Patents by Inventor Roger Anton Marie Timmermans

Roger Anton Marie Timmermans has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230360954
    Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.
    Type: Application
    Filed: July 18, 2023
    Publication date: November 9, 2023
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Niek Jacobus Johannes ROSET, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Mark Constant Johannes BAGGEN, Gijs KRAMER, Roger Anton Marie TIMMERMANS, Frank Pieter Albert VAN DEN BERKMORTEL
  • Patent number: 11749556
    Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.
    Type: Grant
    Filed: September 22, 2021
    Date of Patent: September 5, 2023
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Niek Jacobus Johannes Roset, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Mark Constant Johannes Baggen, Gijs Kramer, Roger Anton Marie Timmermans, Frank Pieter Albert Van Den Berkmortel
  • Publication number: 20220051927
    Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.
    Type: Application
    Filed: September 22, 2021
    Publication date: February 17, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Niek Jacobus Johannes ROSET, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Mark Constant Johannes BAGGEN, Gijs KRAMER, Roger Anton Marie TIMMERMANS, Frank Pieter Albert VAN DEN BERKMORTEL
  • Patent number: 11139196
    Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.
    Type: Grant
    Filed: September 19, 2018
    Date of Patent: October 5, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Niek Jacobus Johannes Roset, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Mark Constant Johannes Baggen, Gijs Kramer, Roger Anton Marie Timmermans, Frank Pieter Albert Van Den Berkmortel
  • Publication number: 20200294841
    Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.
    Type: Application
    Filed: September 19, 2018
    Publication date: September 17, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Niek Jacobus Johannes ROSET, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Mark Constant Johannes BAGGEN, Gijs KRAMER, Roger Anton Marie TIMMERMANS, Frank Pieter Albert VAN DEN BERKMORTEL
  • Publication number: 20160349628
    Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction.
    Type: Application
    Filed: August 12, 2016
    Publication date: December 1, 2016
    Applicant: ASML Netherlands B.V.
    Inventors: Arno Jan BLEEKER, Thomas Josephus Maria CASTENMILLER, Pieter Willem Herman DEJAGER, Heine Melle MULDER, Koen Jacobus Johannes ZAAL, Theodorus Petrus Maria CADEE, Danny Maria Hubertus PHILIPS, Ruud Antonius Catharina Maria BEERENS, Roger Anton Marie TIMMERMANS
  • Publication number: 20150034788
    Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame (8) configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction. Provisions are made to prevent moments to be exerted on the lens held by the rotatable frame.
    Type: Application
    Filed: January 30, 2013
    Publication date: February 5, 2015
    Inventors: Arno Jan Bleeker, Thomas Josephus Maria Castenmill, Pieter Willem Herman De Jager, Heine Melle Mulder, Koen Jacobus Johannes Maria Zaal, Theodorus Petrus Maria Cadee, Danny Maria Hubertus Philips, Ruud Antonius Catharina Maria Beere, Roger Anton Marie Timmermans
  • Patent number: 7585110
    Abstract: An X-ray examination apparatus (10) comprises radiation modules in the form of an X-ray source (20) and an X-ray detector(18), a main curved arm (12) having opposite end sections (S1, S2) and a first auxiliary arm (14) provided at one end section (S1) of the main arm. The first auxiliary arm carries one radiation module (18) and another radiation module (20) is coupled to the other end section of the main arm. The first auxiliary arm has a shape that complements the curvature of the main curved arm at least at the first end section and is movable with respect to this end section at least in a direction away from it. In this way a wide range of inspection angles as well as a good patient coverage is achieved without limiting the rotational freedom of the apparatus.
    Type: Grant
    Filed: September 8, 2006
    Date of Patent: September 8, 2009
    Assignee: Koninklijke Philips Electronics N.V.
    Inventors: Roger Anton Marie Timmermans, Raymond Wilhelmus Louis Lafarre
  • Patent number: 7578618
    Abstract: The invention concerns an X-ray examination device (10) comprising an X-ray source (20), an X-ray detector (18) and a segmented carrier, where the X-ray source and the X-ray detector are rotatable together around an isocentre (32). The segmented carrier includes a main arm (12) on which the X-ray source and X-ray detector are mounted and at least one first auxiliary arm (22) to which the main arm is mounted. The first auxiliary arm is rotatable around a first rotational axis (30) through the isocentre.
    Type: Grant
    Filed: September 8, 2006
    Date of Patent: August 25, 2009
    Assignee: Koninklijke Philips Electronics N.V.
    Inventors: Roger Anton Marie Timmermans, Raymond Wilhelmus Louis Lafarre
  • Publication number: 20090009736
    Abstract: In an apparatus for forming an image in a radiation sensitive layer (6) and comprising an array (16) of light valves (18-22) and a corresponding array (40) of converging elements (46) the positions of radiation spots (204) formed by these arrays (16,40) are monitored and their positions determined by means of a sensing module, which is arranged below the plane of the spots. The module is provided with a slit plate (182) showing pair of slits (186,188) and with position encoders (190,192,194,196) and the plate carrying the converging elements is provided with tracking configurations (171,173,175,177) and alignment marks (198).
    Type: Application
    Filed: October 20, 2004
    Publication date: January 8, 2009
    Applicant: Koninklijke Philips Electronics N.V.
    Inventors: Roger Anton Marie Timmermans, Johannes Hubertus Antonius Van De Rijdt
  • Publication number: 20080226036
    Abstract: The invention concerns an X-ray examination device (10) comprising an X-ray source (20), an X-ray detector (18) and a segmented carrier, where the X-ray source and the X-ray detector are rotatable together around an isocentre (32). The segmented carrier includes a main arm (12) on which the X-ray source and X-ray detector are mounted and at least one first auxiliary arm (22) to which the main arm is mounted. The first auxiliary arm is rotatable around a first rotational axis (30) through the isocentre.
    Type: Application
    Filed: September 8, 2006
    Publication date: September 18, 2008
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.
    Inventors: Roger Anton Marie Timmermans, Raymond Wilhelmus Louis Lafarre
  • Publication number: 20080198973
    Abstract: An X-ray examination apparatus (10) comprises radiation modules in the form of an X-ray source (20) and an X-ray detector(18), a main curved arm (12) having opposite end sections (S1, S2) and a first auxiliary arm (14) provided at one end section (S1) of the main arm. The first auxiliary arm carries one radiation module (18) and another radiation module (20) is coupled to the other end section of the main arm. The first auxiliary arm has a shape that complements the curvature of the main curved arm at least at the first end section and is movable with respect to this end section at least in a direction away from it. In this way a wide range of inspection angles as well as a good patient coverage is achieved without limiting the rotational freedom of the apparatus.
    Type: Application
    Filed: September 8, 2006
    Publication date: August 21, 2008
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.
    Inventors: Roger Anton Marie Timmermans, Raymond Wilhemus Louis Lafarre