Abstract: A system that reduces the buildup of film on a movable shaft that enters and is retracted from a process chamber is disclosed. A ring heater is disposed around the shaft inside the process chamber proximate the air bearing. The ring heater includes a plurality of optical energy emitters arranged around the shaft. The wavelength emitted by the ring heater may be selected to align with the absorption spectrum of the film. In this way, the optical energy serves to heat the film and lower the tendency for the film to adhere to the movable shaft and enter the air bearing.

Abstract: A system that reduces the amount of contaminants that enters a process chamber or air bearing via a movable shaft is disclosed. The movable shaft includes an outer shell made from a material having a low coefficient of thermal expansion. This allows the outer shell to be heated to sufficiently high temperatures to avoid condensation of contaminants on the shaft, while minimizing any change in the diameter of the shaft, which passes through an air bearing. The shaft may also have a temperature modification device disposed adjacent to the interior surface of the outer shell. In some embodiment, the shaft may include an inner liner. An insulative layer may be provided between the inner liner and the outer shell, such that the temperature of the outer shell does not cause the inner liner to thermally expand.

Abstract: A system that reduces the amount of contaminants that enters a process chamber or air bearing via a movable shaft is disclosed. The movable shaft includes an outer shell made from a material having a low coefficient of thermal expansion. This allows the outer shell to be heated to sufficiently high temperatures to avoid condensation of contaminants on the shaft, while minimizing any change in the diameter of the shaft, which passes through an air bearing. The shaft may also have a temperature modification device disposed adjacent to the interior surface of the outer shell. In some embodiment, the shaft may include an inner liner. An insulative layer may be provided between the inner liner and the outer shell, such that the temperature of the outer shell does not cause the inner liner to thermally expand.

Abstract: A workpiece support system is disclosed. This support system allows the back surface of a workpiece to be exposed to an incoming ion beam while the front surface of the workpiece remains untouched. The workpiece support system includes pivotable latches that have an open position and a closed position. In the closed position, the pivotable latches contact only the edge exclusion zone of the workpiece. This reduces the possibility of damage to the front surface of the workpiece. Further, the workpiece support system may include a gimbal allowing multiple degrees of rotational freedom.

Abstract: A system that reduces the amount of water that enters a process chamber via a movable shaft is disclosed. A ring heater is disposed around the shaft outside the process chamber proximate the air bearing. The ring heater includes a plurality of optical energy emitters arranged around the shaft. The wavelength emitted by the ring heater may be selected to align with the absorption spectrum of water. In this way, the optical energy serves to heat water droplets and lower the tendency for the water droplets to adhere to the movable shaft as it enters the process chamber.

Abstract: A system that reduces the buildup of film on a movable shaft that enters and is retracted from a process chamber is disclosed. A ring heater is disposed around the shaft inside the process chamber proximate the air bearing. The ring heater includes a plurality of optical energy emitters arranged around the shaft. The wavelength emitted by the ring heater may be selected to align with the absorption spectrum of the film. In this way, the optical energy serves to heat the film and lower the tendency for the film to adhere to the movable shaft and enter the air bearing.

Abstract: An ion source that includes a material delivery system to deliver a metal dopant in the form of a wire to the ion source is disclosed. The wire is introduced through an opening in one wall of the arc chamber and is sputtered or chemically etched by the plasma. The rate at which the wire is delivered may be controlled so as to maintain a desired beam current without causing any liquid metal to be spilled in the arc chamber. In some embodiments, the wire may be heated or cooled prior to entering the ion source. In some embodiments, a dopant power supply may be employed to supply a bias voltage to the wire. A controller may be used to control various parameters associated with the metal dopant, including delivery rate, dopant voltage and dopant temperature.

Abstract: A three-way valve is disclosed. The valve achieved constant flow rate as the valve transitions from 100% flow through the first path to 100% flow through the second path. The valve is linearly actuated, which allows a plurality of valves to be efficiently disposed in a manifold. The valve comprises a spool having two passageways therethrough which converge at the input. The spool is disposed in a housing. By linear movement of the spool within the housing, the amount of the incoming flow that passes through each of the two passageways can be controlled. In certain embodiments, the spool is in communication with an actuator to control its position within the housing. The three-way valve may be used as part of a manifold.

Abstract: A three-way valve is disclosed. The valve achieved constant flow rate as the valve transitions from 100% flow through the first path to 100% flow through the second path. The valve is linearly actuated, which allows a plurality of valves to be efficiently disposed in a manifold. The valve comprises a spool having two passageways therethrough which converge at the input. The spool is disposed in a housing. By linear movement of the spool within the housing, the amount of the incoming flow that passes through each of the two passageways can be controlled. In certain embodiments, the spool is in communication with an actuator to control its position within the housing. The three-way valve may be used as part of a manifold.

Abstract: A rotary union that includes a heated ferrofluid seal is disclosed. The rotary union includes an inner rotating shaft, an intermediate rotating shaft and an outer rotating shaft. The inner rotating shaft is hollow to allow the flow of cryogenic fluid in one direction. The inner rotating shaft and the intermediate shaft are spaced apart to create a channel for the return of the cryogenic fluid. The intermediate rotating shaft is separated from the outer rotating shaft by a gap so as to reduce thermal conductivity. In this way, the temperature of the outer rotating shaft is greater than the temperature of the cryogenic fluid. A heated ferrofluid seal is disposed between the outer rotating shaft and the housing.

