Patents by Inventor Roger Wilhelmus Antonius Henricus Schmitz
Roger Wilhelmus Antonius Henricus Schmitz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10877384Abstract: An apparatus comprising a heat-sensitive device (F); a radiative element (RE), the radiative element in operation generating first electromagnetic radiation (ER), the first radiation propagating towards the heat-sensitive device; and a radiation-shielding device (20) arranged between the radiative element and the heat-sensitive device such that, in operation, the first radiation impinges on the radiation-shielding device. The radiation-shielding device comprises a first shield element (21) having a first fluid channel (215) arranged therein, the first shield element having a first surface (213) and a second surface (214), the first surface being arranged closer to the radiative element than the second surface; and a second shield element (22) having a second fluid channel (225) arranged therein, the second shield element having a third surface (223) and a fourth surface (224), the third surface being arranged closer to the radiative element than the fourth surface.Type: GrantFiled: February 21, 2019Date of Patent: December 29, 2020Assignee: ASML Netherlands B.V.Inventors: Franciscus Johannes Joseph Janssen, Philippe Jacqueline Johannes Hubertus Anthonius Habets, Güneş Nakiboğlu, Roger Wilhelmus Antonius Henricus Schmitz, Remco Van de Meerendonk, Joris Dominicus Bastiaan Johannes Van den Boom, Nicholas Peter Waterson
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Publication number: 20200401058Abstract: An apparatus comprising a heat-sensitive device (F); a radiative element (RE), the radiative element in operation generating first electromagnetic radiation (ER), the first radiation propagating towards the heat-sensitive device; and a radiation-shielding device (20) arranged between the radiative element and the heat-sensitive device such that, in operation, the first radiation impinges on the radiation-shielding device. The radiation-shielding device comprises a first shield element (21) having a first fluid channel (215) arranged therein, the first shield element having a first surface (213) and a second surface (214), the first surface being arranged closer to the radiative element than the second surface; and a second shield element (22) having a second fluid channel (225) arranged therein, the second shield element having a third surface (223) and a fourth surface (224), the third surface being arranged closer to the radiative element than the fourth surface.Type: ApplicationFiled: February 21, 2019Publication date: December 24, 2020Inventors: Franciscus Johannes Joseph Janssen, Philippe Jacqueline Johannes Hubertus Anthonius Habets, Günes Nakiboglu, Roger Wilhelmus Antonius Henricus Schmitz, Remco Van de Meerendonk, Joris Dominicus Bastiaan Johannes Van den Boom, Nicholas Peter Waterson
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Patent number: 9494875Abstract: A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed.Type: GrantFiled: September 19, 2012Date of Patent: November 15, 2016Assignee: ASML Netherlands B.V.Inventors: Sebastiaan Maria Johannes Cornelissen, Noud Jan Gilissen, Anko Jozef Cornelus Sijben, Roger Wilhelmus Antonius Henricus Schmitz, Arnoud Willem Notenboom, Ronald Van Der Wilk, Manon Elise Will
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Patent number: 9429857Abstract: An electrostatic clamp (21) configured to hold an object, the electrostatic clamp comprising an electrode (24), a resistive portion (23) formed from a resistive material located on the electrode, and a dielectric portion (22) formed from a dielectric material located on the resistive portion.Type: GrantFiled: March 19, 2013Date of Patent: August 30, 2016Assignee: ASML Netherlands B.V.Inventors: Ronald Van Der Wilk, Roger Wilhelmus Antonius Henricus Schmitz, Arnoud Willem Notenboom, Manon Elise Will
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Publication number: 20160035605Abstract: Disclosed are support structure apparatuses for holding a substrate or patterning device, for example in a lithographic apparatus, and apparatuses comprising such support structure apparatuses. The support structure apparatus comprises a temperature regulation system for controlling the temperature of the support structure and one or more temperature sensors located on the periphery of said support structure being operable to measure the temperature of the support structure at said periphery. The temperature regulation system may be operable to calculate an average temperature of the substrate holder from temperature values measured by said temperature sensors and position dependent correlation factors, which depend upon the position of an applied heat load on a substrate or patterning device mounted upon the support structure.Type: ApplicationFiled: March 17, 2014Publication date: February 4, 2016Applicant: ASML Netherlands B.V.Inventors: Roger Wilhelmus Antonius Henricus SCHMITZ, Sander Catharina Reinier DERKS, Leon Martin LEVASIER
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Patent number: 9176398Abstract: A method for thermally conditioning an optical element includes irradiating the optical element with radiation, not-irradiating the optical element with the radiation, allowing heat flow between the optical element and a conditioning fluid that is held in a conditioning fluid reservoir, and providing a fluid flow of the conditioning fluid, to supply thermally conditioned fluid to the reservoir. A flow rate of the fluid during the irradiating of the optical element is lower than a flow rate of the fluid when the optical element is not-irradiated.Type: GrantFiled: May 20, 2009Date of Patent: November 3, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Roger Wilhelmus Antonius Henricus Schmitz, Tjarko Adriaan Rudolf Van Empel, Marcel Johannus Elisabeth Hubertus Muitjens, Lun Cheng, Franciscus Johannes Joseph Janssen, Willem Arie Van Helden, Richard Versluis, Paulus Bartholomeus Johannes Schaareman, Axel Sebastiaan Lexmond, Evert Nieuwkoop, Charles William Barras Potts, Martinus Henricus Johannes Lemmen, Frederik Van Der Graaf, Mathilde Gertrudis Maria De Kroon, Johannes Fransiscus Maria Velthuis
