Patents by Inventor Roel Boumen

Roel Boumen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of controlling a lithographic processing cell, device manufacturing method, lithographic apparatus, track unit, lithographic processing, cell and computer program
    Patent number: 7195407
    Abstract: A method of controlling a track apparatus in a lithocell apparatus arrangement, is presented herein. The lithocell includes a lithographic exposure apparatus configured to expose substrates and a track apparatus configured to prepare substrates before exposure and develop substrates after exposure. The method includes predicting times at which the lithographic exposure apparatus will be available to accept a prepared substrate for exposure from the track apparatus, and adjusting a rate at which the track apparatus prepares substrates so that a substrate is prepared in time for acceptance by the lithographic exposure apparatus.
    Type: Grant
    Filed: May 5, 2006
    Date of Patent: March 27, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Norbertus Josephus Martinus Van Den Nieuwelaar, Johannes Onvlee, Roel Boumen
  • Method of planning tasks in a machine, method of controlling a machine, supervisory machine control system, lithographic apparatus, lithographic processing cell and computer program
    Patent number: 7184849
    Abstract: A method of planning tasks to be performed in a machine derives a precedence graph by linking subsidiary tasks to a sequence of key tasks to create a scheduling problem that can be solved by an automated scheduler.
    Type: Grant
    Filed: May 25, 2004
    Date of Patent: February 27, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Norbertus Josephus Martinus Van Den Nieuwelaar, Johannes Onvlee, Roel Boumen, Henricus Petrus Johannus Van Lierop, Robert Jozef Dumont, Jacobus Eelkman Rooda
  • Method of controlling a lithographic processing cell, device manufacturing method, lithographic apparatus, track unit, lithographic processing cell, and computer program
    Publication number: 20060197929
    Abstract: A method of controlling a track apparatus in a lithocell apparatus arrangement, is presented herein. The lithocell includes a lithographic exposure apparatus configured to expose substrates and a track apparatus configured to prepare substrates before exposure and develop substrates after exposure. The method includes predicting times at which the lithographic exposure apparatus will be available to accept a prepared substrate for exposure from the track apparatus, and adjusting a rate at which the track apparatus prepares substrates so that a substrate is prepared in time for acceptance by the lithographic exposure apparatus.
    Type: Application
    Filed: May 5, 2006
    Publication date: September 7, 2006
    Applicant: ASML Netherlands B.V.
    Inventors: Norbertus Van Den Nieuwelaar, Johannes Onvlee, Roel Boumen
  • Method of controlling a lithographic processing cell, device manufacturing method, lithographic apparatus, track unit, lithographic processing cell, and computer program
    Patent number: 7068351
    Abstract: A method of controlling a track apparatus in a lithocell apparatus arrangement, is presented herein. The lithocell includes a lithographic exposure apparatus configured to expose substrates and a track apparatus configured to prepare substrates before exposure and develop substrates after exposure. The method includes predicting times at which the lithographic exposure apparatus will be available to accept a prepared substrate for exposure from the track apparatus, and adjusting a rate at which the track apparatus prepares substrates so that a substrate is prepared in time for acceptance by the lithographic exposure apparatus. By adjusting the track rate so that substrates are ready just as the lithographic exposure apparatus needs them, the use of the buffer in the track can be largely avoided or even eliminated entirely.
    Type: Grant
    Filed: February 20, 2004
    Date of Patent: June 27, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Norbertus Josephus Martinus Van Den Nieuwelaar, Johannes Onvlee, Roel Boumen
  • Method of planning tasks in a machine, method of controlling a machine, supervisory machine control system, lithographic apparatus, lithographic processing cell and computer program
    Publication number: 20050278049
    Abstract: A method of planning tasks to be performed in a machine derives a precedence graph by linking subsidiary tasks to a sequence of key tasks to create a scheduling problem that can be solved by an automated scheduler. In the event of a trigger, such as an order for new work or a machine exception, work can be retimed, rescheduled or replanned.
    Type: Application
    Filed: May 25, 2004
    Publication date: December 15, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Norbertus Van Den Nieuwelaar, Johannes Onvlee, Roel Boumen, Henricus Van Lierop, Robert Dumont, Jacobus Rooda
  • Method of controlling a lithographic processing cell, device manufacturing method, lithographic apparatus, track unit lithographic processing cell, and computer program
    Publication number: 20050185952
    Abstract: A method of controlling a track apparatus in a lithocell apparatus arrangement, is presented herein. The lithocell includes a lithographic exposure apparatus configured to expose substrates and a track apparatus configured to prepare substrates before exposure and develop substrates after exposure. The method comprises predicting times at which the lithographic exposure apparatus will be available to accept a prepared substrate for exposure from the track apparatus, and adjusting a rate at which the track apparatus prepares substrates so that a substrate is prepared in time for acceptance by the lithographic exposure apparatus. By adjusting the track rate so that substrates are ready just as the lithographic exposure apparatus needs them, the use of the buffer in the track can be largely avoided or even eliminated entirely.
    Type: Application
    Filed: February 20, 2004
    Publication date: August 25, 2005
    Applicant: ASML Netherlands B.V.
    Inventors: Norbertus Van Den Nieuwelaar, Johannes Onvlee, Roel Boumen