Patents by Inventor Rohit Mishra
Rohit Mishra has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12199770Abstract: A method can include obtaining, at a physical communication layer integrated with a communication interface, a data packet, detecting, by a detection circuit integrated with the physical communication layer, a portion of data in the data packet corresponding to a marker identifying the data packet, linking, by the physical communication layer based on the marker, a timestamp with the data packet, and transmitting, by the physical communication layer, the data packet linked with the timestamp.Type: GrantFiled: July 29, 2022Date of Patent: January 14, 2025Assignee: Cadence Design Systems, Inc.Inventors: Hemlata Bist, Shubham Agarwal, Harshdeep Verma, Rohit Mishra
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Publication number: 20240411544Abstract: An application management platform comprising at least a packaging and bundling component, a deployment management component, and an update component. The packaging and bundling component versions, packages, and bundles a plurality of infrastructure components for a remote data center. The deployment management component provisions one or more nodes of the remote data center with the plurality of infrastructure components for an application. The update component monitors available updates to one or more of the plurality of infrastructure components used by the remote data center and facilitates update of the one or more of the plurality of infrastructure components at the remote data center.Type: ApplicationFiled: August 5, 2022Publication date: December 12, 2024Inventors: Vishvesh VIJAYWARGIYA, Lalit ADITHYA V, Krishnan DURAISAMY, Rohit RAJANI, Gopi VADLAMUDI, Andrew STOCK, Alexander PELAVIN, Shivam MISHRA, Prathik KOTIAN
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Publication number: 20240411612Abstract: An application management platform comprising at least a packaging and bundling component, a deployment management component, and an update component. The packaging and bundling component versions, packages, and bundles a plurality of infrastructure components for a remote data center. The deployment management component provisions one or more nodes of the remote data center with the plurality of infrastructure components for an application. The update component monitors available updates to one or more of the plurality of infrastructure components used by the remote data center and facilitates update of the one or more of the plurality of infrastructure components at the remote data center.Type: ApplicationFiled: January 18, 2024Publication date: December 12, 2024Inventors: Vishvesh VIJAYWARGIYA, Lalit ADITHYA V, Krishnan DURAISAMY, Rohit RAJANI, Gopi VADLAMUDI, Andrew STOCK, Alexander PELAVIN, Shivam MISHRA, Prathik KOTIAN
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Patent number: 12137401Abstract: A combined User Plane (UP) node optimizes the UP data stream handling for 4G/5G network operation as follows. The combined UP node, which includes an access data plane node, an intermediate data plane node, an anchor data plane node, and a session handling process module. If the IP addresses or the namespaces of the access data plane node, the intermediate data plane node, and the anchor data plane node are different, then the downlink and uplink packet stream handling utilizes an intermediate interface path within the combined UP node. If the IP addresses or the namespaces of the access data plane node, the intermediate data plane node, and the anchor data plane node are same, then the downlink and uplink packet stream handling does not utilize an intermediate interface path within the combined UP node, but TEID of the unutilized intermediate interface path is used in PFCP response message.Type: GrantFiled: May 4, 2022Date of Patent: November 5, 2024Assignee: Mavenir Networks, Inc.Inventors: Abhishek Mishra, Vipin Padlikar, Rohit Gupta, Tamanna Jindal
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Patent number: 12126117Abstract: Embodiments herein describe preventing a pluggable module from connecting to a chassis until ensuring there is no damage on the pluggable module, the chassis, or both. In one embodiment, the chassis includes a blocking element that prevents or blocks the pluggable module from mating with the chassis. The chassis can also include a camera for capturing an image of the pluggable module to determine whether there is damage to its connection elements (e.g., pins). If not, the chassis can release the locking pin to permit the pluggable module to mate with connection elements on the chassis.Type: GrantFiled: April 20, 2022Date of Patent: October 22, 2024Assignee: Cisco Technology, Inc.Inventors: Garima Mishra, Rohit Dev Gupta, Shilpa Agrawal, Manjunatha Reddy Shivashankara, Ramesh Babu Darla
