Patents by Inventor Roelof Frederik De Graaf
Roelof Frederik De Graaf has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11016394Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.Type: GrantFiled: June 15, 2020Date of Patent: May 25, 2021Assignee: ASML NETHERLANDS B.V.Inventors: Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Michel Riepen
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Publication number: 20200310252Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.Type: ApplicationFiled: June 15, 2020Publication date: October 1, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Bob STREEFKERK, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christian Alexander Hoogendam, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Michel Riepen
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Patent number: 10705439Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: GrantFiled: February 26, 2018Date of Patent: July 7, 2020Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Joost Jeroen Ottens, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Johannes Petrus Maria Smeulers, Stefan Philip Christiaan Belfroid, Herman Vogel
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Patent number: 10684554Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.Type: GrantFiled: July 15, 2019Date of Patent: June 16, 2020Assignee: ASML Netherlands B.V.Inventors: Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Michel Riepen
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Patent number: 10599054Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: GrantFiled: June 12, 2019Date of Patent: March 24, 2020Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
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Patent number: 10488759Abstract: An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.Type: GrantFiled: April 7, 2017Date of Patent: November 26, 2019Assignee: ASML Netherlands B.V.Inventors: Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Hans Jansen, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Jeroen Johannes Sophia Maria Mertens, Jan-Gerard Cornelis Van Der Toorn, Michel Riepen
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Publication number: 20190339623Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.Type: ApplicationFiled: July 15, 2019Publication date: November 7, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Bob STREEFKERK, Sjoerd Nicolaas Lambertus DONDERS, Roelof Frederik DE GRAAF, Christiaan Alexander HOOGENDAM, Martinus Hendrikus Antonius LEENDERS, Jeroen Johannes Sophia Maria MERTENS, Michel RIEPEN
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Patent number: 10451973Abstract: An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.Type: GrantFiled: September 30, 2015Date of Patent: October 22, 2019Assignee: ASML Netherlands B.V.Inventors: Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Hans Jansen, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Jeroen Johannes Sophia Maria Mertens, Jan-Gerard Cornelis Van Der Toorn, Michel Riepen
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Publication number: 20190294058Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: ApplicationFiled: June 12, 2019Publication date: September 26, 2019Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
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Patent number: 10353296Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.Type: GrantFiled: July 13, 2018Date of Patent: July 16, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Michel Riepen
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Patent number: 10331047Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: GrantFiled: August 28, 2017Date of Patent: June 25, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
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Patent number: 10248033Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.Type: GrantFiled: September 1, 2017Date of Patent: April 2, 2019Assignee: ASML Netherlands B.V.Inventors: Jeroen Johannes Sophia Maria Mertens, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Antonius Johannus Van Der Net, Franciscus Johannes Herman Maria Teunissen, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Edwin Augustinus Matheus Van Gompel
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Publication number: 20180321594Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.Type: ApplicationFiled: July 13, 2018Publication date: November 8, 2018Inventors: Bob STREEFKERK, Sjoerd Nicolaas Lambertud Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Michel Riepen
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Patent number: 10025196Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.Type: GrantFiled: March 27, 2017Date of Patent: July 17, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Michel Riepen
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Publication number: 20180188661Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: ApplicationFiled: February 26, 2018Publication date: July 5, 2018Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Nicolaas Rudolf KEMPER, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Joost Jeroen Ottens, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Johannes Petrus Maria Smeulers, Stefan Philip Christiaan Belfroid, Herman Vogel
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Patent number: 9904185Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: GrantFiled: October 24, 2016Date of Patent: February 27, 2018Assignees: ASML NETHERLANDS B.V., ASML HOLDINGS N.V.Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Joost Jeroen Ottens, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Johannes Petrus Maria Smeulers, Stefan Philip Christiaan Belfroid, Herman Vogel
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Publication number: 20180039188Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.Type: ApplicationFiled: September 1, 2017Publication date: February 8, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Jeroen Johannes Sophia Maria MERTENS, Sjoerd Nicolaas Lambertus DONDERS, Roelof Frederik DE GRAAF, Christiaan Alexander HOOGENDAM, Antonius Johannus VAN DER NET, Franciscus Johannes Herman Maria TEUNISSEN, Patricius Aloysius Jacobus TINNEMANS, Martinus Cornelis Maria VERHAGEN, Jacobus Johannus Leonardus Hendricus VERSPAY, Edwin Augustinus Matheus VAN GOMPEL
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Publication number: 20170357165Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: ApplicationFiled: August 28, 2017Publication date: December 14, 2017Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Nicolaas Rudolf KEMPER, Henrikus Herman Marie COX, Sjored Nicolaas Lambertus DONDERS, Roelof Frederik DE GRAAF, Christiaan Alexander HOOGENDAM, Nicolaas TEN KATE, Jeroen Johannes Sophia Maria MERTENS, Frits VAN DER MEULEN, Franciscus Johannes Herman Maria TEUNISSEN, Jan-Gerard Cornelis VAN DER TOORN, Martinus Cornelis Maria VERHAGEN, Stefan Philip Christiaan BELFROID, Johannes Petrus Maria SMEULERS, Herman VOGEL
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Patent number: 9785061Abstract: A lithographic system includes an immersion type lithographic apparatus, which includes a support constructed and arranged to support a substrate, a projection system constructed and arranged to project a patterned beam of radiation onto a target portion of the substrate, a liquid confinement structure configured to at least partially fill a space between the projection system and at least one of the substrate and support with an immersion liquid, a liquid supply system arranged to provide the immersion liquid to the liquid confinement structure, and a cleaning liquid supply system arranged to provide a cleaning liquid to a surface of the lithographic apparatus that comes into contact with the immersion liquid. The system includes a switch to provide the cleaning liquid directly to the liquid confinement structure and to provide the immersion liquid indirectly to the liquid confinement structure via a liquid purification system.Type: GrantFiled: August 1, 2016Date of Patent: October 10, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Roelof Frederik De Graaf, Hans Jansen, Bauke Jansen, Hubertus Leonardus Franciscus Heusschen
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Patent number: 9753380Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.Type: GrantFiled: August 30, 2016Date of Patent: September 5, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Jeroen Johannes Sophia Maria Mertens, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Antonius Johannus Van Der Net, Franciscus Johannes Herman Maria Teunissen, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Edwin Augustinus Matheus Van Gompel