Patents by Inventor Roelandus Hendrikus Wilhelmus Moonen

Roelandus Hendrikus Wilhelmus Moonen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10549253
    Abstract: A reactor system for high throughput applications includes a plurality of reactor assemblies, each reactor assembly including: a fluid source, which fluid source is adapted to provide a pressurized fluid to the flow-through reactors, a flow splitter which flow splitter includes a planar microfluidic chip, which microfluidic chip has a chip inlet channel and a plurality of chip outlet channels, which microfluidic chip further includes a plurality of flow restrictor channels, where each flow restrictor channel extends from said chip inlet channel to an associated chip outlet channel, where the chip inlet channel and the chip outlet channels each have a diameter, where the diameter of the chip inlet channel is the same or less than the length of said chip inlet channel and where the diameter of each chip outlet channel is the same or less than the length of said chip outlet channel.
    Type: Grant
    Filed: September 17, 2018
    Date of Patent: February 4, 2020
    Assignee: Avantium Technologies B.V.
    Inventors: Roelandus Hendrikus Wilhelmus Moonen, Benno Hartog
  • Publication number: 20190022619
    Abstract: A reactor system for high throughput applications includes a plurality of reactor assemblies, each reactor assembly including: a fluid source, which fluid source is adapted to provide a pressurized fluid to the flow-through reactors, a flow splitter which flow splitter includes a planar microfluidic chip, which microfluidic chip has a chip inlet channel and a plurality of chip outlet channels, which microfluidic chip further includes a plurality of flow restrictor channels, where each flow restrictor channel extends from said chip inlet channel to an associated chip outlet channel, where the chip inlet channel and the chip outlet channels each have a diameter, where the diameter of the chip inlet channel is the same or less than the length of said chip inlet channel and where the diameter of each chip outlet channel is the same or less than the length of said chip outlet channel.
    Type: Application
    Filed: September 17, 2018
    Publication date: January 24, 2019
    Applicant: Avantium Technologies B.V.
    Inventors: Roelandus Hendrikus Wilhelmus Moonen, Benno Hartog
  • Patent number: 10099197
    Abstract: A reactor system for high throughput applications includes a plurality of reactor assemblies, each reactor assembly including: a fluid source, which fluid source is adapted to provide a pressurized fluid to the flow-through reactors, a flow splitter which flow splitter includes a planar microfluidic chip, which microfluidic chip has a chip inlet channel and a plurality of chip outlet channels, which microfluidic chip further includes a plurality of flow restrictor channels, where each flow restrictor channel extends from said chip inlet channel to an associated chip outlet channel, where the chip inlet channel and the chip outlet channels each have a diameter, where the diameter of the chip inlet channel is the same or less than the length of said chip inlet channel and where the diameter of each chip outlet channel is the same or less than the length of said chip outlet channel.
    Type: Grant
    Filed: November 20, 2014
    Date of Patent: October 16, 2018
    Assignee: Avantium Technologies B.V.
    Inventors: Roelandus Hendrikus Wilhelmus Moonen, Benno Hartog
  • Patent number: 9950304
    Abstract: A system for operating parallel reactors includes a plurality of reactor assemblies, each reactor assembly including: a flow-through reactor, a reactor feed line, a reactor effluent line, a primary fluid source, and a flow splitter which is arranged downstream of the primary fluid source and upstream of the reactor assemblies. All passive flow restrictors have an substantially equal resistance to fluid flow. A feed line pressure measurement device and a pressure control arrangement controls backpressure regulators such that the measured feed line pressure becomes substantially the same as a feed line pressure setpoint in the reactor assemblies.
    Type: Grant
    Filed: October 11, 2013
    Date of Patent: April 24, 2018
    Assignee: Avantium Technologies B.V.
    Inventor: Roelandus Hendrikus Wilhelmus Moonen
  • Patent number: 9868104
    Abstract: A pressure controller for use in operating parallel reactors, the pressure controller including a reference pressure controller, the reference pressure controller including: a first restrictor channel, a second restrictor channel, a fluid passage, which fluid passage extends between the outlet of the first restrictor channel and the inlet of the second restrictor channel, a pressure control fluid source being adapted to provide a flow of pressure control fluid, having an entrance pressure at the inlet of the first restrictor channel and an exit pressure at the outlet of the second restrictor channel, the flow of pressure control fluid experiencing a first pressure drop ??1 over the first restrictor channel and a second pressure drop ??2 over the second restrictor channel, a connector connecting the fluid passage to the control chamber, the pressure control fluid at the connector having an intermediate pressure, the intermediate pressure being determined by the ratio between the first pressure drop ??1 and the
    Type: Grant
    Filed: October 11, 2013
    Date of Patent: January 16, 2018
    Assignee: Avantium Technologies B.V.