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Publication number: 20240349117Abstract: Minimizing signaling traffic between a User Plane (UP) and a Control Plane (CP), where Policy and Charging Function/Policy and Charging Rule Function (PCF/PCRF) software transmits a first and a second Policy and Charging Control rule (PCCRule1 and PCCRule2) to CP equipment. The CP equipment installs both PCCRule1 and PCCRule2 on UP equipment as UPRule1 and UPRule2 respectively, where UPRule1 is set as active during a first time period and the UPRule2 set as active during a second time period. User Plane Function (UPF) software matching data traffic with a Packet Detection Rule (PDR) to generate identified traffic during the first and second time periods and automatically redirecting data traffic to a predetermined location at the expiration of the first and second time periods respectively. UPRule1 and UPRule2 are automatically enabled and disabled alternatively after expiration of their respective timers by the UPF software.Type: ApplicationFiled: April 5, 2024Publication date: October 17, 2024Applicant: Mavenir Systems, Inc.Inventors: Abhishek Mishra, Vipin Padlikar, Tamanna Jindal, Rohit Gupta
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Publication number: 20240242545Abstract: An example operation includes determining a driving style of a vehicle, wherein the driving style is associated with a greatest amount of carbon emissions over a period; and notifying a device associated with the vehicle, wherein the notifying includes a modification of the driving style, an environmental benefit, and a value, when an amount of carbon emissions for the modification of the driving style falls below the greatest amount in a future period equal to the period.Type: ApplicationFiled: January 16, 2023Publication date: July 18, 2024Applicant: TOYOTA CONNECTED NORTH AMERICA, INC.Inventors: Olarinre Salako, Varun Prasad, Daniel Ellis Holman, Farzam Ghanbarnezhad, Danny P. Bargas, Rohit Mishra, Jennifer C. Lerman
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Publication number: 20240211964Abstract: An example operation includes comparing a first set of driving styles for a vehicle to a second set of driving styles for one or more similar vehicles in a geographic area over a period, wherein the first set of driving styles affects a carbon footprint of the vehicle and the second set of driving styles affects another carbon footprint of the one or more similar vehicles; determining a carbon credit when the carbon footprint of the vehicle is lower than the another carbon footprint of the one or more similar vehicles, by a threshold, based on the comparing; and applying the carbon credit to the vehicle.Type: ApplicationFiled: December 21, 2022Publication date: June 27, 2024Applicant: TOYOTA CONNECTED NORTH AMERICA, INC.Inventors: Olarinre Salako, Varun Prasad, Daniel Ellis Holman, Farzam Ghanbarnezhad, Danny P. Bargas, Rohit Mishra, Jennifer C. Lerman
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Patent number: 11741421Abstract: A computer-implemented method is disclosed. The method includes: receiving input of product value data for a product item and a data modifier for the product value data, the data modifier identifying a target margin value associated with the product item; determining at least one current inventory location for the product item; obtaining a shipping rate associated with shipping the product item to a geographical region from the at least one current inventory location; retrieving historical transfer value preference data for the geographical region; modifying at least one of the product value data, the shipping rate, or the target margin value based on the historical transfer value preference data; determining a transfer value of the product item based on the modified at least one of the product value data, the shipping rate, or the target margin value; and generating an indication of the transfer value of the product item.Type: GrantFiled: June 18, 2020Date of Patent: August 29, 2023Assignee: Shopify Inc.Inventors: Rohit Mishra, Charlie Elliott
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Publication number: 20210400117Abstract: Systems and methods for modifying features of a user interface of an online store in a manner based on a location of a customer are provided. The preferences for the features are identified for various geographical regions. The modification may be performed in real time, in the sense that the modification is not performed until a customer from a different region attempts to access the store. When this happens, the features of the online store are modified based on preferences or trends associated with a geographical region within which the customer is located, and a revised user interface is presented to the customer. The overall effect is that the store with the new revised user interface emulates stores created by merchants native to the customer's region.Type: ApplicationFiled: June 19, 2020Publication date: December 23, 2021Inventors: ROHIT MISHRA, CHARLIE ELLIOTT, JULIEN LAPOINTE, ALAINE MACKENZIE, IAN WHITESTONE
