vibration isolation system, plural isolation frames for separately supporting first and second projection system frames, and modified connection positions for the interaction between the first and second projection system frames and the isolation frame(s).
    Type: Application
    Filed: November 21, 2011
    Publication date: June 21, 2012
    Applicants: Carl Zeiss SMT GmbH, ASML Netherlands B.V.
    Inventors: Marc Wilhelmus Maria VAN DER WIJST, Hans Butler, Yim Bun Patrick Kwan, Erik Roelof Loopstra, Bernhard Geuppert, Marco Hendrikus Hermanus Oude Nijhuis, Rodolfo Guglielmi Rabe, Dick Antonius Hendrikus Laro