Abstract: A vertical farming system, including: a plurality of tray-receptacles, each having a tray-surface area for a soilless growing environment for plants; a vertical supporting structure arranged and adapted to accommodate the plurality of tray-receptacles in a vertically stacked arrangement along a plurality of shelf positions; a tray-receptacle transport device arranged and adapted to move the tray-receptacles along the vertical supporting structure between the different shelf positions; an airflow-ducting device arranged and adapted to transport an airflow to and from the plurality of shelf positions; a plurality of vertically stacked airflow docking members to provide airflow from the air ducting device to the shelf positions; and a plurality of airflow-benches.

Abstract: A method and system for handling asynchronous data streams in a multi-tenant system. The process includes receiving at least a first stream of data and a second stream of data by a rules engine, determining by pattern matching of the rules engine, whether data in the first stream or data in the second stream meet conditions of a rule defined by a tenant of the multi-tenant system, and implementing by the rules engine the rule including a set of actions to modify data from the second data stream, in response to the data in the first stream matching the conditions the rule.

Abstract: An automatic vertical farming system including: vertical supports adapted to accommodate a plurality of tray-receptacles in a vertically-stacked arrangement showing a plurality of tray positions, the tray-receptacles each being adapted for farming plants in a soilless growing environment, wherein the vertical supports provide a tray position being an irrigation station for the tray-receptacles, and a tray-receptacle transport device arranged and adapted to move the tray receptacles along the vertical supports between different tray positions.

Abstract: An application server may identify one or more contact identifiers associated with one or more contacts associated with a communication event. The application server may retrieve information associated with the one or more contacts from one or more data sources based on the one or more contact identifiers. The application server may generate, based on the information retrieved from the one or more data sources, a set of contact characteristics for the one or more contacts. The application server may identify one or more actions to be performed via the electronic communication application and associated with the communication event based at least in part on the generated set of contact characteristics and a response status. The application server may transmit, to a user device, an indication of the identified one or more actions.

Abstract: A method and system for handling asynchronous data streams in a multi-tenant system. The process includes receiving at least a first stream of data and a second stream of data by a rules engine, determining by pattern matching of the rules engine, whether data in the first stream or data in the second stream meet conditions of a rule defined by a tenant of the multi-tenant system, and implementing by the rules engine the rule including a set of actions to modify data from the second data stream, in response to the data in the first stream matching the conditions the rule.

Abstract: Methods, systems, and devices for analyzing communication messages (e.g., emails) and selecting corresponding actions are described. In some database systems, a user may receive multiple messages at a user device. To efficiently determine responses to these messages, the user device may send the messages to a backend server for analysis. The server may perform natural language processing (NLP) to classify the message with one or more binary classifications and may extract metadata from each message. Based on the classifications and the metadata, the server may determine one or more actions the user device may perform to respond to each message. The server may send instructions to the user device indicating the suggested actions, and the user device may display these actions as options to a user. Additionally, the user device may use the classifications and metadata to automatically generate one or more communication templates in response to the message.

Abstract: An asset class type of a new asset is predicted or determined based upon an evaluation of time series data from the new asset. A predicted asset type is used to identify sensors of the new asset to use for data collection. Using the readings of selected sensors from the new asset, states of the new asset are obtained. The duration at least one of these states of the new asset is determined. This information can be subsequently used to optimize the performance of the new asset.

Abstract: Methods, systems, and devices for analyzing communication messages (e.g., emails) and selecting corresponding actions are described. In some database systems, a user may receive multiple messages at a user device. To efficiently determine responses to these messages, the user device may send the messages to a backend server for analysis. The server may perform natural language processing (NLP) to classify the message with one or more binary classifications and may extract metadata from each message. Based on the classifications and the metadata, the server may determine one or more actions the user device may perform to respond to each message. The server may send instructions to the user device indicating the suggested actions, and the user device may display these actions as options to a user. Additionally, the user device may use the classifications and metadata to automatically generate one or more communication templates in response to the message.

Abstract: An asset class type of a new asset is predicted or determined based upon an evaluation of time series data from the new asset. A predicted asset type is used to identify sensors of the new asset to use for data collection. Using the readings of selected sensors from the new asset, states of the new asset are obtained. The duration at least one of these states of the new asset is determined. This information can be subsequently used to optimize the performance of the new asset.

Abstract: Exemplary embodiments are directed to controlling CD uniformity of a wafer by controlling trim time on temperature in a plasma processing system. The plasma processing system has a wafer support assembly including a plurality of independently controllable temperature control zones across a chuck and a controller that controls each temperature control zone. The controller receives process control and temperature data associated with at least one wafer previously processed in a plasma chamber of the plasma processing system. The controller also receives critical device parameters of a current wafer to be processed in the plasma chamber. The controller calculates a target trim time and a target temperature profile of the current wafer based on the process control and temperature data of the at least one previously processed wafers and the critical device parameters of the current wafer.

Abstract: Exemplary embodiments are directed to controlling CD uniformity of a wafer by controlling trim time on temperature in a plasma processing system. The plasma processing system has a wafer support assembly including a plurality of independently controllable temperature control zones across a chuck and a controller that controls each temperature control zone. The controller receives process control and temperature data associated with at least one wafer previously processed in a plasma chamber of the plasma processing system. The controller also receives critical device parameters of a current wafer to be processed in the plasma chamber. The controller calculates a target trim time and a target temperature profile of the current wafer based on the process control and temperature data of the at least one previously processed wafers and the critical device parameters of the current wafer.

Abstract: Exemplary embodiments are directed to controlling CD uniformity of a wafer by controlling trim time on temperature in a plasma processing system. The plasma processing system has a wafer support assembly including a plurality of independently controllable temperature control zones across a chuck and a controller that controls each temperature control zone. The controller receives process control and temperature data associated with at least one wafer previously processed in a plasma chamber of the plasma processing system, and critical device parameters of a current wafer to be processed in the plasma chamber. The controller calculates a target trim time and a target temperature profile of the current wafer based on the process control and temperature data, and the critical device parameters. The current wafer is trimmed during the target trim time while the temperature of each device die location is controlled based on the target temperature profile.

Abstract: Exemplary embodiments are directed to controlling CD uniformity of a wafer by controlling trim time on temperature in a plasma processing system. The plasma processing system has a wafer support assembly including a plurality of independently controllable temperature control zones across a chuck and a controller that controls each temperature control zone. The controller receives process control and temperature data associated with at least one wafer previously processed in a plasma chamber of the plasma processing system, and critical device parameters of a current wafer to be processed in the plasma chamber. The controller calculates a target trim time and a target temperature profile of the current wafer based on the process control and temperature data, and the critical device parameters. The current wafer is trimmed during the target trim time while the temperature of each device die location is controlled based on the target temperature profile.