Patents by Inventor Roland Adrianus Emanuel Maria Bogers

Roland Adrianus Emanuel Maria Bogers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Alignment system and method and device manufactured thereby
    Patent number: 7259828
    Abstract: An arrangement for and a method of automatically selecting substrate alignment marks on a substrate in a lithographic apparatus or overlay metrology targets in an overlay metrology apparatus. The apparatus has a processor and a memory connected to the processor. The memory stores locations of one or more sets of substrate alignment marks or overlay metrology targets available for selection and selection rules to select suitable substrate alignment marks or overlay metrology targets from this at least one set. The selection rules are based on experimental or theoretical knowledge about which substrate alignment mark or overlay metrology targets locations are optimal in dependence on one or more selection criteria.
    Type: Grant
    Filed: May 14, 2004
    Date of Patent: August 21, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Hoite Pieter Theodoor Tolsma, Ramon Navarro Y Koren, Hubertus Johannes Gertrudus Simons, Remi Daniel Marie Edart, Pui Leng Lam, Bernardus Johannes Antonius Hulshof, Roland Adrianus Emanuel Maria Bogers