Patents by Inventor Roger Hamamjy

Roger Hamamjy has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230232789
    Abstract: Various disclosed embodiments include illustrative apparatuses and dog training devices. In an illustrative embodiment, a dog training device includes a harness and a rigid rod. The harness includes a back section, a chest section configured to attach to the back section, and a rod mount configured to attach behind a distal half of the back section. The rigid rod is configured to be received by the rod mount at a first angle relative to the back section to allow the rigid rod to protrude proximally from the harness.
    Type: Application
    Filed: January 27, 2022
    Publication date: July 27, 2023
    Inventor: Roger Hamamjy
  • Publication number: 20200354831
    Abstract: Aspects of the present disclosure include methods, apparatuses, and computer readable media for transporting, via an automated crane, a component toward a first station within a cleaning system, placing, via the automated crane, the component into a first tank at the first station, wherein the first tank contains a solution that cleans the component by removing at least a portion of residual materials on the component, transporting, via the automated crane, the component toward a second station within a cleaning system, placing, via the automated crane, the component into a second tank at the second station, wherein the second tank contains a fluid that rinses the at least a portion of the residual materials removed by the solution, transporting, via the automated crane, the component toward a third station within a cleaning system, and placing, via the automated crane, the component into a chamber at the third station, wherein the chamber provides a gas or air that dries the fluid on the component.
    Type: Application
    Filed: May 7, 2019
    Publication date: November 12, 2020
    Inventors: Roger HAMAMJY, Henry LEE
  • Publication number: 20160130724
    Abstract: Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a heating lamp assembly for a vapor deposition reactor system is provided which includes a lamp housing disposed on an upper surface of a support base and containing a first lamp holder and a second lamp holder and a plurality of lamps extending from the first lamp holder to the second lamp holder. The plurality of lamps may have split filament lamps and/or non-split filament lamps, and in some examples, split and non-split filament may be alternately disposed between the first and second lamp holders. A reflector may be disposed on the upper surface of the support base between the first and second lamp holders. The reflector may contain gold or a gold alloy.
    Type: Application
    Filed: January 18, 2016
    Publication date: May 12, 2016
    Applicant: Alta Devices, Inc.
    Inventors: Gang He, Gregg Higashi, Khurshed Sorabji, Roger Hamamjy, Andreas Hegedus
  • Patent number: 9169554
    Abstract: Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a wafer carrier track for levitating and traversing a wafer carrier within a vapor deposition reactor system is provided which includes upper and lower sections of a track assembly having a gas cavity formed therebetween. A guide path extends along an upper surface of the upper section and between two side surfaces which extend along and above the guide path and parallel to each other. A plurality of gas holes along the guide path extends from the upper surface of the upper section, through the upper section, and into the gas cavity. In some examples, the upper and lower sections of the track assembly may independently contain quartz, and in some examples, may be fused together.
    Type: Grant
    Filed: March 16, 2010
    Date of Patent: October 27, 2015
    Assignee: Alta Devices, Inc.
    Inventors: Gang He, Gregg Higashi, Khurshed Sorabji, Roger Hamamjy, Andreas Hegedus
  • Patent number: 8985911
    Abstract: Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a wafer carrier track for levitating and traversing a wafer carrier within a vapor deposition reactor system is provided which includes upper and lower sections of a track assembly having a gas cavity formed therebetween. A guide path extends along an upper surface of the upper section and between two side surfaces which extend along and above the guide path and parallel to each other. A plurality of gas holes along the guide path extends from the upper surface of the upper section, through the upper section, and into the gas cavity. In some examples, the upper and lower sections of the track assembly may independently contain quartz, and in some examples, may be fused together.
    Type: Grant
    Filed: March 16, 2010
    Date of Patent: March 24, 2015
    Assignee: Alta Devices, Inc.
    Inventors: Gang He, Gregg Higashi, Khurshed Sorabji, Roger Hamamjy, Andreas G. Hegedus
  • Patent number: 8859042
    Abstract: Embodiments of the invention generally relate to methods for chemical vapor deposition (CVD) processes. In one embodiment, a method for heating a substrate or a substrate susceptor within a vapor deposition reactor system includes exposing a lower surface of a substrate susceptor, such as a wafer carrier, to energy emitted from a heating lamp assembly, and heating the substrate susceptor to a predetermined temperature. The heating lamp assembly generally contains a lamp housing disposed on an upper surface of a support base and contains at least one lamp holder, a plurality of lamps extending from the lamp holder, and a reflector disposed on the upper surface of the support base, next to the lamp holder, and below the lamps. The plurality of lamps may have split filament lamps and/or non-split filament lamps for heating inner and outer portions of the substrate susceptor.
