Abstract: The invention relates to a device for the plasma and/or coating treatment of workpieces comprising a chamber (2) that can be evacuated, a holding device (3) for the workpieces to be treated that is rotatably mounted within the chamber (2) and a plasma source (4). In order to create a device of the above mentioned type that enables the treatment of relatively great workpieces with respect to the size of the device, the invention proposes that the plasma source (4) is placed within the chamber (2), for which purpose the at least one cathode (5) and the least one anode (6) of the plasma source (4) are mounted on the upper side or lower side (7, 8) inside the chamber (2).