Patents by Inventor Roger Anton Marie Timmermans
Roger Anton Marie Timmermans has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230360954Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.Type: ApplicationFiled: July 18, 2023Publication date: November 9, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Niek Jacobus Johannes ROSET, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Mark Constant Johannes BAGGEN, Gijs KRAMER, Roger Anton Marie TIMMERMANS, Frank Pieter Albert VAN DEN BERKMORTEL
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Patent number: 11749556Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.Type: GrantFiled: September 22, 2021Date of Patent: September 5, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Niek Jacobus Johannes Roset, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Mark Constant Johannes Baggen, Gijs Kramer, Roger Anton Marie Timmermans, Frank Pieter Albert Van Den Berkmortel
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Publication number: 20220051927Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.Type: ApplicationFiled: September 22, 2021Publication date: February 17, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Niek Jacobus Johannes ROSET, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Mark Constant Johannes BAGGEN, Gijs KRAMER, Roger Anton Marie TIMMERMANS, Frank Pieter Albert VAN DEN BERKMORTEL
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Patent number: 11139196Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.Type: GrantFiled: September 19, 2018Date of Patent: October 5, 2021Assignee: ASML NETHERLANDS B.V.Inventors: Niek Jacobus Johannes Roset, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Mark Constant Johannes Baggen, Gijs Kramer, Roger Anton Marie Timmermans, Frank Pieter Albert Van Den Berkmortel
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Publication number: 20200294841Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.Type: ApplicationFiled: September 19, 2018Publication date: September 17, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Niek Jacobus Johannes ROSET, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Mark Constant Johannes BAGGEN, Gijs KRAMER, Roger Anton Marie TIMMERMANS, Frank Pieter Albert VAN DEN BERKMORTEL
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Publication number: 20160349628Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction.Type: ApplicationFiled: August 12, 2016Publication date: December 1, 2016Applicant: ASML Netherlands B.V.Inventors: Arno Jan BLEEKER, Thomas Josephus Maria CASTENMILLER, Pieter Willem Herman DEJAGER, Heine Melle MULDER, Koen Jacobus Johannes ZAAL, Theodorus Petrus Maria CADEE, Danny Maria Hubertus PHILIPS, Ruud Antonius Catharina Maria BEERENS, Roger Anton Marie TIMMERMANS
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Publication number: 20150034788Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame (8) configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction. Provisions are made to prevent moments to be exerted on the lens held by the rotatable frame.Type: ApplicationFiled: January 30, 2013Publication date: February 5, 2015Inventors: Arno Jan Bleeker, Thomas Josephus Maria Castenmill, Pieter Willem Herman De Jager, Heine Melle Mulder, Koen Jacobus Johannes Maria Zaal, Theodorus Petrus Maria Cadee, Danny Maria Hubertus Philips, Ruud Antonius Catharina Maria Beere, Roger Anton Marie Timmermans
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Patent number: 7585110Abstract: An X-ray examination apparatus (10) comprises radiation modules in the form of an X-ray source (20) and an X-ray detector(18), a main curved arm (12) having opposite end sections (S1, S2) and a first auxiliary arm (14) provided at one end section (S1) of the main arm. The first auxiliary arm carries one radiation module (18) and another radiation module (20) is coupled to the other end section of the main arm. The first auxiliary arm has a shape that complements the curvature of the main curved arm at least at the first end section and is movable with respect to this end section at least in a direction away from it. In this way a wide range of inspection angles as well as a good patient coverage is achieved without limiting the rotational freedom of the apparatus.Type: GrantFiled: September 8, 2006Date of Patent: September 8, 2009Assignee: Koninklijke Philips Electronics N.V.Inventors: Roger Anton Marie Timmermans, Raymond Wilhelmus Louis Lafarre
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Patent number: 7578618Abstract: The invention concerns an X-ray examination device (10) comprising an X-ray source (20), an X-ray detector (18) and a segmented carrier, where the X-ray source and the X-ray detector are rotatable together around an isocentre (32). The segmented carrier includes a main arm (12) on which the X-ray source and X-ray detector are mounted and at least one first auxiliary arm (22) to which the main arm is mounted. The first auxiliary arm is rotatable around a first rotational axis (30) through the isocentre.Type: GrantFiled: September 8, 2006Date of Patent: August 25, 2009Assignee: Koninklijke Philips Electronics N.V.Inventors: Roger Anton Marie Timmermans, Raymond Wilhelmus Louis Lafarre
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Publication number: 20090009736Abstract: In an apparatus for forming an image in a radiation sensitive layer (6) and comprising an array (16) of light valves (18-22) and a corresponding array (40) of converging elements (46) the positions of radiation spots (204) formed by these arrays (16,40) are monitored and their positions determined by means of a sensing module, which is arranged below the plane of the spots. The module is provided with a slit plate (182) showing pair of slits (186,188) and with position encoders (190,192,194,196) and the plate carrying the converging elements is provided with tracking configurations (171,173,175,177) and alignment marks (198).Type: ApplicationFiled: October 20, 2004Publication date: January 8, 2009Applicant: Koninklijke Philips Electronics N.V.Inventors: Roger Anton Marie Timmermans, Johannes Hubertus Antonius Van De Rijdt
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Publication number: 20080226036Abstract: The invention concerns an X-ray examination device (10) comprising an X-ray source (20), an X-ray detector (18) and a segmented carrier, where the X-ray source and the X-ray detector are rotatable together around an isocentre (32). The segmented carrier includes a main arm (12) on which the X-ray source and X-ray detector are mounted and at least one first auxiliary arm (22) to which the main arm is mounted. The first auxiliary arm is rotatable around a first rotational axis (30) through the isocentre.Type: ApplicationFiled: September 8, 2006Publication date: September 18, 2008Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.Inventors: Roger Anton Marie Timmermans, Raymond Wilhelmus Louis Lafarre
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Publication number: 20080198973Abstract: An X-ray examination apparatus (10) comprises radiation modules in the form of an X-ray source (20) and an X-ray detector(18), a main curved arm (12) having opposite end sections (S1, S2) and a first auxiliary arm (14) provided at one end section (S1) of the main arm. The first auxiliary arm carries one radiation module (18) and another radiation module (20) is coupled to the other end section of the main arm. The first auxiliary arm has a shape that complements the curvature of the main curved arm at least at the first end section and is movable with respect to this end section at least in a direction away from it. In this way a wide range of inspection angles as well as a good patient coverage is achieved without limiting the rotational freedom of the apparatus.Type: ApplicationFiled: September 8, 2006Publication date: August 21, 2008Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.Inventors: Roger Anton Marie Timmermans, Raymond Wilhemus Louis Lafarre