    Type: Grant
    Filed: March 16, 2010
    Date of Patent: October 14, 2014
    Assignee: Alta Devices, Inc.
    Inventors: Gang He, Gregg Higashi, Khurshed Sorabji, Roger Hamamjy, Andreas Hegedus
  • Patent number: 8852696
    Abstract: Chemical vapor deposition (CVD) processes include, in one embodiment, a method for processing a wafer within a vapor deposition reactor comprising heating at least one wafer disposed on a wafer carrier by exposing a lower surface of the wafer carrier to radiation emitted from a lamp assembly and flowing a liquid through a passageway extending throughout the reactor to maintain the reactor lid assembly at a predetermined temperature, such as within a range from about 275° C. to about 325° C. The method further includes traversing the wafer carrier along a wafer carrier track through at least a chamber containing a showerhead assembly and an isolator assembly and another chamber containing a showerhead assembly and an exhaust assembly, and removing gases from the reactor through the exhaust assembly.
    Type: Grant
    Filed: March 16, 2010
    Date of Patent: October 7, 2014
    Assignee: Alta Devices, Inc.
    Inventors: Gang He, Gregg Higashi, Khurshed Sorabji, Roger Hamamjy, Andreas Hegedus
  • Patent number: 8602707
    Abstract: Embodiments of the invention generally relate to a levitating substrate carrier or support. In one embodiment, a substrate carrier for supporting and carrying at least one substrate or wafer is provided which includes a substrate carrier body containing an upper surface and a lower surface, and at least one indentation pocket disposed within the lower surface. In another embodiment, the substrate carrier includes at least open indentation area within the upper surface, and at least two indentation pockets disposed within the lower surface. Each indentation pocket may be rectangular and have four side walls extending substantially perpendicular to the lower surface.
    Type: Grant
    Filed: May 29, 2009
    Date of Patent: December 10, 2013
    Assignee: Alta Devices, Inc.
    Inventors: Gang He, Gregg Higashi, Khurshed Sorabji, Roger Hamamjy, Andreas Hegedus, Melissa Archer, Harry Atwater, Stewart Sonnenfeldt
  • Publication number: 20130098289
    Abstract: Embodiments of the invention generally relate to a chemical vapor deposition system and related method of use. In one embodiment, the system includes a reactor lid assembly having a body, a track assembly having a body and a guide path located along the body, and a heating assembly operable to heat the substrate as the substrate moves along the guide path. The body of the lid assembly and the body of the track assembly are coupled together to form a gap that is configured to receive a substrate. In another embodiment, a method of forming layers on a substrate using the chemical vapor deposition system includes introducing the substrate into a guide path, depositing a first layer on the substrate and depositing a second layer on the substrate, while the substrate moves along the guide path; and preventing mixing of gases between the first deposition step and the second deposition step.
    Type: Application
    Filed: April 11, 2012
    Publication date: April 25, 2013
    Applicant: ALTA DEVICES, INC.
    Inventors: Gang He, Gregg Higashi, Khurshed Sorabji, Roger Hamamjy, Andreas Hegedus, Melissa Archer, Harry Atwater, Stewart Sonnenfeldt
  • Publication number: 20120106935
    Abstract: Embodiments of the invention generally relate to apparatuses and methods for chemical vapor deposition (CVD). In one embodiment, a heating lamp assembly for a CVD reactor system is provided which includes a lamp housing disposed on an upper surface of a support base and containing a plurality of lamps extending from a first lamp holder to a second lamp holder. The lamps may have split filament lamps and/or non-split filament lamps, and in some examples, split and non-split filament may be alternately disposed between the first and second lamp holders. A reflector may be disposed on the upper surface of the support base between the first and second lamp holders. In another embodiment, the method includes exposing a lower surface of a wafer carrier to energy emitted from the heating lamp assembly and heating the wafer carrier to a predetermined temperature.
