Abstract: Synthesis of high SFE nanotwinned metallic films with varying distributions of twin widths on a low SFE metallic layer using magnetron sputtering is disclosed. In various embodiments, a method for forming a nanotwinned metal film may include providing a single crystal silicon wafer, etching the single crystal silicon wafer, depositing a silver film onto the single crystal silicon wafer forming a silver buffer layer, and depositing a metallic film onto the silver buffer layer using sputtering at a controlled temperature.

Abstract: A method to grow metallic glass films utilizes engineering steep, spatially modulated compositional gradients during physical vapor deposition. This method can be used to enhance the thermal stability (increase glass transition and crystallization temperature) of thin film metallic glasses or can be used to produce amorphous films of metallic alloys that do not readily form a glassy structure.

Abstract: A method of forming a monocrystalline nitinol film on a single crystal silicon wafer can comprise depositing a first seed layer of a first metal on the single crystal silicon wafer, the first seed layer growing epitaxially on the single crystal silicon wafer in response to the depositing the first seed layer of the first metal; and depositing the monocrystalline nitinol film on a final seed layer, the monocrystalline nitinol film growing epitaxially on the final seed layer in response to the depositing the monocrystalline nitinol film. The method can form a multilayer stack for a micro-electromechanical system MEMS device.

Abstract: In a method of forming a metallic material with a multimodal microstructure, nickel is deposited on a substrate having a patterned surface comprising two materials having differing microstructure. The resulting materials may desirably be utilized in semiconductor devices or microelectromechanical (MEMS) devices.

Abstract: Metallic materials with multimodal microstructure and methods of forming the metallic materials are disclosed. Exemplary methods allow for tuning of desired properties of the metallic materials and of devices including the metallic materials.

Abstract: Metallic materials with multimodal microstructure and methods of forming the metallic materials are disclosed. Exemplary methods allow for tuning of desired properties of the metallic materials and of devices including the metallic materials.

Abstract: Metallic materials with multimodal microstructure and methods of forming the metallic materials are disclosed. Exemplary methods allow for tuning of desired properties of the metallic materials and of devices including the metallic materials.