Patents by Inventor Roger Lawrence Barr

Roger Lawrence Barr has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6344698
    Abstract: Robust alignment marks which are substantially resistant to degradation caused by semiconductor device fabrication steps are disclosed. The new alignment marks use a series of geometrical shapes that are staggered in respect to each other to achieve more left and right edges providing a checkerboard alignment mark. The geometrical shapes have a size that is selected so as to be within the resolving capability of the exposure tool, yet smaller than the resolving capability of the alignment system. The small staggered geometrical shapes provide a more symmetrical signal which is more resistant to variability in prior processing steps than the standard mark design.
    Type: Grant
    Filed: February 22, 1999
    Date of Patent: February 5, 2002
    Assignee: International Business Machines Corporation
    Inventors: Roger Lawrence Barr, Robert Truman Froebel, Paul Sonntag
  • Publication number: 20020003310
    Abstract: Robust alignment marks which are substantially resistant to degradation caused by semiconductor device fabrication steps are disclosed. The new alignment marks use a series of geometrical shapes that are staggered in respect to each other to achieve more left and right edges providing a checkerboard alignment mark. The geometrical shapes have a size that is selected so as to be within the resolving capability of the exposure tool, yet smaller than the resolving capability of the alignment system. The small staggered geometrical shapes provide a more symmetrical signal which is more resistant to variability in prior processing steps than the standard mark design.
    Type: Application
    Filed: February 22, 1999
    Publication date: January 10, 2002
    Inventors: ROGER LAWRENCE BARR, ROBERT TRUMAN FROEBEL, PAUL SONNTAG
  • Patent number: 5776645
    Abstract: A print bias target is imaged in a single layer of light-sensitive material. The print bias target is made up of a pair of concentric geometric shapes in which a plurality of target regions forms a plurality of isolated edges. Each target region is of a different image structure than each other target region immediately adjacent thereto. The positioning of a given isolated edge in the print bias target is determined relative to a corresponding isolated edge in the design image from which the print bias target was imaged. Focus setting and/or exposure setting for a lithographic system to minimize print bias may be determined using print bias information obtained from a print bias target matrix of varying exposure and focus. An imaging aberration may also be identified using print bias information from a print bias target matrix, such as lithographic astigmatism, lithographic coma and vibration.
    Type: Grant
    Filed: May 16, 1997
    Date of Patent: July 7, 1998
    Assignee: International Business Machines Corporation
    Inventors: Roger Lawrence Barr, Patrick J. Couillard
  • Patent number: 5756238
    Abstract: A print bias target is imaged in a single layer of light-sensitive material. The print bias target is made up of a pair of concentric geometric shapes in which a plurality of target regions forms a plurality of isolated edges. Each target region is of a different image structure than each other target region immediately adjacent thereto. The positioning of a given isolated edge in the print bias target is determined relative to a corresponding isolated edge in the design image from which the print bias target was imaged. Focus setting and/or exposure setting for a lithographic system to minimize print bias may be determined using print bias information obtained from a print bias target matrix of varying exposure and focus. An imaging aberration may also be identified using print bias information from a print bias target matrix, such as lithographic astigmatism, lithographic coma and vibration.
    Type: Grant
    Filed: May 21, 1997
    Date of Patent: May 26, 1998
    Assignee: International Business Machines Corporation
    Inventors: Roger Lawrence Barr, Patrick J. Couillard
  • Patent number: 5677091
    Abstract: A print bias target is imaged in a single layer of light-sensitive material. The print bias target is made up of a pair of concentric geometric shapes in which a plurality of target regions forms a plurality of isolated edges. Each target region is of a different image structure than each other target region immediately adjacent thereto. The positioning of a given isolated edge in the print bias target is determined relative to a corresponding isolated edge in the design image from which the print bias target was imaged. Focus setting and/or exposure setting for a lithographic system to minimize print bias may be determined using print bias information obtained from a print bias target matrix of varying exposure and focus. An imaging aberration may also be identified using print bias information from a print bias target matrix, such as lithographic astigmatism, lithographic coma and vibration. A slope of an imaging profile may also be determined from print bias information.
    Type: Grant
    Filed: May 8, 1996
    Date of Patent: October 14, 1997
    Assignee: International Business Machines Corporation
    Inventors: Roger Lawrence Barr, Patrick J. Couillard