Patents by Inventor Roelof Aeilko Ritsema

Roelof Aeilko Ritsema has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20090002652
    Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
    Type: Application
    Filed: May 15, 2008
    Publication date: January 1, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Antonius Theodorus Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Mulkens, Roelof Aeilko Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • Lithographic apparatus and device manufacturing method
    Publication number: 20070132979
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
    Type: Application
    Filed: July 7, 2006
    Publication date: June 14, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Erik Maria Bijlaart, Roelof Aeilko Ritsema, Frank Schaik, Timotheus Sengers, Klaus Simon, Joannes De Smit, Arie Den Boef, Hans Butler, Sjoerd Lambertus Donders, Christiaan Hoogendam, Marcus Van De Kerkhof, Aleksey Kolesnychenko, Mark Kroon, Erik Loopstra, Hendricus Maria Meijer, Jeroen Sophia Maria Mertens, Johannes Hubertus Mulkens, Joost Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Santen
  • Lithographic apparatus and device manufacturing method
    Publication number: 20070040133
    Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
    Type: Application
    Filed: March 9, 2006
    Publication date: February 22, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Joannes De Smit, Roelof Aeilko Ritsema, Klaus Simon, Theodorus Modderman, Johannes Catharinus Mulkens, Hendricus Johannes Meijer, Erik Roelof Loopstra
  • Lithographic apparatus and device manufacturing method
    Publication number: 20060232756
    Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.
    Type: Application
    Filed: September 30, 2005
    Publication date: October 19, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Antonius Theodorus Derksen, Christiaan Hoogendam, Aleksey Kolesnychenko, Erik Loopstra, Theodorus Modderman, Johannes Catharinus Mulkens, Roelof Aeilko Ritsema, Klaus Simon, Joannes De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Santen, Sjoerd Nicolaas Donders
  • Lithographic apparatus and device manufacturing method
    Publication number: 20060023189
    Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
    Type: Application
    Filed: September 30, 2005
    Publication date: February 2, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Antonius Theodorus Derksen, Christiaan Hoogendam, Aleksey Kolesnychenko, Erik Loopstra, Theodorus Modderman, Johannes Catharinus Mulkens, Roelof Aeilko Ritsema, Klaus Simon, Joannes De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Santen
  • Lithographic apparatus and device manufacturing method
    Publication number: 20050264778
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
    Type: Application
    Filed: June 1, 2004
    Publication date: December 1, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Erik Bijlaart, Roelof Aeilko Ritsema, Frank Schaik, Timotheus Sengers, Klaus Simon, Joannes De Smit, Arie Den Boef, Hans Butler, Sjoerd Donders, Christiaan Hoogendam, Marcus Van De Kerkhof, Aleksey Kolesnychenko, Mark Kroon, Erik Loopstra, Hendricus Meijer, Jeroen Maria Mertens, Johannes Mulkens, Joost Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen