Abstract: A parameterized interleaver design process is provided, which optimizes the design for interleavers of any size, and can be completely specified using only a few design parameters. According to the parameterized interleaver design process an interleaver ?(i) of a length N is generated. A number of subpermutation masks are defined, and a first intermediate interleaver permutation is partitioned into a number of subgroups, wherein the number of subgroups corresponds with the number of subpermutation masks. Each of the subgroups of the first intermediate interleaver permutation is partitioned into a number of further subgroups, and each of the subpermutation masks is applied to each of the further subgroups of a corresponding subgroup of the first intermediate interleaver permutation, resulting in a corresponding portion of a second intermediate interleaver permutation. The resulting interleaver ?(i) is generated based at least in part on the first and second intermediate interleaver permutations.