Abstract: Provided herein are methods of filling features with metal including inhibition of metal nucleation. Also provided are methods of enhancing inhibition and methods of reducing or eliminating inhibition of metal nucleation.

Abstract: Forming a protective coating ex situ in an atomic layer deposition process to coat one or more chamber components subsequently installed in a reaction chamber provides a number of benefits over more conventional coating methods such as in situ deposition of an undercoat. In certain cases the protective coating may have a particular composition such as aluminum oxide, aluminum fluoride, aluminum nitride, yttrium oxide, and/or yttrium fluoride. The protective coating may help reduce contamination on wafers processed using the coated chamber component. Further, the protective coating may act to stabilize the processing conditions within the reaction chamber, thereby achieving very stable/uniform processing results over the course of processing many batches of wafers, and minimizing radical loss. Also described are a number of techniques that may be used to restore the protective coating after the coated chamber component is used to process semiconductor wafers.

Abstract: Forming a protective coating ex situ in an atomic layer deposition process to coat one or more chamber components subsequently installed in a reaction chamber provides a number of benefits over more conventional coating methods such as in situ deposition of an undercoat. In certain cases the protective coating may have a particular composition such as aluminum oxide, aluminum fluoride, aluminum nitride, yttrium oxide, and/or yttrium fluoride. The protective coating may help reduce contamination on wafers processed using the coated chamber component. Further, the protective coating may act to stabilize the processing conditions within the reaction chamber, thereby achieving very stable/uniform processing results over the course of processing many batches of wafers, and minimizing radical loss. Also described are a number of techniques that may be used to restore the protective coating after the coated chamber component is used to process semiconductor wafers.

Abstract: Forming a protective coating ex situ in an atomic layer deposition process to coat one or more chamber components subsequently installed in a reaction chamber provides a number of benefits over more conventional coating methods such as in situ deposition of an undercoat. In certain cases the protective coating may have a particular composition such as aluminum oxide, aluminum fluoride, aluminum nitride, yttrium oxide, and/or yttrium fluoride. The protective coating may help reduce contamination on wafers processed using the coated chamber component. Further, the protective coating may act to stabilize the processing conditions within the reaction chamber, thereby achieving very stable/uniform processing results over the course of processing many batches of wafers, and minimizing radical loss. Also described are a number of techniques that may be used to restore the protective coating after the coated chamber component is used to process semiconductor wafers.

Abstract: Forming a protective coating ex situ in an atomic layer deposition process to coat one or more chamber components subsequently installed in a reaction chamber provides a number of benefits over more conventional coating methods such as in situ deposition of an undercoat. In certain cases the protective coating may have a particular composition such as aluminum oxide, aluminum fluoride, aluminum nitride, yttrium oxide, and/or yttrium fluoride. The protective coating may help reduce contamination on wafers processed using the coated chamber component. Further, the protective coating may act to stabilize the processing conditions within the reaction chamber, thereby achieving very stable/uniform processing results over the course of processing many batches of wafers, and minimizing radical loss. Also described are a number of techniques that may be used to restore the protective coating after the coated chamber component is used to process semiconductor wafers.

Abstract: Forming a protective coating ex situ in an atomic layer deposition process to coat one or more chamber components subsequently installed in a reaction chamber provides a number of benefits over more conventional coating methods such as in situ deposition of an undercoat. In certain cases the protective coating may have a particular composition such as aluminum oxide, aluminum fluoride, aluminum nitride, yttrium oxide, and/or yttrium fluoride. The protective coating may help reduce contamination on wafers processed using the coated chamber component. Further, the protective coating may act to stabilize the processing conditions within the reaction chamber, thereby achieving very stable/uniform processing results over the course of processing many batches of wafers, and minimizing radical loss. Also described are a number of techniques that may be used to restore the protective coating after the coated chamber component is used to process semiconductor wafers.