    Type: Application
    Filed: March 16, 2010
    Publication date: May 3, 2012
    Applicant: ALTA DEVICES, INC.
    Inventors: Gang He, Gregg Higashi, Khurshed Sorabji, Roger Hamamjy, Andreas G. Hegedus
  • Publication number: 20120090548
    Abstract: Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a wafer carrier track for levitating and traversing a wafer carrier within a vapor deposition reactor system is provided which includes upper and lower sections of a track assembly having a gas cavity formed therebetween. A guide path extends along an upper surface of the upper section and between two side surfaces which extend along and above the guide path and parallel to each other. A plurality of gas holes along the guide path extends from the upper surface of the upper section, through the upper section, and into the gas cavity. In some examples, the upper and lower sections of the track assembly may independently contain quartz, and in some examples, may be fused together.
    Type: Application
    Filed: March 16, 2010
    Publication date: April 19, 2012
    Applicant: ALTA DEVICES, INC.
    Inventors: Gang He, Gregg Higashi, Khurshed Sorabji, Roger Hamamjy, Andreas G. Hegedus
  • Publication number: 20120067286
    Abstract: Embodiments of the invention generally relate to apparatuses and methods for chemical vapor deposition (CVD) processes. In one embodiment, a CVD reactor has a reactor lid assembly disposed on a reactor body and containing a first showerhead assembly, an isolator assembly, a second showerhead assembly, and an exhaust assembly consecutively and linearly disposed next to each other on a lid support. The CVD reactor further contains first and second faceplates disposed on opposite ends of the reactor body, wherein the first showerhead assembly is disposed between the first faceplate and the isolator assembly and the exhaust assembly is disposed between the second showerhead assembly and the second faceplate. The reactor body has a wafer carrier disposed on a wafer carrier track and a lamp assembly disposed below the wafer carrier track and containing a plurality of lamps which may be utilized to heat wafers disposed on the wafer carrier.
    Type: Application
    Filed: March 16, 2010
    Publication date: March 22, 2012
    Applicant: ALTA DEVICES, INC.
    Inventors: Gang He, Gregg Higashi, Khurshed Sorabji, Roger Hamamjy, Andreas G. Hegedus
  • Publication number: 20120067282
    Abstract: Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a reactor lid assembly for vapor deposition is provided which includes a first showerhead assembly and an isolator assembly disposed next to each other on a lid support, and a second showerhead assembly and an exhaust assembly disposed next to each other on the lid support, wherein the isolator assembly is disposed between the first and second showerhead assemblies and the second showerhead assembly is disposed between the isolator assembly and the exhaust assembly.
    Type: Application
    Filed: March 16, 2010
    Publication date: March 22, 2012
    Applicant: ALTA DEVICES, INC.
    Inventors: Gang He, Gregg Higashi, Khurshed Sorabji, Roger Hamamjy, Andreas G. Hegedus
  • Patent number: 7888240
    Abstract: A phase change memory including an ovonic threshold switch is formed using a pulsed direct current (DC) deposition chamber using pulsed DC. Pulsed DC is used to deposit a chalcogenide film. Pulsed DC may be also used to deposit a carbon film.
    Type: Grant
    Filed: October 10, 2007
    Date of Patent: February 15, 2011
    Assignee: STMicroelectronics S.R.L.
    Inventors: Roger Hamamjy, Kuo-Wei Chang, Sean Jong Lee, Chong W. Lim
  • Publication number: 20100229793
    Abstract: Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a showerhead assembly is provided which includes a body having a centralized channel extending through upper and lower portions of the body and extending parallel to a central axis of the body. The showerhead assembly contains an optional diffusion plate having a first plurality of holes and disposed within the centralized channel, an upper tube plate having a second plurality of holes and disposed within the centralized channel below the diffusion plate, a lower tube plate having a third plurality of holes and disposed within the centralized channel below the upper tube plate, and a plurality of tubes extending from the upper tube plate to the lower tube plate. Each tube is coupled to and in fluid communication with individual holes of the upper and lower tube plates.
    Type: Application
    Filed: March 16, 2010
    Publication date: September 16, 2010
    Applicant: ALTA DEVICES, INC.