    Inventors: Roelandus Hendrikus Wilhelmus Moonen, René Emilio Bodenstaff, Benno Hartog
  • Publication number: 20160288081
    Abstract: A reactor system for high throughput applications includes a plurality of reactor assemblies, each reactor assembly including: a fluid source, which fluid source is adapted to provide a pressurized fluid to the flow-through reactors, a flow splitter which flow splitter includes a planar microfluidic chip, which microfluidic chip has a chip inlet channel and a plurality of chip outlet channels, which microfluidic chip further includes a plurality of flow restrictor channels, where each flow restrictor channel extends from said chip inlet channel to an associated chip outlet channel, where the chip inlet channel and the chip outlet channels each have a diameter, where the diameter of the chip inlet channel is the same or less than the length of said chip inlet channel and where the diameter of each chip outlet channel is the same or less than the length of said chip outlet channel.
    Type: Application
    Filed: November 20, 2014
    Publication date: October 6, 2016
    Applicant: Avantium Technologies B.V.
    Inventors: Roelandus Hendrikus Wilhelmus Moonen, Benno Hartog
  • Publication number: 20160121291
    Abstract: A system for operating parallel reactors includes a plurality of reactor assemblies, each reactor assembly including: a flow-through reactor, a reactor feed line, a reactor effluent line, a primary fluid source, and a flow splitter which is arranged downstream of the primary fluid source and upstream of the reactor assemblies. All passive flow restrictors have an substantially equal resistance to fluid flow. A feed line pressure measurement device and a pressure control arrangement controls backpressure regulators such that the measured feed line pressure becomes substantially the same as a feed line pressure setpoint in the reactor assemblies.
    Type: Application
    Filed: October 11, 2013
    Publication date: May 5, 2016
    Applicant: AVANTIUM TECHNOLOGIES B.V.
    Inventor: Roelandus Hendrikus Wilhelmus Moonen
  • Publication number: 20150273427
    Abstract: A pressure controller for use in operating parallel reactors includes: a first restrictor channel, a second restrictor channel, a fluid passage, which fluid passage extends between the outlet of the first restrictor channel and the inlet of the second restrictor channel, a pressure control fluid source being adapted to provide a flow of pressure control fluid, having an entrance pressure at the inlet of the first restrictor channel and an exit pressure at the outlet of the second restrictor channel, the flow of pressure control fluid experiencing a first pressure drop ??1 over the first restrictor channel and a second pressure drop ??2 over the second restrictor channel, a connector connecting the fluid passage to the control chamber, the pressure control fluid at the connector having an intermediate pressure, the intermediate pressure being determined by the ratio between the first pressure drop ??1 and the second pressure drop ???2.
    Type: Application
    Filed: October 11, 2013
    Publication date: October 1, 2015
    Applicant: AVANTIUM TECHNOLOGIES B.V.
    Inventors: Roelandus Hendrikus Wilhelmus Moonen, René Emilio Bodenstaff, Benno Hartog
  • Patent number: 9080706
    Abstract: A system for measuring flow rates of fluid flows to parallel reactors includes a common feed line, a plurality of reactor feed lines for receiving a reactor fluid flow, a measurement line, and a valve system. The valve system includes one or more valves and a valve control unit for controlling the one or more valves, the valve system being arranged and/or adapted such that it can assume a measurement setting in which the valves redirect one of the reactor feed flows such that it flows through the measurement line.
    Type: Grant
    Filed: October 3, 2011
    Date of Patent: July 14, 2015
    Assignee: AVANTIUM HOLDING B.V.
    Inventor: Roelandus Hendrikus Wilhelmus Moonen
  • Publication number: 20130319554
    Abstract: A system for measuring flow rates of fluid flows to parallel reactors includes a common feed line, a plurality of reactor feed lines for receiving a reactor fluid flow, a measurement line, and a valve system. The valve system includes one or more valves and a valve control unit for controlling the one or more valves, the valve system being arranged and/or adapted such that it can assume a measurement setting in which the valves redirect one of the reactor feed flows such that it flows through the measurement line.
    Type: Application
    Filed: October 3, 2011
    Publication date: December 5, 2013
    Applicant: AVANTIUM HOLDING B.V.
    Inventor: Roelandus Hendrikus Wilhelmus Moonen
  • Publication number: 20120003122
    Abstract: A flow controller assembly for microfluidic applications includes at least one microfluidic flow controller, which includes a microfluidic chip, a thermal energy transmitter, a flow sensor for measuring the flow rate of a fluid running through the flow controller and a data control unit. The data control unit, which is connected to the flow sensor by a first data connection which allows the data control unit to receive flow rate measurement data from the flow sensor, and which is also connected to the thermal energy transmitter by a second data connection allows the data control unit to influence the thermal output of the thermal energy transmitter, includes a data processing unit that determines the difference between the measured flow rate and a preset desired flow rate and to regulate the thermal output of the thermal energy transmitter in order to obtain or maintain the desired flow rate.
    Type: Application
    Filed: March 16, 2010
    Publication date: January 5, 2012
    Applicant: AVANTIUM HOLDING B.V.
