Patents by Inventor Roel De Jonge

Roel De Jonge has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8755027
    Abstract: A fluid system to provide a fluid including liquid in a part of a lithographic apparatus, the fluid system including a manifold to mix a first liquid component and a second component to form the fluid in the part of the lithographic apparatus, a controller to control a physical property of the fluid by controlling the amount of the first and/or second component used to form the fluid, and a measuring device to measure a property of the fluid and to make feedback available to the controller, wherein the controller is configured to control the physical property of the fluid based on the measured property.
    Type: Grant
    Filed: September 6, 2011
    Date of Patent: June 17, 2014
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Matthew Lipson, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Johannes Catharinus Hubertus Mulkens, Bob Streefkerk, Ronald Wilklow, Roel De Jonge
  • Publication number: 20110317138
    Abstract: A lithographic apparatus is provided in which exposure is carried out by projecting through an aqueous solution of alkali metal halide(s), the solution being in contact with the substrate to be exposed.
    Type: Application
    Filed: September 6, 2011
    Publication date: December 29, 2011
    Applicants: ASML HOLDING N.V., ASML NETHERLANDS B.V.
    Inventors: Matthew LIPSON, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Johannes Catharinus Hubertus Mulkens, Bob Streefkerk, Ronald Wilklow, Roel De Jonge
  • Patent number: 8027026
    Abstract: A method including mixing using a mixer a first component and a second component to form a liquid before supply to a space between the projection system and a substrate, measuring a property of the liquid using a measuring device and making the feedback available to a controller, based on the feedback, controlling with the controller a physical property of the liquid by controlling the amount of the first and/or second component used to form the liquid, supplying the liquid to the space between the projection system and the substrate, and projecting a patterned beam of radiation, using the projection system, through the liquid onto a target portion of the substrate.
    Type: Grant
    Filed: January 28, 2011
    Date of Patent: September 27, 2011
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Matthew Lipson, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Johannes Catharinus Hubertus Mulkens, Bob Streefkerk, Ronald Wilklow, Roel De Jonge
  • Publication number: 20110134402
    Abstract: A lithographic apparatus is provided in which exposure is carried out by projecting through an aqueous solution of alkali metal halide(s), the solution being in contact with the substrate to be exposed.
    Type: Application
    Filed: January 28, 2011
    Publication date: June 9, 2011
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Matthew LIPSON, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Johannes Catharinus Hubertus Mulkens, Bob Streefkerk, Ronald Wilklow, Roel De Jonge
  • Patent number: 7929116
    Abstract: A lithographic apparatus uses polarized light to improve the imaging properties such as exposure latitude, while maintaining and extending the lifetime of an illumination system in a lithographic apparatus.
    Type: Grant
    Filed: January 30, 2008
    Date of Patent: April 19, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Christian Wagner, Wilhelmus Petrus De Boeij, Tilmann Heil, Damian Fiolka, Roel De Jonge
  • Patent number: 7894040
    Abstract: A lithographic apparatus is provided in which exposure is carried out by projecting through an aqueous solution of alkali metal halide(s), the solution being in contact with the substrate to be exposed.
    Type: Grant
    Filed: October 5, 2004
    Date of Patent: February 22, 2011
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Matthew Lipson, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Johannes Catharinus Hubertus Mulkens, Bob Streefkerk, Ronald Wilklow, Roel De Jonge
  • Patent number: 7602475
    Abstract: A lithography system including a polarized illumination source, a birefringence-controllable optical element, a birefringence inducer, a pattern generator, a linear polarizer, and a projection system. The polarized illumination source is configured to provide polarized light. The birefringence-controllable optical element is optically coupled to the polarized illumination source. The birefringence inducer is coupled to the birefringence-controllable optical element and configured to induce birefringence on the birefringence-controllable optical element to provide polarization-retarded polarized light. The pattern generator is optically coupled to the birefringence-controllable optical element. The linear polarizer is optically coupled to the pattern generator and configured (i) to receive the polarization-retarded polarized light and (ii) modify intensity distribution of the polarization-retarded polarized light to provide modified polarization-retarded polarized light.
    Type: Grant
    Filed: June 18, 2008
    Date of Patent: October 13, 2009
    Assignee: ASML Netherlands B.V.
    Inventor: Roel De Jonge
  • Publication number: 20080309908
    Abstract: A lithography system including a polarized illumination source, a birefringence-controllable optical element, a birefringence inducer, a pattern generator, a linear polarizer, and a projection system. The polarized illumination source is configured to provide polarized light. The birefringence-controllable optical element is optically coupled to the polarized illumination source. The birefringence inducer is coupled to the birefringence-controllable optical element and configured to induce birefringence on the birefringence-controllable optical element to provide polarization-retarded polarized light. The pattern generator is optically coupled to the birefringence-controllable optical element. The linear polarizer is optically coupled to the pattern generator and configured (i) to receive the polarization-retarded polarized light and (ii) modify intensity distribution of the polarization-retarded polarized light to provide modified polarization-retarded polarized light.
    Type: Application
    Filed: June 18, 2008
    Publication date: December 18, 2008
    Applicant: ASML Netherlands B.V.
