Abstract: Transmissive embedded phase shifter-photomask blanks are disclosed which comprise an optically inhomogeneous attenuating film which has a transmission of at least 0.001 and consists essentially of a combination of a metallic component and a dielectric component. One surface of the film has a higher content of metallic component than the other surface and the profile of change in extinction coefficient is gradual through the film thickness. The profile of change in extinction coefficient and the film thickness are selected to provide a phase shift of about 180.degree. (or an odd multiple thereof) at a selected wavelength.

Abstract: Transmissive embedded phase shifter-photomask blanks are disclosed which comprise an optically inhomogeneous attenuating film which has a transmission of at least 0.001 at the lithographic wavelength and consists essentially of a combination of multiple components with one of the components having a higher absorbance than another at the lithographic wavelength, One depth from a surface of the films has a higher content of the higher absorbing component than another depth and the profile of change in refractive index and/or extinction coefficient is gradual through the film thickness, Said profile(s) of change and the film thickness are selected to provide a phase shift of about 180.degree. (or an odd multiple thereof) at a selected lithographic wavelength.

Abstract: A composition for making fired dielectric layers which is especially suitable for laser scribing consisting essentially of finely divided particles of dielectric glass, inorganic filler having a refractive index higher than the glass and cobalt oxide, all being dispersed in organic medium. The composition can be in the form of either thick film paste or green tape.