    Inventors: Emilio René Bodenstaff, Roelandus Hendrikus Wilhelmus Moonen
  • Patent number: 8084267
    Abstract: A laboratory degradation test system for testing degradation of a test specimen in a test fluid flow includes a reactor assembly, which reactor assembly comprises: a reactor vessel, the reactor vessel having a reaction space, an inlet and an outlet and a specimen holder for retaining a test specimen inside the reactor vessel, a heater for heating the reactor vessel, a fluid circulation system generating a test fluid flow over the test specimen, which fluid circulation system comprises: a circulation line which extends between the outlet of the reactor vessel and the inlet of the reactor vessel, which circulation line is arranged outside the reactor vessel, a pump for providing fluid circulation through the circulation line and the reactor vessel, which pump is arranged in the circulation line. The volume available to the test fluid inside the reaction space after insertion of the degradation test specimen is less than or equal to 10 ml.
    Type: Grant
    Filed: March 19, 2008
    Date of Patent: December 27, 2011
    Assignee: Avantium International B.V.
    Inventors: Gerardus Johannes Maria Gruter, Roelandus Hendrikus Wilhelmus Moonen, Jan Peter de Jong, David Michael Knowles
  • Publication number: 20110108132
    Abstract: The invention pertains to reaction systems in which at least one capillary unit is applied.
    Type: Application
    Filed: May 26, 2009
    Publication date: May 12, 2011
    Applicant: AVANTIUM HOLDING B.V.
    Inventors: Roelandus Hendrikus Wilhelmus Moonen, Emilio Rene' Bodenstaff, Martin Smit
  • Publication number: 20100105147
    Abstract: A laboratory degradation test system for testing degradation of a test specimen in a test fluid flow includes a reactor assembly, which reactor assembly comprises: a reactor vessel, the reactor vessel having a reaction space, an inlet and an outlet and a specimen holder for retaining a test specimen inside the reactor vessel, a heater for heating the reactor vessel, a fluid circulation system generating a test fluid flow over the test specimen, which fluid circulation system comprises: a circulation line which extends between the outlet of the reactor vessel and the inlet of the reactor vessel, which circulation line is arranged outside the reactor vessel, a pump for providing fluid circulation through the circulation line and the reactor vessel, which pump is arranged in the circulation line. The volume available to the test fluid inside the reaction space after insertion of the degradation test specimen is less than or equal to 10 ml.
    Type: Application
    Filed: March 19, 2008
    Publication date: April 29, 2010
    Applicant: AVANTIUM INTERNATIONAL B.V.
    Inventors: Gerardus Johannes Maria Gruter, Roelandus Hendrikus Wilhelmus Moonen, Jan Peter de Jong, David Michael Knowles
  • Patent number: 7518014
    Abstract: The present invention relates to a method of producing a catalyst or pre-catalyst suitable for assisting in the production of alkenyl alkanoates. The method includes contacting a modifier precursor to a support material to form a modified support material. One or more catalytic component precursors (palladium or gold) may be contacted to the modified support material. The atomic ratio of gold to palladium is preferably in the range of about 0.3 to about 0.90. The support materials with the catalytic component may then be reduced using a reducing environment. A composition for catalyzing the production of an alkenyl alkanoates including a modified support material with palladium and gold is also included within the invention. Catalysts of the present invention may be used to produce alkenyl alkanoates in general and vinyl acetate in particular and are useful to produce low EA/VA ratios while maintaining or improving CO2 selectivity.
    Type: Grant
    Filed: November 21, 2005
    Date of Patent: April 14, 2009
    Assignee: Celanese International Corp.
    Inventors: Barbara Kimmich, Leslie E. Wade, Tao Wang, André Harmen Sijpkes, Roelandus Hendrikus Wilhelmus Moonen
  • Publication number: 20080153692
    Abstract: The present invention relates to a method of producing a catalyst or pre-catalyst suitable for assisting in the production of alkenyl alkanoates. The method includes contacting a modifier precursor to a support material to form a modified support material. One or more catalytic component precursors (palladium or gold) may be contacted to the modified support material. The atomic ratio of gold to palladium is preferably in the range of about 0.3 to about 0.90. The support materials with the catalytic component may then be reduced using a reducing environment. A composition for catalyzing the production of an alkenyl alkanoates including a modified support material with palladium and gold is also included within the invention. Catalysts of the present invention may be used to produce alkenyl alkanoates in general and vinyl acetate in particular and are useful to produce low EA/VA ratios while maintaining or improving CO2 selectivity.
    Type: Application
    Filed: March 4, 2008
    Publication date: June 26, 2008
    Applicant: CELANESE INTERNATIONAL CORP.
    Inventors: Barbara Kimmich, Leslie E. Wade, Tao Wang, Andre Harmen Sijpkes, Roelandus Hendrikus Wilhelmus Moonen