    Inventors: Gang He, Gregg Higashi, Khurshed Sorabji, Roger Hamamjy, Andreas Hegedus
  • Publication number: 20100212591
    Abstract: Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a reactor lid assembly for vapor deposition is provided which includes a first showerhead assembly and an isolator assembly disposed next to each other on a lid support, and a second showerhead assembly and an exhaust assembly disposed next to each other on the lid support, wherein the isolator assembly is disposed between the first and second showerhead assemblies and the second showerhead assembly is disposed between the isolator assembly and the exhaust assembly.
    Type: Application
    Filed: March 16, 2010
    Publication date: August 26, 2010
    Applicant: ALTA DEVICES, INC.
    Inventors: Gang He, Gregg Higashi, Khurshed Sorabji, Roger Hamamjy, Andreas Hegedus
  • Publication number: 20100209626
    Abstract: Embodiments of the invention generally relate to methods for chemical vapor deposition (CVD) processes. In one embodiment, a method for heating a substrate or a substrate susceptor within a vapor deposition reactor system includes exposing a lower surface of a substrate susceptor, such as a wafer carrier, to energy emitted from a heating lamp assembly, and heating the substrate susceptor to a predetermined temperature. The heating lamp assembly generally contains a lamp housing disposed on an upper surface of a support base and contains at least one lamp holder, a plurality of lamps extending from the lamp holder, and a reflector disposed on the upper surface of the support base, next to the lamp holder, and below the lamps. The plurality of lamps may have split filament lamps and/or non-split filament lamps for heating inner and outer portions of the substrate susceptor.
    Type: Application
    Filed: March 16, 2010
    Publication date: August 19, 2010
    Applicant: ALTA DEVICES, INC.
    Inventors: Gang He, Gregg Higashi, Khurshed Sorabji, Roger Hamamjy, Andreas Hegedus
  • Publication number: 20100209082
    Abstract: Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a heating lamp assembly for a vapor deposition reactor system is provided which includes a lamp housing disposed on an upper surface of a support base and containing a first lamp holder and a second lamp holder and a plurality of lamps extending from the first lamp holder to the second lamp holder. The plurality of lamps may have split filament lamps and/or non-split filament lamps, and in some examples, split and non-split filament may be alternately disposed between the first and second lamp holders. A reflector may be disposed on the upper surface of the support base between the first and second lamp holders. The reflector may contain gold or a gold alloy.
    Type: Application
    Filed: March 16, 2010
    Publication date: August 19, 2010
    Applicant: ALTA DEVICES, INC.
    Inventors: Gang He, Gregg Higashi, Khurshed Sorabji, Roger Hamamjy, Andreas Hegedus
  • Publication number: 20100206235
    Abstract: Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a wafer carrier track for levitating and traversing a wafer carrier within a vapor deposition reactor system is provided which includes upper and lower sections of a track assembly having a gas cavity formed therebetween. A guide path extends along an upper surface of the upper section and between two side surfaces which extend along and above the guide path and parallel to each other. A plurality of gas holes along the guide path extends from the upper surface of the upper section, through the upper section, and into the gas cavity. In some examples, the upper and lower sections of the track assembly may independently contain quartz, and in some examples, may be fused together.
    Type: Application
    Filed: March 16, 2010
    Publication date: August 19, 2010
    Applicant: ALTA DEVICES, INC.
    Inventors: Gang He, Gregg Higashi, Khurshed Sorabji, Roger Hamamjy, Andreas Hegedus
  • Publication number: 20100206229
    Abstract: Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a CVD reactor is provided which includes a reactor lid assembly disposed on a reactor body and containing a first showerhead assembly, an isolator assembly, a second showerhead assembly, and an exhaust assembly consecutively and linearly disposed next to each other on a lid support. The CVD reactor further contains first and second faceplates disposed on opposite ends of the reactor body, wherein the first showerhead assembly is disposed between the first faceplate and the isolator assembly and the exhaust assembly is disposed between the second showerhead assembly and the second faceplate. The reactor body has a wafer carrier disposed on a wafer carrier track and a lamp assembly disposed below the wafer carrier track and containing a plurality of lamps which may be utilized to heat wafers disposed on the wafer carrier.
    Type: Application
    Filed: March 16, 2010
    Publication date: August 19, 2010
    Applicant: ALTA DEVICES, INC.
    Inventors: Gang He, Gregg Higashi, Khurshed Sorabji, Roger Hamamjy, Andreas Hegedus