Abstract: A rotary union that includes a heated ferrofluid seal is disclosed. The rotary union includes an inner rotating shaft, an intermediate rotating shaft and an outer rotating shaft. The inner rotating shaft is hollow to allow the flow of cryogenic fluid in one direction. The inner rotating shaft and the intermediate shaft are spaced apart to create a channel for the return of the cryogenic fluid. The intermediate rotating shaft is separated from the outer rotating shaft by a gap so as to reduce thermal conductivity. In this way, the temperature of the outer rotating shaft is greater than the temperature of the cryogenic fluid. A heated ferrofluid seal is disposed between the outer rotating shaft and the housing.

Abstract: A platen support structure adapted to thermally insulate a heated platen portion from a cold base plate while providing substantially leak-free gas transport therebetween and while allowing thermal expansion and contraction of the platen portion. Various examples provide of the support structure provide a tubular flexure having an internal gas conduit, a platen portion mounting tab connected to the flexure and having an internal gas input slot that is in fluid communication with the internal gas conduit of the flexure, the platen portion mounting tab being adapted for connection to a platen portion of a platen, and a base plate mounting tab connected to the flexure and having an internal gas output slot that is in fluid communication with the internal gas conduit of the flexure, the base plate mounting tab being adapted for connection to a base plate of the platen.

Abstract: An apparatus to support a substrate may include a base, a clamp portion to apply a clamping voltage to the substrate, and a displacement assembly configured to hold the clamp portion and base together in a first operating position, and to move the clamp portion with respect to the base from the first operating position to a second operating position, wherein the clamp portion and base are separate from one another in the second operating position.

Abstract: Disclosed is a thermosyphon system for cooling a platen in an ion implantation system. The thermosyphon system may include a vacuum chamber housing at least one wafer platen and a phase separator tank operative to contain both a liquid and gas phases of an element. A re-condensing cold head is exposed within the phase separator tank and is operative to condense the element from its gas phase to its liquid phase. This creates a convection driven closed loop pipe configuration. The closed loop pipe configuration includes a liquid phase pipe to carry the lower temperature liquid phase from the phase separator tank to the platen in the vacuum chamber. A reaction with the warmer platen converts the liquid phase to the gas phase. A gas phase pipe carries the higher temperature gas phase from the platen in the vacuum chamber back to the phase separator tank.

Abstract: A low pressure temperature sensor for measuring the temperature of a substrate during semiconductor device manufacturing is generally described. Various embodiments describe a gas chamber having an opening disposed within a dielectric plate of a platen with a seal disposed around the opening in the gas chamber such that the opening in the gas chamber may be sealed against the substrate. Furthermore, a temperature sensor and a spring are disposed in the gas chamber, the spring biased to place the temperature sensor in contact with the substrate. Additionally, a gas source configured to pressurize the gas chamber with a low pressure gas in order to increase thermal conductivity between the substrate and the temperature sensor is provided.

Abstract: A new type of superconducting fault current limiter is disclosed, which can advantageously be used with high voltage transmission networks. The circuit is electrically connected to two terminals, which connect to the transmission network. The superconducting circuit is located within an enclosure or tank, which is electrically isolated from ground. Therefore, the voltage difference between the enclosure and the superconducting circuit, and between the enclosure and the terminals are significantly less than exist in current deployments. In some embodiments, the enclosure is electrically connected to one of the terminals, while in other embodiments, the enclosure is electrically isolated from the terminals. The circuit can be combined with other like circuits to address a wide range of current transmission network configurations.

Abstract: A heated platen with improved temperature uniformity is generally described. Various examples provide a platen portion with a metallization layer thermally coupled thereto. An electrical contact may be connected to the metallization layer and configured to conduct an electric current for heating the metallization layer and the platen portion. The electrical contact may include an electrical conductor and a resistive heating element that is configured to heat up when electric current flows therethrough, thereby creating a thermal block that reduces an amount of heat that is absorbed into the electrical contact from the platen portion.

Abstract: An improved system and method of measuring the temperature of a workpiece in a processing chamber is disclosed. Because silicon has very low emissivity in the infrared band, a coating is disposed on at least a portion of the workpiece. This coating may be graphite or any other material that can be readily applied, and has a relatively constant emissivity over temperature in the infrared spectrum. In one embodiment, a coating of graphite is applied to a portion of the workpiece, allowing the temperature of the workpiece to be measured by observing the temperature of the coating. This technique can be used to calibrate a processing chamber, validate operating conditions within the processing chamber, or to develop a manufacturing process.

Abstract: An apparatus to support a substrate may include a base, a clamp portion to apply a clamping voltage to the substrate, and a displacement assembly configured to hold the clamp portion and base together in a first operating position, and to move the clamp portion with respect to the base from the first operating position to a second operating position, wherein the clamp portion and base are separate from one another in the second operating position.

Abstract: A vacuum insulated cryogenic fluid transfer hose provides a fluid conduit and high-pressure fitting with a highly-insulative vacuum jacket which enables convenient access to the fitting. An interface collar is mounted to an end of the transfer hose with the fluid conduit and the fitting extending therethrough, a bellows fastened at a first end to an interior of the interface collar and fastened at a second end to a pass-through collar, a slide cuff mounted to the pass-through collar and extending over the bellows and the interface collar, and a connecting nut mounted to the pass-through collar. The slide cuff is displaceable relative to the interface collar between a retracted position, wherein the connecting nut, the pass-through collar, and the bellows are retracted to expose and provide access to the fitting, and an extended position, wherein the fitting is entirely covered by the enclosure.