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Patent number: 8970818Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, and a projection system configured to project a patterned radiation beam onto a target portion of the substrate. A surface of a component of the lithographic apparatus that is in a vacuum environment in use is provided with a repeating structure configured to increase the effective thermal accommodation coefficient of the surface.Type: GrantFiled: May 23, 2012Date of Patent: March 3, 2015Assignee: ASML Netherlands B.V.Inventors: Han-Kwang Nienhuys, Franciscus Johannes Joseph Janssen, Sven Pekelder, Roger Wilhelmus Antonius Henricus Schmitz, Alexander Marinus Arnoldus Huijberts, Paulus Albertus Maria Gasseling
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Publication number: 20140253900Abstract: A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed.Type: ApplicationFiled: September 19, 2012Publication date: September 11, 2014Applicant: ASML Netherlands B.V.Inventors: Sebastiaan Maria Johannes Cornelissen, Noud Jan Gilissen, Anko Jozef Cornelus Sijben, Roger Wilhelmus Antonius Henricus Schmitz, Arnoud Willem Notenboom, Ronald Van Der Wilk, Manon Elise Will
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Patent number: 8797504Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.Type: GrantFiled: February 29, 2012Date of Patent: August 5, 2014Assignee: ASML Netherlands B.V.Inventors: Han-Kwang Nienhuys, Martinus Agnes Willem Cuijpers, Leon Martin Levasier, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Oleg Viacheslavovich Voznyi, Franciscus Johannes Joseph Janssen, Danny Maria Hubertus Philips, Marcio Alexandre Cano Miranda, Oleksiy Galaktionov, Manish Ranjan, Albert Pieter Rijpma, Kursat Bal, Roger Wilhelmus Antonius Henricus Schmitz, Alain Louis Claude Leroux
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Patent number: 8730448Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.Type: GrantFiled: March 1, 2012Date of Patent: May 20, 2014Assignee: ASML Netherlands B.V.Inventors: Han-Kwang Nienhuys, Martinus Agnes Willem Cuijpers, Nicolaas Ten Kate, Leon Martin Levasier, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Oleg Viacheslavovich Voznyi, Franciscus Johannes Joseph Janssen, Danny Maria Hubertus Philips, Marcio Alexandre Cano Miranda, Oleksiy Galaktionov, Manish Ranjan, Albert Pieter Rijpma, Kursat Bal, Laurentius Johannes Adrianus Van Bokhoven, Roger Wilhelmus Antonius Henricus Schmitz, Alain Louis Claude Leroux
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Publication number: 20120300187Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, and a projection system configured to project a patterned radiation beam onto a target portion of the substrate. A surface of a component of the lithographic apparatus that is in a vacuum environment in use is provided with a repeating structure configured to increase the effective thermal accommodation coefficient of the surface.Type: ApplicationFiled: May 23, 2012Publication date: November 29, 2012Applicant: ASML Netherlands B.V.Inventors: Han-Kwang NIENHUYS, Franciscus Johannes Joseph JANSSEN, Sven PEKELDER, Roger Wilhelmus Antonius Henricus SCHMITZ, Alexander Marinus Arnoldus HUIJBERTS, Paulus Albertus Maria GASSELING
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Publication number: 20120229783Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.Type: ApplicationFiled: March 1, 2012Publication date: September 13, 2012Applicant: ASML Netherlands B.V.Inventors: Han-Kwang Nienhuys, Martinus Agnes Willem Cuijpers, Nicolaas Ten Kate, Leon Martin Levasier, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Oleg Viacheslavovich Voznyi, Franciscus Johannes Joseph Janssen, Danny Maria Hubertus Philips, Marcio Alexandre Cano Miranda, Oleksiy Galaktionov, Manish Ranjan, Albert Pieter Rijpma, Kursat Bal, Laurentius Johannes Adrianus Van Bokhoven, Roger Wilhelmus Antonius Henricus Schmitz, Alain Louis Claude Leroux
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Publication number: 20120229782Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.Type: ApplicationFiled: February 29, 2012Publication date: September 13, 2012Applicant: ASML Netherlands B.V.Inventors: Han-Kwang Nienhuys, Martinus Anges Willem Cuijpers, Leon Martin Levasier, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Oleg Viacheslavovich Voznyi, Franciscus Johannes Joseph Janssen, Danny Maria Hubertus Philips, Marcio Alexandre Cano Miranda, Olesksiy Galaktionov, Manish Ranjan, Albert Pieter Rijpma, Kursat Bal, Roger Wilhelmus Antonius Henricus Schmitz, Alain Louis Claude Leroux
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Publication number: 20110310368Abstract: A method for thermally conditioning an optical element includes irradiating the optical element with radiation, not-irradiating the optical element with the radiation, allowing heat flow between the optical element and a conditioning fluid that is held in a conditioning fluid reservoir, and providing a fluid flow of the conditioning fluid, to supply thermally conditioned fluid to the reservoir. A flow rate of the fluid during the irradiating of the optical element is lower than a flow rate of the fluid when the optical element is not-irradiated.Type: ApplicationFiled: May 20, 2009Publication date: December 22, 2011Applicant: ASML Netherlands B.V.Inventors: Roger Wilhelmus Antonius Henricus Schmitz, Tjarko Adriaan Rudolf Van Empel, Marcel Johannus Elisabeth Hubertus Muitjens, Lun Cheng, Franciscus Johannes Joseph Janssen, William Arie Van Helden, Richard Versluis, Paulus Bartholomeus Johannes Schaareman, Axel Sebastiaan Lexmond, Evert Nieuwkoop, Charles William Barras Potts, Martinus Henricus Johannes Lemmen, Frederik Van Der Graaf, Mathilde Gertrudis Maria De Kroon, Johannes Fransiscus Maria Velthuis