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Publication number: 20210398154Abstract: A computer-implemented is disclosed. The method includes: receiving input of product value data for a product item and a data modifier for the product value data; determining a current inventory location for the product item; retrieving historical transfer value preference data for a geographical region; determining adjusted product values for the product item and adjusted shipping rates associated with shipping the product item to the geographical region based on the historical transfer value preference data; transmitting for display, on customer devices associated with the geographical region, different sets of product data for the product item; detecting transaction events for the product item based on input received via the customer devices; and outputting the product item and a target set of product data for the product item for the geographical region for display on a merchant device, the target set of product data selected based on the detected transaction events.Type: ApplicationFiled: June 18, 2020Publication date: December 23, 2021Applicant: Shopify Inc.Inventors: Rohit MISHRA, Charlie ELLIOTT
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Publication number: 20210398073Abstract: A computer-implemented method is disclosed. The method includes: receiving input of product value data for a product item and a data modifier for the product value data, the data modifier identifying a target margin value associated with the product item; determining at least one current inventory location for the product item; obtaining a shipping rate associated with shipping the product item to a geographical region from the at least one current inventory location; retrieving historical transfer value preference data for the geographical region; modifying at least one of the product value data, the shipping rate, or the target margin value based on the historical transfer value preference data; determining a transfer value of the product item based on the modified at least one of the product value data, the shipping rate, or the target margin value; and generating an indication of the transfer value of the product item.Type: ApplicationFiled: June 18, 2020Publication date: December 23, 2021Applicant: Shopify Inc.Inventors: Rohit MISHRA, Charlie ELLIOTT
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Patent number: 11053590Abstract: A nozzle for uniform plasma processing comprises an inlet portion and an outlet portion. The inlet portion has a side surface substantially parallel to a vertical axis. The inlet portion comprises a plurality of gas channels. The outlet portion is coupled to the inlet portion. The outlet portion comprises a plurality of outlets. At least one of the outlets is at an angle other than a right angle relative to the vertical axis.Type: GrantFiled: September 26, 2019Date of Patent: July 6, 2021Assignee: Applied Materials, Inc.Inventors: Rohit Mishra, Siva Suri Chandra Rao Bhesetti, Eng Sheng Peh, Sriskantharajah Thirunavukarasu, Shoju Vayyapron, Cheng Sun
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Patent number: 10903055Abstract: Embodiments of the present disclosure include methods and apparatuses utilized to reduce residual film layers from a substrate periphery region, such as an edge or bevel of the substrate. Contamination of the substrate bevel, backside and substrate periphery region may be reduced after a plasma process. In one embodiment, an edge ring includes a base circular ring having an inner surface defining a center opening formed thereon and an outer surface defining a perimeter of the base circular ring. The base circular ring includes an upper body and a lower portion connected to the upper body. A step is formed at the inner surface of the base circular ring and above a first upper surface of the upper body. The step defines a pocket above the first upper surface of the upper body. A plurality of raised features formed on the first upper surface of the base circular ring.Type: GrantFiled: April 17, 2015Date of Patent: January 26, 2021Assignee: Applied Materials, Inc.Inventors: Rohit Mishra, Graeme Jamieson Scott, Khalid Mohiuddin Sirajuddin, Sheshraj L. Yulshibagwale, Sriskantharajah Thirunavukarasu
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Patent number: 10586696Abstract: In an embodiment, a method of processing a substrate includes introducing a first process gas or a mixture of the first process gas and a second process gas into an etch chamber; exposing the substrate to the first process gas or to the mixture of the first and second process gases, the substrate having halogen residue formed on an exposed surface, the substrate having high aspect ratio features; forming and maintaining a plasma of the first process gas or a plasma of the mixture of the first and second process gases in the etch chamber to remove the residue from the surface by applying a first source power; exposing the substrate to the second process gas; and forming and maintaining a plasma of the second process gas in the etch chamber to remove the residue from the surface by applying a second source power and a bias power.Type: GrantFiled: May 10, 2018Date of Patent: March 10, 2020Assignee: APPLIED MATERIALS, INC.Inventors: Rohit Mishra, Yongjia Li, Mir Abdulla Al Galib, Minoru Takahashi, Masato Ito, Jinhan Choi