    Inventor: Roel DE JONGE
  • Patent number: 7403267
    Abstract: A system and method utilize a birefringence inducer to induce or change birefringence of an optical element to change an index of refraction within the optical element to produce a polarization-retarded light beam that passes through the optical element. The optical element can include one or more optical plates or adjustable optical compensators. The birefringence inducer can apply external forces on the optical element, such as mechanical, electrical, magnetic, or acoustical forces. A linear polarizer polarizes the output beam from the optical element to produce a linear polarized modified intensity light beam with a desired intensity distribution. A control system for controlling the inducing of birefringence can include an intensity detector and controller, and can provide a control signal to the birefringence inducer.
    Type: Grant
    Filed: March 31, 2005
    Date of Patent: July 22, 2008
    Assignee: ASML Netherlands B.V.
    Inventor: Roel de Jonge
  • Publication number: 20080143992
    Abstract: A lithographic apparatus uses polarized light to improve the imaging properties such as exposure latitude, while maintaining and extending the lifetime of an illumination system in a lithographic apparatus.
    Type: Application
    Filed: January 30, 2008
    Publication date: June 19, 2008
    Applicants: ASML NETHERLANDS B.V., Carl Zeiss SMT AG
    Inventors: Christian Wagner, Wilhelmus Petrus De Boeij, Roel De Jonge, Tilmann Heil, Damian Fiolka
  • Patent number: 7345740
    Abstract: A lithographic apparatus uses polarized light to improve the imaging properties such as exposure latitude, while maintaining and extending the lifetime of an illumination system in a lithographic apparatus.
    Type: Grant
    Filed: April 8, 2005
    Date of Patent: March 18, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Christian Wagner, Wilhelmus Petrus De Boeij, Roel De Jonge, Tilmann Heil, Damian Fiolka
  • Patent number: 7283208
    Abstract: A lithographic projection apparatus is provided with a sensor for detecting one of luminescence radiation, desorbed particles, or free charges produced by an interaction of the projection beam with a material at surface of a substrate. The luminescence radiation, desorbed particles, or free charges are indicative of the dose delivered to the substrate, and can be detected close to the substrate or at the substrate level to avoid errors due to transmission variations in the optical path from the radiation source to the substrate.
    Type: Grant
    Filed: December 29, 2003
    Date of Patent: October 16, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Catharinus Hubertus Mulkens, Paul Van Der Veen, Roel De Jonge, Roland Pieter Stolk
  • Publication number: 20060227282
    Abstract: A system and method utilize a birefringence inducer to induce or change birefringence of an optical element to change an index of refraction within the optical element to produce a polarization-retarded light beam that passes through the optical element. The optical element can include one or more optical plates or adjustable optical compensators. The birefringence inducer can apply external forces on the optical element, such as mechanical, electrical, magnetic, or acoustical forces. A linear polarizer polarizes the output beam from the optical element to produce a linear polarized modified intensity light beam with a desired intensity distribution. A control system for controlling the inducing of birefringence can include an intensity detector and controller, and can provide a control signal to the birefringence inducer.
    Type: Application
    Filed: March 31, 2005
    Publication date: October 12, 2006
    Applicant: ASML Netherlands B.V.
    Inventor: Roel de Jonge
  • Publication number: 20060139612
    Abstract: A lithographic apparatus uses polarized light to improve the imaging properties such as exposure latitude, while maintaining and extending the lifetime of an illumination system in a lithographic apparatus.
    Type: Application
    Filed: April 8, 2005
    Publication date: June 29, 2006
    Applicants: ASML NETHERLANDS B.V., Carl Zeis SMT AG
    Inventors: Christian Wagner, Wilhelmus De Boeij, Roel De Jonge, Tilmann Heil, Damian Fiolka
  • Publication number: 20060072088
    Abstract: A lithographic apparatus is provided in which exposure is carried out by projecting through an aqueous solution of alkali metal halide(s), the solution being in contact with the substrate to be exposed.
    Type: Application
    Filed: October 5, 2004
    Publication date: April 6, 2006
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Matthew Lipson, Marcel Mathijs Dierichs, Sjoerd Nicolaas Donders, Johannes Catharinus Mulkens, Bob Streefkerk, Ronald Wilklow, Roel De Jonge
  • Publication number: 20040189972
    Abstract: A lithographic projection apparatus is provided with a sensor for detecting one of luminescence radiation, desorbed particles, or free charges produced by an interaction of the projection beam with a material at surface of a substrate. The luminescence radiation, desorbed particles, or free charges are indicative of the dose delivered to the substrate, and can be detected close to the substrate or at the substrate level to avoid errors due to transmission variations in the optical path from the radiation source to the substrate.
    Type: Application
    Filed: December 29, 2003
    Publication date: September 30, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johannes Catharinus Hubertus Mulkens, Paul Van Der Veen, Roel De Jonge, Roland Pieter Stolk
  • Patent number: 6423262
    Abstract: The invention pertains to a technique for determining the dye uptake or measuring one or more structural parameters or mechanical properties of polymeric fibres. This technique entails measuring the Raman spectrum of the fibres during or after a spinning process. After the Raman spectrum has been treated, a model is applied to it which is derived from the Raman spectra of fibres having the same chemical composition as the fibres to be examined.
    Type: Grant
    Filed: May 1, 2000
    Date of Patent: July 23, 2002
    Assignee: Akzo Nobel N.V.
    Inventors: Robert Jan Van Wijk, Anton Peter De Weijer, Dirk Albert Klarenberg, Roel De Jonge, Gert Jan Jongerden