Patents by Inventor ROGIER VERBERK

ROGIER VERBERK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120200913
    Abstract: In order to limit the negative effect of metal contamination on reflectivity within an EUV lithography device, a reflective optical element is proposed for the extreme ultraviolet and soft X-ray wavelength range with a reflective surface with an uppermost layer, in which the uppermost layer comprises one or more organic silicon compounds with a carbon-silicon and/or silicon-oxygen bond.
    Type: Application
    Filed: February 17, 2012
    Publication date: August 9, 2012
    Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT GMBH
    Inventors: MAARTEN VAN KAMPEN, DIRK HEINRICH EHM, ROGIER VERBERK, JEROEN HUIJBREGTSE