Patents by Inventor Rohit R. Rosario

Rohit R. Rosario has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for patterning a photo-resist in an immersion lithography process
    Patent number: 7704674
    Abstract: A method for patterning a photo-resist in an immersion lithography process is described. The method includes forming a photo-resist layer above a substrate. A hydrophobic and contrast-enhancing barrier layer is formed above the photo-resist layer. The photo-resist layer is exposed, through the hydrophobic and contrast-enhancing barrier layer, to a light source. The photo-resist layer is developed to provide a patterned photo-resist layer.
    Type: Grant
    Filed: December 31, 2008
    Date of Patent: April 27, 2010
    Inventors: Gilles Amblard, Rohit R. Rosario