Abstract: Forming a protective coating ex situ in an atomic layer deposition process to coat one or more chamber components subsequently installed in a reaction chamber provides a number of benefits over more conventional coating methods such as in situ deposition of an undercoat. In certain cases the protective coating may have a particular composition such as aluminum oxide, aluminum fluoride, aluminum nitride, yttrium oxide, and/or yttrium fluoride. The protective coating may help reduce contamination on wafers processed using the coated chamber component. Further, the protective coating may act to stabilize the processing conditions within the reaction chamber, thereby achieving very stable/uniform processing results over the course of processing many batches of wafers, and minimizing radical loss. Also described are a number of techniques that may be used to restore the protective coating after the coated chamber component is used to process semiconductor wafers.

Abstract: Provided herein are methods of tungsten nitride (WN) deposition. Also provided are stacks for tungsten (W) contacts to silicon germanium (SiGe) layers and methods for forming them. The stacks include SiGe/tungsten silicide (WSix)/WN/W layers, with WSix providing an ohmic contact between the SiGe and WN layers. Also provided are methods for reducing fluorine (F) attack of underlying layers in deposition of W-containing films using tungsten hexafluoride (WF6). Apparatuses to perform the methods are also provided.

Abstract: Provided herein are methods of tungsten nitride (WN) deposition. Also provided are stacks for tungsten (W) contacts to silicon germanium (SiGe) layers and methods for forming them. The stacks include SiGe/tungsten silicide (WSix)/WN/W layers, with WSix providing an ohmic contact between the SiGe and WN layers. Also provided are methods for reducing fluorine (F) attack of underlying layers in deposition of W-containing films using tungsten hexafluoride (WF6). Apparatuses to perform the methods are also provided.

Abstract: Example implementations described herein are directed to a trust tree that allows third party applications to operate on sensitive user data within the confines of a protected environment. The environment storing the sensitive user data prevents the third party application from receiving sensitive user data through use of an overlay, while preserving the function of the third party application. This permits the value of the application to be provided to a user without the risk of the application violating the user's privacy.

Abstract: Information delivery system and methods detects and organizes information into canonical topics, such as who, what, when, where, price, etc., and facilitates a user to persistently subscribe to topics, web users, web resources, event streams, etc. The system facilitates a user to register devices and applications on which to receive information, as it becomes available, related to the subscription(s). The system facilitates users to specify preferences for the topics, web users, web resources, and registrations, which prioritize delivery of information. The system senses information, aggregates the user's registrations, subscriptions, and preferences, and filters information a topic-interest basis. The system notifies a user based on the preferences.

Abstract: Information delivery system and methods detects and organizes information into canonical topics, such as who, what, when, where, price, etc., and facilitates a user to persistently subscribe to topics, web users, web resources, event streams, etc. The system facilitates a user to register devices and applications on which to receive information, as it becomes available, related to the subscription(s). The system facilitates users to specify preferences for the topics, web users, web resources, and registrations, which prioritize delivery of information. The system senses information, aggregates the user's registrations, subscriptions, and preferences, and filters information a topic-interest basis. The system notifies a user based on the preferences.

Abstract: A method of and system for controlling access to the Internet by members of an organization that includes at least one supervisor and at least one non-supervisor for which limited Internet access is desired. The system maintains for each member of the organization a session identifier. When the system establishes an Internet session between a member of the organization and the Internet, the system initially sets a user session identifier for said Internet session to a default session identifier, which is the session identifier for the lowers access level member of the organization. When the member requests a resource, the system determines if an access level rating for requested source is greater than the value of the access level field of the user session identifier. If so, the system blocks the resource and presents member with choices of logging on to the system as a specific member of the organization with a higher access level, or appealing the blocking to a supervisor.

Abstract: A method of and system for controlling access to the Internet by members of an organization that includes at least one supervisor and at least one non-supervisor for which limited Internet access is desired. The system maintains for each member of the organization a session identifier. When the system establishes an Internet session between a member of the organization and the Internet, the system initially sets a user session identifier for said Internet session to a default session identifier, which is the session identifier for the lowest access level member of the organization. When the member requests a resource, the system determines if an access level rating for requested resource is greater than the value of the access level field of the user session identifier. If so, the system blocks the resource and presents member with choices of logging on to the system as a specific member of the organization with a higher access level, or appealing the blocking to a supervisor.