Patents by Inventor Roelof Graaf

Roelof Graaf has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20070114452
    Abstract: Lithographic Apparatus and Device Manufacturing Method In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
    Type: Application
    Filed: November 23, 2005
    Publication date: May 24, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hans Jansen, Sebastiaan Cornelissen, Sjoerd Donders, Roelof Graaf, Christiaan Hoogendam, Hernes Jacobs, Martinus Leenders, Jeroen Johannes Mertens, Jan-Gerard Cornelis Van Der Toorn, Peter Smits, Franciscus Janssen, Michel Riepen, Bob Streefkerk
  • Lithographic apparatus and device manufacturing method
    Publication number: 20060087630
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Application
    Filed: August 29, 2005
    Publication date: April 27, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Kemper, Henrikus Cox, Sjoerd Donders, Roelof Graaf, Christiaan Hoogendam, Nicolaas Kate, Martinus Hendrikus Leenders, Jeroen Mertens, Frits Meulen, Joost Ottens, Franciscus Maria Teunissen, Jan-Gerard Toorn, Martinus Verhagen, Marco Polizzi, Edwin Augustinus Van Gompel, Johannes Smeulers, Stefan Belfroid