Patents by Inventor Roger E. Logar

Roger E. Logar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Particulate-free epitaxial process
    Patent number: 5373806
    Abstract: Particles and particle-generated defects during gas phase processing such as during epitaxial deposition are substantially decreased by the process of controlling the various particle transport mechanisms, for example, by applying low level radiant energy during cold purge cycles in barrel reactors.
    Type: Grant
    Filed: March 14, 1994
    Date of Patent: December 20, 1994
    Assignee: Applied Materials, Inc.
    Inventor: Roger E. Logar
  • Particulate-free epitaxial process
    Patent number: 4728389
    Abstract: Particles and particle-generated defects during epitaxial deposition are substantially decreased by the process of controlling the various particle transport mechanisms, such as, for example, by applying low level radiant energy during cold purge cycles in barrel reactors.
    Type: Grant
    Filed: May 20, 1985
    Date of Patent: March 1, 1988
    Assignee: Applied Materials, Inc.
    Inventor: Roger E. Logar