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Publication number: 20200017972Abstract: A nozzle for uniform plasma processing comprises an inlet portion and an outlet portion. The inlet portion has a side surface substantially parallel to a vertical axis. The inlet portion comprises a plurality of gas channels. The outlet portion is coupled to the inlet portion. The outlet portion comprises a plurality of outlets. At least one of the outlets is at an angle other than a right angle relative to the vertical axis.Type: ApplicationFiled: September 26, 2019Publication date: January 16, 2020Inventors: Rohit Mishra, Siva Suri Chandra Rao Bhesetti, Eng Sheng Peh, Sriskantharajah Thirunavukarasu, Shoju Vayyapron, Cheng Sun
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Patent number: 10465288Abstract: A nozzle for uniform plasma processing comprises an inlet portion and an outlet portion. The inlet portion has a side surface substantially parallel to a vertical axis. The inlet portion comprises a plurality of gas channels. The outlet portion is coupled to the inlet portion. The outlet portion comprises a plurality of outlets. At least one of the outlets is at an angle other than a right angle relative to the vertical axis.Type: GrantFiled: August 15, 2014Date of Patent: November 5, 2019Assignee: Applied Materials, Inc.Inventors: Rohit Mishra, Siva Suri Chandra Rao Bhesetti, Eng Sheng Peh, Sriskantharajah Thirunavukarasu, Shoju Vayyapron, Cheng Sun
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Publication number: 20180330943Abstract: In an embodiment, a method of processing a substrate includes introducing a first process gas or a mixture of the first process gas and a second process gas into an etch chamber; exposing the substrate to the first process gas or to the mixture of the first and second process gases, the substrate having halogen residue formed on an exposed surface, the substrate having high aspect ratio features; forming and maintaining a plasma of the first process gas or a plasma of the mixture of the first and second process gases in the etch chamber to remove the residue from the surface by applying a first source power; exposing the substrate to the second process gas; and forming and maintaining a plasma of the second process gas in the etch chamber to remove the residue from the surface by applying a second source power and a bias powerType: ApplicationFiled: May 10, 2018Publication date: November 15, 2018Inventors: Rohit MISHRA, Yongjia LI, Mir Abdulla AL GALIB, Minoru TAKAHASHI, Masato ITO, Jinhan CHOI
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Publication number: 20160307742Abstract: Embodiments of the present disclosure include methods and apparatuses utilized to reduce residual film layers from a substrate periphery region, such as an edge or bevel of the substrate. Contamination of the substrate bevel, backside and substrate periphery region may be reduced after a plasma process. In one embodiment, an edge ring includes a base circular ring having an inner surface defining a center opening formed thereon and an outer surface defining a perimeter of the base circular ring. The base circular ring includes an upper body and a lower portion connected to the upper body. A step is formed at the inner surface of the base circular ring and above a first upper surface of the upper body. The step defines a pocket above the first upper surface of the upper body. A plurality of raised features formed on the first upper surface of the base circular ring.Type: ApplicationFiled: April 17, 2015Publication date: October 20, 2016Inventors: Rohit MISHRA, Graeme Jamieson SCOTT, Khalid Mohiuddin SIRAJUDDIN, Sheshraj L. TULSHIBAGWALE, Sriskantharajah THIRUNAVUKARASU
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Publication number: 20160047040Abstract: A nozzle for uniform plasma processing comprises an inlet portion and an outlet portion. The inlet portion has a side surface substantially parallel to a vertical axis. The inlet portion comprises a plurality of gas channels. The outlet portion is coupled to the inlet portion. The outlet portion comprises a plurality of outlets. At least one of the outlets is at an angle other than a right angle relative to the vertical axis.Type: ApplicationFiled: August 15, 2014Publication date: February 18, 2016Inventors: ROHIT MISHRA, Siva Suri Chandra Rao Bhesetti, Eng Sheng Peh, Sriskantharajah Thirunavukarasu, Shoju Vayyapron, Cheng Sun